Riken Corporation

Hitachi, Ltd.

Tetsuya Akashi

Ken Harada

Tsuyoshi Matsuda

Yoshihiko Togawa

Noboru Moriya

Toshiaki Tanigaki

Akira Sugawara

Takeshi Kawasaki

Yoshio Takahashi

In a field emission electron source used in an electron optical device, a tip distal end portion of the field emission electron source includes a needle-shaped shunt having a diameter that is reduced toward a distal end, a substantially spherical protrusion formed at the distal end of the shunt, a coating that covers the shunt and the substantially spherical protrusion, and an opening through which a part of the substantially spherical protrusion is exposed, the shunt and the substantially spherical protrusion are formed by using first metal as a material, the coating is formed by using second metal as a material, and the second metal has a work function larger than a work function of the first metal.

Field emission electron source, electron optical device, and manufacturing method

An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.

Interferometric electron microscope

Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.

Sample holding mechanism, manufacturing method for same, and charged particle beam device

An electron microscope that measures electromagnetic field information separates an electric field distribution and a magnetic field distribution of a specimen with high precision to measure the electromagnetic field information. The electron microscope is configured with an electron source, an electron gun deflection coil, converging lensesand, an irradiation system astigmatic compensation coil, irradiation system deflection coilsand, a magnetic field application coil, an objective lens, an imaging system astigmatic compensation coil, imaging system deflection coilsand, a magnifying lens, an electron detector, a control analysis apparatus, and the like, and the control analysis apparatusrepeats a plurality of times measurement of first electromagnetic field information with an output signal from the electron detector by exercising first electron beam control after a first magnetic field is applied to the specimenand then measurement of second electromagnetic field information similarly by exercising second electron beam control after a second magnetic field is applied to the specimen, and separates and measures an electric field distribution and a magnetic field distribution with high precision from the obtained first and second electromagnetic field information.

Electron microscope for magnetic field measurement and magnetic field measurement method

A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area. An interferometer according to the present invention has upper-stage and lower-stage electron biprisms, and operates with an azimuth angle &#x3a6; between filament electrodes of the upper-stage and lower-stage electron biprisms to arbitrarily control an interference area and an azimuth &#x3b8; of the interference fringes formed therein.

Interferometer

In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses () are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.

Electron interferometer or electron microscope

An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle &#x3a6; among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth &#x3b8; of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth &#x3b8; of the interference fringes.

Interferometer having three electron biprisms

Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.

Charged particle beam equipment

The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprismsare used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.

Growing community of inventors

Fujimi, Japan

Tetsuya Akashi