Shin-etsu Chemical Co., Ltd.

Other

Heraeus Quarzglas Gmbh & Co Kg

Shin-etsu Quartz Products Co., Ltd.

Shin-etsu Quartz Products Ltd.

Opto-electronics Laboratory, Inc.

Tetsuji Ueda

Akira Fujinoki

Hiroyuki Nishimura

Hisatoshi Otsuka

Shigeru Maida

Masanobu Ezaki

Martin Trommer

Akira Sato

Stefan Ochs

Toru Yokota

Yasuyuki Yaginuma

Masahiro Nakatsuka

Michinari Ohuchi

Hidetsugu Yoshida

On an EUV light-reflecting surface of titania-doped quartz glass, an angle (&#x3b8;) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

Titania-doped quartz glass and making method

Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900&#xb0; C. for 100 hours as suitable material for the EUV lithography member.

Titania doped quartz glass and making method

A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.

EUV lithography member, making method, and titania-doped quartz glass

It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same

An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide and a synthetic quartz glass for optical use. The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiOpowder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.

Method for heat treating synthetic quartz glass for optical use

An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.

Method of producing an optical member

An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F excimer laser and a high resistance against irradiation of a F excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5&times;10 molecules/cm or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2&times;10 or lower.

Synthetic quartz glass optical material and optical member

A method for heat treating a synthetic quartz glass for optical use in a heating furnace, that comprises covering the surroundings of a synthetic quartz glass body with a SiO powder having a mean dissolved hydrogen molecule concentration of 1&times;10 molecules/cm or higher, and then heat treating the body.

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Koriyama, Japan

Tetsuji Ueda