Taiyo Ink Manufacturing Co., Ltd.

Teruo Saito

Masaki Sasaki

Nobuyuki Suzuki

Kazunobu Fukushima

Kyo Ichikawa

Miyako Ichikawa

Hitoshi Inagaki

A photosensitive resin composition and a method of forming a positive resist pattern by the use of the composition are disclosed. The photosensitive resin composition comprises (A) a resinous compound containing an acid-decomposing ester group, (B) a compound containing one ethylenically unsaturated bond in its molecule and possessing a group capable of forming a carboxylic acid via decomposition by the action of an acid, (C) a photo-acid generator, (D) a photo-radical polymerization initiator, and optionally (E) an epoxy resin. When this composition is applied to a substrate, exposed to an active energy ray of a wavelength enough to activate the photo-radical polymerization initiator (D) and not enough to activate the photo-acid generator (C) to radically polymerize the compound (B), selectively irradiated with an active energy ray of a wavelength enough to activate the photo-acid generator (C) and heated, the resinous compound (A) and the polymer of the compound (B) is thermally decomposed by the catalytic action of the acid generated by the photo-acid generator (C), with the result that the selectively irradiated part of the coating film will be rendered soluble in an aqueous alkaline solution. A positive resist pattern is formed by removing the selectively irradiated part by development. When the composition contains the epoxy resin (E), the coating film may be thermally cured.

Photosensitive resin composition and method for formation of resist pattern by use thereof

Disclosed are an organic acid salt of melamine represented by the following general formula (1) and a thermosetting and a photocurable and thermosetting coating compositions containing the salt mentioned above. ##STR1## wherein Z represents ##STR2## wherein R.sup.1 represents a hydrogen atom or an alkyl group, alkylene group, alicyclic hydrocarbon, or aromatic hydrocarbon severally having from 1 to 18 carbon atoms, or any of said groups or hydrocarbons whose hydrogen atom is substituted by carboxyl group, hydroxyl group, or a halogen atom, R.sup.2 represents a hydrogen atom or an alkyl group or alkylene group severally having from 1 to 9 carbon atoms, or any of said groups whose hydrogen atom is substituted by acryloyl group or methacryloyl group, R.sup.3 represents an alkyl group or alkylene group severally having from 1 to 9 carbon atoms, or any of said groups whose hydrogen atom is substituted by acryloyl group or methacryloyl group, and R.sup.4 represents an alkyl group or aromatic hydrocarbon severally having from 1 to 18 carbon atoms, or any of said group or hydrocarbon whose hydrogen atom is substituted by acryloyl group or methacryloyl group.

Organic acid salt of melamine, and thermosetting or photocurable,

Organic acid salt of melamine, and thermosetting or photocurable

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Iwatsuki, Japan

Teruo Saito