Maruzen Petrochemical Company, Limited

Teruyo Ikeda

Kazuhiko Haba

Yoshihisa Hayashida

Hiromitsu Baba

Ryo Fujisawa

Satoshi Kakuta

Takuro Satsuka

Toshifumi Takemori

Norio Futaesaku

Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Bifunctional (meth)acrylate compound and polymer

An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: 

Optical element material and method for producing same

A resin composition for photoimprinting, a cured product of the resin composition which is excellent in etching and heat resistance, and a pattern forming process using the resin composition are provided. The resin composition contains photocurable monomer (A) containing at least one carbazole compound of formula (I): a photocurable monomer (B) containing at least one compound of the following formulae (II), (III), and (IV): and a photopolymerization initiator (C). The weight ratio of the photocurable monomer (A) to the photocurable monomer (B) is from 30/70 to 87/13.

Resin composition for photoimprinting, pattern forming process and etching mask

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Ichihara, Japan

Teruyo Ikeda