Growing community of inventors

Tokyo, Japan

Tetsuya Enomoto

Average Co-Inventor Count = 3.14

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 1

Tetsuya EnomotoDaisaku Matsukawa (2 patents)Tetsuya EnomotoNobuyuki Saito (2 patents)Tetsuya EnomotoSatoshi Yoneda (2 patents)Tetsuya EnomotoAtsutaro Yoshizawa (2 patents)Tetsuya EnomotoAkira Asada (2 patents)Tetsuya EnomotoTakashi Kawamori (1 patent)Tetsuya EnomotoMasayuki Ohe (1 patent)Tetsuya EnomotoYukari Koibuchi (1 patent)Tetsuya EnomotoEtsuharu Tsuchiya (1 patent)Tetsuya EnomotoShingo Tahara (1 patent)Tetsuya EnomotoTetsuya Enomoto (5 patents)Daisaku MatsukawaDaisaku Matsukawa (3 patents)Nobuyuki SaitoNobuyuki Saito (3 patents)Satoshi YonedaSatoshi Yoneda (2 patents)Atsutaro YoshizawaAtsutaro Yoshizawa (2 patents)Akira AsadaAkira Asada (2 patents)Takashi KawamoriTakashi Kawamori (7 patents)Masayuki OheMasayuki Ohe (3 patents)Yukari KoibuchiYukari Koibuchi (2 patents)Etsuharu TsuchiyaEtsuharu Tsuchiya (1 patent)Shingo TaharaShingo Tahara (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Hd Microsystems, Ltd. (5 from 9 patents)


5 patents:

1. 12386256 - Photosensitive resin composition, method for producing patterned cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component

2. 12386257 - Photosensitive resin composition, method of manufacturing pattern cured film, cured film, interlayer insulating film, cover coat layer, surface protective film, and electronic component

3. 11807721 - Method for producing polyimide precursor, method for producing photosensitive resin composition, method for producing pattern cured product, method for producing interlayer insulating film, cover coat layer or surface protective film, and method for producing electronic component

4. 11487201 - Photosensitive resin composition, method of manufacturing pattern cured product, cured product, interlayer insulating film, cover-coat layer, surface protective film, and electronic component

5. 11048167 - Positive photosensitive resin composition, patterned cured film production method, patterned cured film, and electronic component

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12/12/2025
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