Ebara Corporation

Tetsuo Komai

Keiichi Ishikawa

Shinichi Sekiguchi

Takeshi Tsuji

Yuji Shirao

Tomonori Ohashi

Rikiya Nakamura

Kazutaka Okuda

Yoshiro Takemura

Tadakazu Nishikawa

Yasutaka Muroga

Tetsuro Sugiura

Kazutomo Miyazaki

Seiji Kashiwagi

Hiroki Furuta

Hiroyuki Yamada

Kohtaro Kawamura

Takanori Inada

Takashi Kyotani

Junichi Hayakawa

Kotaro Kawamura

Koichi Iwasaki

Norio Kimura

Nobuharu Noji

Akira Fukunaga

Hiroshi Aono

Naoya Yoshida

Toru Osuga

Yoichi Mori

Toyoji Shinohara

Norihiko Nomura

Atsushi Shiokawa

Atsushi Oyama

Motoyasu Sato

Kazumasa Hosotani

Takeshi Eda

Yasuteru Aoki

A detoxifying devicehaving an inner wallthat forms a flow passagethrough which treatment gas flows includes a first pipingthat forms a part of the flow passage, a replaceable piping sectionthat forms a part of the flow passageat the position downstream of the first piping, and is connected thereto for sprinkling the cleaning water to remove the solid product adhering to the inner wall, and a second pipingthat forms a part of the flow passageat the position downstream of the piping section, and is connected thereto.

Detoxifying device, method of replacing piping section of detoxifying device, and method of cleaning piping of detoxifying device

The present invention relates to a vacuum evacuation system used to evacuate a processing gas from one or more process chambers for use in, for example, a semiconductor-device manufacturing apparatus. The vacuum evacuation system is a vacuum apparatus for evacuating a gas from a plurality of process chambers (). The vacuum evacuation system includes a plurality of first vacuum pumps () coupled to the plurality of process chambers () respectively, a collecting pipe () coupled to the plurality of first vacuum pumps (), and a second vacuum pump () coupled to the collecting pipe ().

Vacuum evacuation system

A burner head that constitutes a combustion chamber for an exhaust gas processing apparatus by being attached to an upper portion of a combustion chamber main body is provided. The burner head includes a chassis which has a cylindrical portion having a lower opening and in which a fastening module for removably fastening to the combustion chamber main body is provided, a fuel nozzle that blows fuel into the cylindrical portion, a combustion supporting gas nozzle that blows combustion supporting gas into the cylindrical portion, a processing gas nozzle that blows processing gas into the cylindrical portion, and a pilot burner that ignites the fuel and/or the combustion supporting gas.

Burner head for exhaust gas processing apparatus, manufacturing method of the same, combustion chamber for exhaust gas processing apparatus, and manufacturing method and maintenance method of the same

A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a main pump capable of evacuating gas from an atmospheric pressure and a booster pump for increasing an evacuation speed of the main pump, and the at least one abatement part for treating the exhaust gas is connected between the main pump and the booster pump.

Vacuum pump with abatement function

A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a pair of multistage pump rotors each of which comprises a plurality of rotors arranged on a rotating shaft, and the at least one abatement part is connected to an interstage of the multistage pump rotors.

An exhaust gas treatment apparatus for treating an exhaust gas discharged from an EUV (Extreme Ultra Violet) exposure equipment by combustion treatment to make the exhaust gas harmless is disclosed. The exhaust gas treatment apparatus includes a cylindrical combustion chamber configured to combust a processing gas containing hydrogen, and a processing gas nozzle and an oxidizing gas nozzle provided on the combustion chamber and configured to blow the processing gas and an oxidizing gas, respectively, in a tangential direction to an inner circumferential surface of the combustion chamber, wherein the processing gas nozzle and the oxidizing gas nozzle are positioned in the same plane perpendicular to an axis of the combustion chamber.

Exhaust gas treatment apparatus

A hybrid stepping motor has a connector housing formed integrally with an insulator having an upper insulator and a lower insulator. The hybrid stepping motor includes a stator core and output terminals concentrically disposed outside the stator core. A wiring pattern serving as the output terminals has connector pins and land portions disposed eccentrically with respect to one another. The land portions are formed on an outer edge side of the wiring pattern. A surface, which is an uppermost surface of the wiring pattern, is located below a lowermost surface, in which jumper wires and lead wires pass, of the lower insulator. The lead wires are pulled out from a lower side, and are pulled out to guiding grooves.

The fan scrubber is provided with a casing having a gas draw-in port and a gas ejection port, a fan disposed in the casing, a nozzle from which a liquid is jetted into the casing, and a canned motor connected to the fan. The canned motor has a main shaft connected to the fan, a rotor which rotates integrally with the main shaft, a stator disposed on the periphery of the rotor, a motor casing in which the rotor and the stator are housed, and a can which partitions the interior of the motor casing into a rotor chamber in which the rotor is disposed and a stator chamber in which the stator is disposed.

Fan scrubber and vacuum pump apparatus

An exhaust pipe () includes an inner cylinder () having an exhaust gas passage (') formed therein, an outer cylinder provided outside the inner cylinder with a gap () being formed therebetween and a heating device () attached to the inner cylinder. The gap () is communicated with the exhaust gas passage (&#x2032;). When a gas is discharged from the reaction vacuum chamber, a vacuum is created not only in the exhaust gas passage (&#x2032;) but also in the gap (). Therefore, release of heat from the heating device to the outside can be suppressed. Consequently, the inner cylinder () can be efficiently heated to a sufficiently high temperature, thus preventing deposition and accumulation of a substance contained in the discharged gas on the inner surface of the inner cylinder (). The deposition and accumulation of such a substance can also be prevented by forming a gas flow layer () of, for example, an inert gas, along the inner surface of the inner cylinder (

Exhaust pipe having means for preventing deposition of a reaction by-product and method for preventing deposition of a reaction by-product

A combustion type waste gas treatment system capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.

Combustion type waste gas treatment system

The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiHand a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiOto be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone (), which is open toward a combustion chamber (), surrounded by a peripheral wall (), and closed by a plate () remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone (), and the mixed gases are ejected toward the combustion chamber () perpendicularly to the plate ().

Burner for treating waste gas

A combustion type waste gas treatment system is capable of oxidatively decomposing a hazardous combustible waste gas while heating efficiently with a structure which allows the waste gas to mix with an auxiliary burning gas efficiently without the occurrence of backfire in a waste gas inlet pipe. The combustion type waste gas treatment system has a burner part and a combustion chamber. Combustion flames are formed to extend from the burner part toward the combustion chamber, and a combustible waste gas is introduced into the combustion flames from waste gas inlet pipes thereby oxidatively decomposing the waste gas. A flow velocity accelerating device makes the flow velocity of the combustible waste gas flowing through the waste gas inlet pipe higher than the burning velocity of the combustible waste gas.

The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone ( ), which is open toward a combustion chamber ( ), surrounded by a peripheral wall ( ), and closed by a plate ( ) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone ( ), and the mixed gases are ejected toward the combustion chamber ( ) perpendicularly to the plate ( ).

Combustor for exhaust gas treatment

The present invention aims to provide a process and an apparatus for recovering a PFC gas, which can readily bring cooling traps to a cryogenic temperature with a low-capacity refrigerator and can recover a high-purity PFC gas by applying deep freeze separation without the need for a multistage fractionator. To achieve this object, the present invention relates to an apparatus for recovering a PFC gas from a mixed gas containing the PFC gas discharged from a vacuum processing chamber (etching chamber), comprising a cooling trap connected to the exhaust system of the vacuum processing chamber and adapted to freeze and collect a mixed gas discharged from said vacuum processing chamber, a non-PFC gas removal system for removing gases other than the PFC gas from the regenerated mixed gas emitted by vaporization of said frozen and collected gas after the operation of said cooling trap is stopped, and a recovery means for recovering a high-concentration PFC gas freed of gases other than the PFC gas in said non-PFC gas removal system, as well as a process therefor.

PFC gas recovery process and apparatus

An exhaust apparatus in an ion implantation system for implanting impurities into a target substrate is used for evacuating an ion source chamber. The exhaust apparatus comprises at least one vacuum pump which does not use working oil for evacuating the ion source chamber, an atmospheric exhaust pipe connected to the vacuum pump for exhausting gas from the vacuum pump; and a device for introducing inert gas into at least one of the vacuum pump and the atmospheric exhaust pipe. The exhaust apparatus includes at least two vacuum pumps comprising a turbomolecular pump and a dry pump.

Growing community of inventors

Tokyo, Japan

Tetsuo Komai