Tosoh Corporation

Sagami Chemical Research Center

Sagami Chemical Research Institute

Tosoh F-tech, Inc.

Japan Finechem Company, Inc.

Tetsu Yamakawa

Noriaki Oshima

Taishi Furukawa

Ken-ichi Tada

Hidenori Aihara

Tsuyoshi Tanaka

Masaru Sato

Koichiro Inaba

Naoko Yanai

Hirokazu Chiba

Kenji Tokuhisa

Daisuke Uraguchi

Yoko Honma

Kyoko Yamamoto

Kenji Hirai

Tomoyuki Kinoshita

Kenichi Sekimoto

Toshiki Yamamoto

Toshio Inase

Mayumi Takamori

Tadahiro Yotsuya

Wakako Yokota

Takahiro Kawabata

Hidenori c/o Sagami Research Center Aihara

A composition that includes a high-valent compound of copper, silver or indium; a linear, branched or cyclic Calcohol; and a Group VIII metal catalyst forms a metal film of copper, silver or indium on a substrate when the composition is coated on the substrate and heated to reduce the high-valent compound. The composition may alternatively include metal particles of silver, copper or indium in which the surface layer of the particle includes a high-valent compound of copper, silver or indium. A metal film of copper, silver or indium may also be formed on a substrate by coating a substrate with the composition including the metal particles, and heating to reduce the high-valent compound in the same manner as above.

Composition for production of metal film, method for producing metal film and method for producing metal powder

A phenyl-substituted 1,3,5-triazine compound represented by the general formula (1): wherein Arand Arindependently represent substituted or unsubstituted phenyl, naphthyl or biphenylyl group; R, Rand Rindependently represent hydrogen atom or methyl group; Xand Xindependently represent substituted or unsubstituted phenylene, naphthylene or pyridylene group; p and q independently represent an integer of 0 to 2; and Arand Arindependently represent substituted or unsubstituted pyridyl or phenyl group. This compound is suitable for an organic electroluminescent device.

Phenyl-substituted 1,3,5-triazine compound, process for producing the same, and organic electroluminescent device containing the same as component

A phenyl-substituted 1,3,5-triazine compound represented by the general formula (1); wherein Arand Arindependently represent substituted or unsubstituted phenyl, naphthyl or biphenylyl group; R, Rand Rindependently represent hydrogen atom or methyl group; Xand Xindependently represent substituted or unsubstituted phenylene, naphthylene or pyridylene group; p and q independently represent an integer of 0 to 2; and Arand Arindependently represent substituted or unsubstituted pyridyl or phenyl group. This compound is suitable for an organic electroluminescent device.

Since the conventional electron transporters have low thermal stability, the organic electroluminescent devices using them are not sufficient in terms of the compatibility of their luminance and luminous efficiency with device lifetime. A 1,3,5-triazine derivative of formula (1) is obtained by a metal catalyst-aided coupling reaction of a compound of formula (2) with a compound of formula (3), and this is used as a composing component of an organic electroluminescent device. [In the formulae, Arand Arrepresent phenyl group or the like, Rand Rrepresent hydrogen atom or the like, Rrepresents methyl or the like, m is an integer of 0 to 2, X represents 2,4-pyridylene or the like, p is 1 or 2, a and b are 1 or 2, a+b is 3, q is 0 or an integer of p or less, M represents &#x2014;MgRgroup or the like, Rrepresents chlorine atom or the like, r is p-q, and Y represents a leaving group.]

1,3,5-triazine derivative, production method thereof and organic electroluminescence device comprising this as a composing component

Provided is a reaction reagent for trifluoromethylation with high general versatility and good efficiency. The reaction reagent for trifluoromethylation contains an iron compound, trifluoromethyl iodide, a sulfoxide and a peroxide, and may further contain an acid. The iron compound is, for example, iron(II) sulfate, ammonium iron(II) sulfate, iron(II) tetrafluoroborate, ferrocene, bis(&#x3b7;-pentamethylcyclopentadienyl)iron or an iron powder; the sulfoxide is, for example, dimethyl sulfoxide; the peroxide is, for example, hydrogen peroxide or hydrogen peroxide-urea composite; and the acid is, for example, sulfuric acid, tetrafluoroboric acid or trifluoromethanesulfonic acid.

Reaction reagent for trifluoromethylation

Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for producing the same, a metal-containing thin film using the same, and a method for producing the same. The present invention relates to producing an imide complex represented by the general formula (1) by, for example, the reaction between M(NR)X(L)(2) and an alkali metal alkoxide (3): (wherein Mrepresents niobium atom or tantalum atom, Rrepresents an alkyl group having from 1 to 12 carbon atoms, Rrepresents an alkyl group having from 2 to 13 carbon atoms, X represents halogen atom, r is 1 when L is 1,2-dimethoxyethane ligand, r is 2 when L is pyridine ligand, and Mrepresents an alkali metal), and producing a niobium- or tantalum-containing thin film by using the imide complex (1) as a raw material.

Imide complex, method for producing the same, metal-containing thin film and method for producing the same

Nucleobases are perfluoroalkylated in a one step process with a perfluoroalkyl halide in the presence of a sulfoxide, a peroxide and an iron compound. Compounds so produced are useful as medicinal drugs, intermediates for medicinal drugs and agricultural chemicals.

Nucleobase having perfluoroalkyl group and process for producing the same

In a process for producing 1-substituted-3-fluoroalkyl-pyrazole-4-carboxylate (3) by a reaction of 2-alkoxymethylenefluoroacylacetate (1) and hydrazine (2), the reaction is conducted in the presence of a base and water, to produce 1-substituted-3-fluoroalkylpyrazole-4-carboxylate (3) with high selectivity and yield. This novel process enables to produce 1-substituted-3-fluoroalkylpyrazole-4-carboxylate (3), which is useful as an intermediate for pharmaceuticals and agrochemicals, with high selectivity and yield by simple and safe operations.

Process for producing 1-substituted-3-fluoroalkylpyrazole-4-carboxylate

A compound which has thermal stability and moderate vaporizability and is satisfactory as a material for the CVD or ALD method; a process for producing the compound; a thin film formed from the compound as a raw material; and a method of forming the thin film. A compound represented by the general formula (1) is produced by reacting a compound represented by the general formula (2) with a compound represented by the general formula (3). The compound produced is used as a raw material to form a metal-containing thin film. [Chemical formula 1] (1) [Chemical formula 2] (2) [Chemical formula 3] M(NRR)(3) (In the formulae, M represents a Group 4 element, aluminum, gallium, etc.; n is 2 or 3 according to cases; Rand Reach represents Calkyl, etc.; Rrepresents Calkyl, etc.; Rand Reach represents Calkyl, etc.; X represents hydrogen, lithium, or sodium; p is 1 or 2 according to cases; and q is 4 or 6 according to cases). 

Metal-containing compound, its production method, metal-containing thin film, and its formation method

Objects of the present invention are to provide a novel titanium complex that has good vaporization characteristics and an excellent thermal stability, and becomes a raw material for forming a titanium-containing thin film by methods such as CVD method or ALD method, its production method, a titanium-containing thin film formed using the same, and its formation method. In the invention, a titanium complex represented by the general formula (1) is produced by reacting a diimine represented by the general formula (2) and metallic lithium, and then reacting a tetrakisamide complex represented by the general formula (3). (In the formulae, Rand Rrepresent an alkyl group having from 1 to 6 carbon atoms. Rand Reach independently represents a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms. Rand Reach independently represents an alkyl group having from 1 to 4 carbon atoms.).

Titanium complexes, their production methods, titanium-containing thin films, and their formation methods

A novel tantalum compound, a method for producing the novel tantalum compound, and a method for stably forming a tantalum-containing thin film which contains the desired element. The tantalum compound enables one to selectively form a tantalum-containing thin film free of halogen and the like, and various tantalum-containing thin films which contain the desired element.

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Tokyo, Japan

Tetsu Yamakawa