Toflo Corporation

Tetsuaki Sekine

Takahiro Kawamoto

Shinji Tobimatsu

Takuo Shimada

An object is to provide a flow rate control device that can suppress a manufacturing cost and greatly reduce burdens of setting and maintenance. A flow rate control deviceof the invention is comprised with a flow rate adjusting valvethat is installed in a flow path, a flow rate measurement partthat measures a flow rate of a fluid flowing through the flow path, a controllerthat controls opening degrees of the flow rate adjusting valvebased on a measurement result of the flow rate measurement part, and a pressure deficiency detecting function that detects pressure deficiency when a limit sensor(an opening detecting sensor) that detects the opening of the flow rate adjusting valvedetects the opening degrees are full. With the structure, it becomes possible, compared with a conventional system to detect a pressure deficiency using a pressure sensor, to suppress a manufacturing cost and greatly reduce burdens of setting and maintenance and to notify of pressure deficiency at a necessary timing in an early stage before an abnormality occurs due to a flow rate decrease.

Flow rate control device

A flowmeter includes a metallic body that has a flow path therein, an impeller that is rotatably supported in the flow path inside the body, a pickup coil that is configured to detect a number of rotations of the impeller, the pickup coil being disposed outside the body, a coil case that is made of metal, and accommodates the pickup coil, an amplifier circuit board that is configured to amplify a detection signal of the pickup coil, and an amplifier case that is made of resin, and accommodates the amplifier circuit board. The coil case and the amplifier case are connected via a resin case that is made of resin and includes an insulation material therein.

Growing community of inventors

Hino, Japan

Tetsuaki Sekine