Fuji Photo Film Company, Limited

Nuflare Technology, Inc.

Tetsuo Yamaguchi

Takayuki Abe

Nobuaki Inoue

Kazunobu Katoh

Hisashi Okamura

Kohzaburoh Yamada

Toshihide Ezoe

Takashi Hoshimiya

Masahiko Taniguchi

Ken-ichi Kuwabara

Fumio Hide

Morio Yagihara

Hisashi Okada

Kazumi Nii

Nobutaka Ohki

Toshiro Takahashi

Hirokazu Kyota

Masato Hirano

An exposure mask fabrication method includes measuring and storing defect position data, for each EUV exposure mask blank, that indicates the position of at least one defect in each of plural EUV exposure mask blanks, inputting pattern data defining a figure pattern to be written, searching, when the figure pattern is written, in plural EUV exposure mask blanks, an EUV exposure mask blank where the figure pattern can be arranged such that the number of defects not located in a light shielding region is less than or equal to a threshold value, based on the arrangement position of the figure pattern in the pattern data, using the defect position data for each EUV exposure mask blank, and writing the figure pattern on a searched EUV exposure mask blank such that the number of defects not located in the light shielding region is less than or equal to the threshold value.

Exposure mask fabrication method, exposure mask fabrication system, and semiconductor device fabrication method

A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.

Charged particle beam writing method

Photothermographic material

Silver halide photographic light-sensitive material and processing method thereof

A silver halide photographic material is provided which comprises a support having thereon at least one light-sensitive silver halide emulsion layer wherein said light-sensitive layer or another hydrophilic colloidal layer provided on the support contains a compound represented by formula (I) and a hydrazine derivative represented by formula (II): ##STR1## wherein R.sup.1 and R.sup.2 may be the same or different and each represents a hydroxyl, hydroxylamino, amino, alkylamino, arylamino, aralkylamino, alkoxy, phenoxy, alkyl, aryl, alkylthio, or phenylthio group, ##STR2## wherein R.sup.3 represents an aliphatic or aromatic group; R.sup.4 represents a hydrogen atom, or an alkyl, aryl, alkoxy, aryloxy, amino or hydrazino group; G.sup.1 represents a --CO--, --SO.sub.2 --, --SO--, --P(O)R.sup.4, --CO--CO--, thiocarbonyl or iminomethylene group; and A.sup.1 and A.sup.2 each represents a hydrogen atom, or one of A.sup.1 and A.sup.2 represents a hydrogen atom and the other represents a substituted or unsubstituted alkylsulfonyl, arylsulfonyl or acyl group. In a preferred embodiment, the silver halide photographic material contains a redox compound which undergoes oxidation to release a development inhibitor.

Silver halide photographic material

A silver halide photographic material comprising a support having thereon at least one light-sensitive silver halide hydrophilic colloid emulsion layer, at least one light-insensitive hydrophilic colloid layer interposed between the support and at least one silver halide emulsion layer, and at least one hydrazine derivative selected from the group consisting of compounds represented by the general formula (1) and (2) contained in the at least one of hydrophilic colloid layers provided in the same side of the support as that coated with the light-sensitive silver halide hydrophilic colloid emulsion layer: ##STR1## wherein their substituents are defined in the specification.

A silver halide photographic material containing at least one silver halide emulsion layer on a support is provided. The silver halide emulsion layer comprises chemically sensitized silver halide grains having a silver chloride content of 50 mol % or more, said silver halide emulsion has been spectrally sensitized with at least one dye selected from the dyes represented by one of the general formulas (1), (2) and (3) shown in the specification. The emulsion layer or at least one other hydrophilic colloidal layer contains at least one member selected from the hydrazine derivatives represented by one of the formulas (4), (5) and (6) shown in the specification and at least one compound selected from the compounds represented by one of the formulas (7), (8), (9), (10), (11) and (12) shown in the specification. A process for the formation of an image is also provided, which comprises the development of a silver halide photographic material as defined above with a developer having a pH value of 9.6 to less than 11.0.

Silver halide photographic material and process for the formation of

Disclosed is a silver halide photographic material comprising:

Method for developing a silver halide photographic material

Disclosed is a silver halide photograhic material which includes a support and at least one emulsion layer. The material also contains a hydrazine derivative and 8-hydroxyguinoline or a derivative thereof. The emulsion may have been subjected to selenium and/or tellurium sensitization.

Silver halide photographic materials

A silver halide photographic material comprising a support having thereon at least one sensitive silver halide emulsion layer, wherein said emulsion layer comprises a monodisperse emulsion and said emulsion layer or other hydrophilic colloid layer contains at least one hydrazine derivative and at least one redox compound capable of releasing a development inhibitor when oxidized.

Growing community of inventors

Kanagawa, Japan

Tetsuo Yamaguchi