Canon Kabushiki Kaisha

Tetsuji Okada

Noriyasu Hasegawa

Tosiya Asano

Hiroshi Sato

Naoki Maruyama

Keiji Emoto

Yuichiro Oguchi

The present invention provides a simulation method of predicting a behavior of a composition in processing of bringing the composition arranged on a first member into contact with a second member and forming a film of the composition on the first member, comprising: predicting the behavior of the composition in the processing; calculating a distribution of distortion that occurs in at least one of the first member and the second member in the processing; and displaying the distribution of distortion calculated in the calculating, wherein in the displaying, in a case where at least one piece of input information is selected from a plurality of pieces of input information used to predict the behavior of the composition, the at least one piece of input information is displayed to be superimposed as a two-dimensional image on the distribution of distortion.

Simulation method, simulation apparatus, film forming apparatus, article manufacturing method, and non-transitory computer-readable storage medium

An imprint method of performing an imprint process for a shot region of a substrate using a mold is provided. The substrate includes a valid region where a chip is to be formed, and an invalid region outside the valid region where no chip is to be formed, and the invalid region is a region formed by etching an outer region outside the valid region. The method includes deciding, based on a height difference between the valid region and the invalid region, an imprint condition for a partial shot region defined by an outer edge of the valid region, and performing the imprint process for the partial shot region in accordance with the decided imprint condition.

Imprint method and article manufacturing method

An imprint apparatus that cures an imprint material on a substrate in a state where a mold is in contact with the imprint material includes a substrate holding unit having a plurality of holding regions that holds the substrate, and a control unit configured to control a pressure in each of the holding regions independently, wherein the control unit controls the pressure based on at least one of shape information and distortion information of the substrate, at least when the imprint material is cured.

Imprint apparatus and method of manufacturing article

The present invention provides an imprint apparatus including an amplifier configured to amplify a signal of displacement between a mold and a substrate, and a control unit configured to perform alignment between the mold and the substrate based on the amplified signal, wherein the control unit performs the alignment through a first operation of moving the substrate with respect to the mold in a first direction and a second operation of moving the substrate with respect to the mold in a second direction that is opposite to the first direction, and in the first operation, the control unit sets the gain of the amplifier to a first gain and changes the gain of the amplifier from the first gain to a second gain.

Imprint apparatus and article manufacturing method

The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.

Lithography apparatus, and method of manufacturing article

The present invention provides an imprint apparatus which forms an imprint material on a substrate using a mold, comprising a driving unit driving at least one of the mold and the substrate, a measurement unit measuring a position deviation amount between the mold and the substrate, and a control unit controlling alignment between the mold and the substrate based on the position deviation amount, wherein in a first period from a start of contact between the mold and the imprint material until a distance between the mold and the substrate falls within a target range, and a second period in which the distance is maintained, the control unit obtains a command value for controlling the driving unit and controls the driving unit such that a amplification factor of the command value in the second period is larger than that in the first period.

At least three processing machines are positioned on a supporting structure including a plurality of beams spaced apart from each other. The at least three processing machines include a first processing machine, a second processing machine supported by at least one of beams which support the first processing machine, and a third processing machine supported by beams different from all the beams which support the first processing machine. A distance between the first processing machine and the second processing machine, at which an amount of vibration transferred from the first processing machine to the second processing machine becomes smaller than a predetermined amount, is determined, thereby positioning the first processing machine and the second processing machine with a distance not less than the determined distance.

Growing community of inventors

Utsunomiya, Japan

Tetsuji Okada