Sharp Kabushiki Kaisha Corporation

Mitsubishi Gas Chemical Company, Inc.

Tetsunori Tanaka

Shoji Okazaki

Wataru Nakamura

Yuki Yasuda

Yukinobu Nakata

Takeshi Yaneda

Masaki Fujiwara

Mayuko Sakamoto

Kenichi Kitoh

Hiromitsu Katsui

Keiichi Tanaka

Tohru Sonoda

Tohru Okabe

Tohru Senoo

Atsushi Ban

Yoshimasa Chikama

Hiroshi Sugimoto

Tetsuo Fujita

Tokuo Yoshida

Takehisa Sakurai

Kazuki Kobayashi

Taketo Maruyama

Satoshi Okabe

Yukimine Shimada

Tomoyuki Adaniya

Toshiyuki Gotou

In a display device, a through-hole and a surrounding region surrounding the through-hole are provided inside an edge of a display region, in which there are provided a first bypass wiring line formed in a first metal layer and bypassing the through-hole in the surrounding region, a first divided wiring line formed in the first metal layer and divided onto one side and the other side of the through-hole, a second bypass wiring line formed in a second metal layer and bypassing the through-hole in the surrounding region, and a second divided wiring line formed in the second metal layer and divided onto one side and the other side of the through-hole.

Display device

A barrier film is formed on a resin layer so as to include a missing part where a portion of the barrier film is missing in a central end region of the resin layer.

Flexible display device that suppresses peeling of a layered structure

In a non-flexible substrate () including a base layer (), the base layer () includes a portion where a first resin layer (), an inorganic film ('), and a second resin layer () are layered in this order, and at an end portion of the base layer (), the second resin layer () is formed in contact with a glass substrate ().

Flexible display device having non-flexible substrate having base layer including inorganic film between resin layers

Method for producing flexible display device to suppress peeling of a layered structure

In a bending region provided in a frame region, an opening is formed in an inorganic layered film, a plurality of residual layers of the inorganic layered film are provided in island shapes in a plan view in the opening, and a frame wiring line is disposed between the adjacent residual layers.

Display device with wiring line between islands in bending region

Provided is an organic EL display device including a resin substrate layer, a TFT layer provided on the resin substrate layer, and a light-emitting element that is provided on the TFT layer and constitutes a display region. The resin substrate layer includes a first resin layer, an inorganic layer, and a second resin layer, which are provided in that order from a side opposite to the TFT layer. The interior of the first resin layer contains a plurality of air bubbles.

Display device and method for manufacturing same where a resin layer containing air bubbles

In a case in which a curvature of a flexible organic EL display panel provided in a display device is zero, an absolute value of film stress of a first layered film, from a lower face film, formed in first regions in the flexible organic EL display panel is compressive stress and is greater than an absolute value of film stress of a second layered film, from the lower face film, formed in a second region.

Display device comprising flexible display panel

In a bending region in a frame region, a slit is formed in at least one inorganic film included in a TFT layer extending through the inorganic film and exposing an upper surface of a second resin film of a resin substrate layer, and at least one opening is formed in an inorganic insulating film of the resin substrate layer in the bending region. In the opening, a first resin film and the second resin film are in contact with one another.

Included are the steps of: forming a laminated body () by disposing a resin layer (), an inorganic layer () having mean stress (Px) of 0 (zero) or having tensile stress, a TFT layer (), an OLED element layer (), and a sealing layer () in this order on an upper side of a supporting substrate (); and separating the supporting substrate () from the laminated body ().

OLED panel production method and OLED panel production apparatus

An organic EL display device includes a reflective electrode and a transparent electrode disposed facing each other with an organic EL layer interposed therebetween. The reflective electrode includes a reflective film and a protection film formed on the reflective film, and the protection film includes a frame-shaped portion surrounding the periphery of the organic EL layer and an opening surrounded by the frame-shaped portion. This improves the reflectivity of the reflective electrode while protecting the reflective electrode.

Organic EL display device and method for manufacturing organic EL display device

A method of manufacturing a flexible display device, includes forming a base layer on a non-flexible substrate, the base layer including a first resin layer, an inorganic film, and a second resin layer, wherein the forming of the base layer includes a first step of forming the first resin layer inward from an end portion region of the non-flexible substrate, a second step of forming the inorganic film on the first resin layer such that the non-flexible substrate and/or the first resin layer is exposed, and a third step of forming the second resin layer in contact with the non-flexible substrate exposed from the inorganic film and/or the first resin layer exposed from the inorganic film, and the method further includes peeling the non-flexible substrate and bonding a flexible substrate to the first resin layer via an adhesive layer.

Non-flexible substrate having base layer including inorganic film between resin layers, flexible display device and method for producing same

A semiconductor device provided in a pixel circuit of a display device includes, in order from a lower side: a substrate; an LTPS layer; a first gate insulating layer; a first metal layer; a first flattened layer; a second gate insulating layer; an oxide semiconductor layer; a second metal layer; a passivation layer; and a third metal layer. The gate electrode layer of an LTPS-TFT and the gate electrode of an oxide semiconductor TFT are formed by the first metal layer.

Semiconductor device and method of manufacturing semiconductor device

A manufacturing method of a display device includes a layering process including steps of forming a PI layer on a carrier glass substrate, forming a base coat layer to cover the PI layer, and forming a TFT layer and a light-emitting element layer on the base coat layer, an exposing process including a step of exposing an end surface of the PI layer, and a peeling process including a step of peeling the carrier glass substrate from the PI layer by irradiating the lower face of the PI layer with a laser light beam.

Manufacturing method of display device

An organic EL element including light emitting layers is formed above a first region of a main surface of a back film. A plurality of terminal portions are formed above a second region of the main surface of the back film. A cover film including an opening is provided as an uppermost layer above the main surface of the back film.

Flexible display panel, flexible display device, and method for producing flexible display panel

A flexible display device has, in a folding portion, a slit that partitions a second electrode provided in common for a plurality of pixels, between a plurality of display units. In a plan view, in the slit, at least one of an organic insulating film, banks, and an organic layer has a slit, and a bulging portion formed by the organic insulating film and the banks is provided so as to surround each of the partitioned second electrodes.

Growing community of inventors

Sakai, Japan

Tetsunori Tanaka