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Tetsuo Shinomiya

Hiroshi Miyahara

Mitsuo Nagai

Koji Shinobudani

Kazuhiro Ueshima

Yasuharu Nosho

Masakazu Kato

Shinichi Hashimoto

Toshiyuki Ninomiya

Nobuhiro Haramoto

A device and a method for continuous high-pressure treatment; the method, comprising the steps of increasing the pressure of raw materials ( ) in a feed tank ( ) by a pressurizing pump ( ) so as to continuously feed the raw material to treatment containers ( ) and ( ) and increasing the flow rate of the pressurizing pump ( ) over that of a depressurizing pump ( ) or continuously exhausting the raw material from the treatment containers ( ) and ( ) through a pressure regulating flow path resistance ( ) while depressurizing; the device, comprising pressure releasing bypass circuits ( ) disposed in the flow path resistance ( ) in parallel with each other, wherein the insides of the treatment containers ( ) and ( ) are kept in a specified high-pressure state during the continuous processing.

Device and method for continuous high-pressure treatment

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Hiroshima, Japan

Tetsuo Shinomiya