Seiko Epson Corporation

Seiko Epson Kabushiki Kaisha

Tetsuhiko Takeuchi

Hidehito Iisaka

Satoru Miyashita

Sadao Kanbe

Motoyuki Toki

Hidefumi Sakata

Shohei Yoshida

Takahiro Katakura

Setsuya Iwashita

Tomio Sonehara

Tomoyuki Kamakura

Takeshi Miyashita

Yasutoshi Hideshima

Shunsuke Uchizono

Hirohito Kitabayashi

A thixomolding material includes: a metal body containing magnesium(Mg) as a primary component; a plurality of coating particles provided at a front surface of the metal body and having an average particle diameter equal to or less than 100 μm, the plurality of coating particles being made of an inorganic material differing from the metal body; and an interposed particle interposed between the metal body and the coating particles and having an average particle diameter smaller than the coating particle, the interposed particle being made of an inorganic oxide.

Thixomolding material and method of manufacturing thixomolding material

A three-dimensional forming apparatus includes: a stage; a material supply unit that supplies the stage with a sintered material including metal powder and a binder; a head unit that includes an energy radiation unit supplying energy capable of sintering the sintered material to the sintered material supplied by the material supply unit; a head base that holds a plurality of the head units; and a driving unit that is capable of three-dimensionally moving the head base relative to the stage.

Three-dimensional forming apparatus and three-dimensional forming method

The present invention provides a touch panel having pluralities of projections, each of the projections having a predetermined shape, formed on inner surfaces of a lower substrate and an upper substrate, respectively. The projections being formed in at least two directions with a substantially periodical pitch that is shorter than any wavelength of visible light. The touch panel can also include a lower transparent electrode and an upper transparent electrode formed over the inner surfaces of the lower substrate and the upper substrate having the pluralities of projections, respectively. The cross-sectional area of each of the projections parallel to the outer surface of the lower substrate is configured to decrease continuously from bottom to top of the projection. The same applies to the combination of each of the projections, the bottom and a top thereof, and the upper substrate. Accordingly, this structure reduces the light reflection and diffraction at the boundary between an air space and the transparent electrode, thereby providing a resistive contact-type touch panel or a electrostatic capacitive coupling-type touch panel having high light transmittance.

Touch panel and electronic device

An illumination device is provided that reduces the amount of light leaked to improves illumination efficiency. Electroluminescent elements are formed on one surface of a transparent substrate. The electroluminescent elements are provided with at least a transparent electrode, a light emitting layer, and a reflective electrode in order from the outgoing surface of the transparent substrate. Concavities are formed on one surface of the transparent substrate and the reflective electrode is formed in the concavities. Alternatively, electroluminescent elements are arranged in a planar configuration, and the intervals between the electroluminescent elements and the intervals between the pixels are set so as not to be equal to each other. Also, the directions in which the electroluminescent elements extend and the directions in which the pixels are aligned are set so as not to be parallel to each other.

Illumination device and manufacturing method therefor, display device, and electronic instrument

There is provided a novel structure in which in a liquid-crystal display device including active devices a sufficient writing operation is ensured and a decrease in voltage applied to liquid crystal is prevented by a method different from a method for improving the device characteristics of active devices such as MIM devices. MIM devices,are connected to scanning lines,, and pixel electrodes,are connected to the MIM devices,. One electrode of an electrostatic capacitor C,is connected to a point at which the MIM device,and the pixel electrode,are connected, and another electrode of the electrostatic capacitor C,is connected to stable potential V,.

Liquid-crystal display device

A method for preparing a silica glass article of improved purity is provided. The article is prepared by a sol-gel method and is then heat treated to a selected temperature between about 1500.degree. and 2200.degree. C. and maintained at the selected temperature for a predetermined period of time sufficient to remove silica crystals, inclusions, microcracks and bubbles. The resulting silica glass articles have improved purity and can be used as photomask substrates or as preforms for optical fibers.

Method of preparing silica glass

In a forming a silica glass at low temperature, a fumed silica is added to a hydrolyzed solution of a metal alcoxide. 0.2-5 mol of fumed silica is added to 1 mol of metal alcoxide. Being uniformly dispersed, the solution is gelled and dried to be dry gel and then sintered to be non-porous. This process allows a practically large sized silica glass to be materialized which has been impossible by the previous sol-gel technology. In addition, a further large silica glass can be prepared by adjusting pH value to 3-6 with addition of base in the sol solution.

Growing community of inventors

Nagano-ken, Japan

Tetsuhiko Takeuchi