Pioneer Corporation

Nec Corporation

Panasonic Corporation

Tetsumasa Okamoto

Tadashi Nakamura

Yoshito Tanaka

Yoshio Sano

Nobumitsu Aibara

Naoto Hirano

Keiji Nunomura

Toshiyuki Akiyama

Yoshiaki Yanai

Kazuaki Yanagida

Hirokazu Tateno

Ribs for defining pixel cells are formed in the shape of a lattice, and sustain electrodes and scan electrodes are disposed near the ribs. The electrodes are spaced apart in each pixel cell, and the sustain electrode and the scan electrode are each cut away between pixel cells arranged in the row direction to provide each pixel cell with individually separated electrodes. In addition, between pixel cells adjacent to each other in the row direction, the sustain electrodes and the scan electrodes are connected to each other by means of a sustain-side bus electrode and a scan-side bus electrode, respectively. This makes it possible to provide a high luminous efficiency. Furthermore, each pixel cell is provided with a wide distance between the electrodes and thereby with a large effective opening portion. Thus, this provides only a small amount of reduction in intensity when the electrodes are spaced apart between the pixel cells arranged in the row direction in order to increase the luminous efficiency. The sustain electrodes or the scan electrodes can be connected to each other or shared between pixel cells adjacent to each other in the column direction and thus the effective opening portion can be made larger, thereby making it possible to provide a further increased intensity and luminous efficiency.

Plasma display panel and method for fabricating the same

Ribs for defining pixel cells are formed in the shape of a lattice, and sustain electrodes and scan electrodes are disposed near the ribs. The electrodes are spaced apart in each pixel cell, and the sustain electrode and the scan electrode are each cut away between pixel cells arranged in the row direction to provide each pixel cell with individually separated electrodes. In addition, between pixel cells adjacent to each other in the row direction, the sustain electrodes and the scan electrodes are connected to each other by means of a sustain-side bus electrode and a scan-side bus electrode, respectively. This makes it possible to provide a high luminous efficiency.

A partial oxide film on a base region is removed to form an opening, a polycrystalline silicon film is deposited directly thereon, and by dry etching, the polycrystalline silicon film is divided into a region including an impurity of same conductive type as the base, and a region including an impurity of reverse conductive type of the base. By heat treatment, the impurity is diffused from the polycrystalline silicon film into the base region, and an external base diffusion layer and an emitter diffusion layer are formed. In succession, the surface of the polycrystalline silicon film is formed into polyside film to lower the resistance, and by using the polycrystalline silicon film as emitter electrode and base electrode, a fine base and emitter area is realized.

Semiconductor device and manufacturing method of the same

Growing community of inventors

Tokyo, Japan

Tetsumasa Okamoto