Fuji Photo Film Company, Limited

Teruo Nagano

Akira Nagashima

Toshiaki Aoai

Tadahisa Sato

Katsuyoshi Yamakawa

Koji Tamoto

Takashi Usami

Fumiaki Shinozaki

Masayuki Iwasaki

Tadao Toyama

Akira Umehara

Yoshimasa Aotani

Shun-ichi Ishikawa

Toshiyuki Sekiya

Akira Hasegawa

Eiji Nakakita

An ultraviolet-absorbing film comprising a fluorescent brightening agent and having a transmission of the rays of 410 nm or less of 90% or less, wherein the fluorescent brightening agent is represented by the following formula (I):wherein Rand Reach represents a hydrogen atom, an alkyl group or an alkoxyl group; Rand Reach represents an alkyl group; and [A] represents a substituted aryl or substituted ethenyl group.

Ultraviolet-absorbing film containing a fluorescent brightening agent

Fluorescent lamp cover and lighting fixture

The present invention relates to a positive working photosensitive composition having an improved sensitivity due to the use of a sensitizer and having an excellent incandescent light safety. This composition comprises at least 1 molar % of a structural unit derived from at least one of monomers having the following general formulae: ##STR1## wherein: R.sub.1 represents a hydrogen atom, an alkyl group or a substituted alkyl group,

Positive working photosensitive composition

A photosensitive composition containing a 2-halomethyl-5-substituted-1,3,4-oxadiazole compound represented by the following general formula (I): ##STR1## wherein A represents a substituted or unsubstituted aromatic residue; X represents a hydrogen atom, a cyano group, an alkyl group or an aryl group; Y represents a chlorine atom or a bromine atom; and n represents an integer of 1 to 3. The free radical generating agent represented by the general formula (I) has a photosensitive wavelength range from near ultraviolet range to visible range, high photo-decomposition sensitivity and good compatibility with other components present in the photosensitive composition. The photosensitive composition is suitable for use in light-sensitive printing plates or photo-resists.

Photosensitive composition with

A light-sensitive printing plate is disclosed. The printing plate is comprised of a support base having a light-sensitive layer positioned thereon and a matting layer comprised of a micropattern of protuberances. The protuberances are present in a regular or randomly mixed manner on the light-sensitive layer and are comprised of a copolymer. The copolymer includes a monomer (unit a) with a sulfonic acid group, a monomer (unit b) selected from the group consisting of alkyl acrylates having 1 to 10 carbon atoms in the alkyl moiety thereof and alkyl methacrylates having 4 to 10 carbon atoms in the alkyl moiety thereof and a monomer (unit c) copolymerizable with monomer (unit a) and monomer (unit b), monomer (unit c) as a copolymer having a glass transition point of 60.degree. C. or above. The matting layer does not cause staining of a film original when superposed thereon and is resistant to rubbing or pressure and provides a surface which can be vacuum contacted with a film in a short period of time.

Light-sensitive printing plate with patterned matting layer

The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R.sub.2 and R.sub.3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.

Photosensitive composition with o-quinonediazide compound and condensate

A photopolymerizable composition is described, which comprises a polymerizable compound containing at least one ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator is a combination of a 3-keto-substituted cumarin compound and an active halogeno compound. This composition can be easily cured by irradiation with radiation and, therefore, is very useful in the preparation of light-sensitive materials.

Photopolymerizable compositions

A high sensitivity photopolymerizable composition is disclosed. The composition includes a polymerizable compound having an ethylenically unsaturated bond and a photopolymerizable initiator represented by the general formula (I). ##STR1## The substituents within general formula (I) are defined within the specification. The composition has improved sensitivity and the initiator provides an increased polymerization rate. The composition may further include Michler's ketone and a N-methyl-2-benzoyl-.beta.-naphthothiazolin.

A light-sensitive composition containing a high molecular compound and a light-sensitive o-naphthoquinonediazide compound is disclosed. The high molecular compound includes a structure unit represented by the general formula (I): ##STR1## wherein R is a hydrogen atom or a methyl group, and Y is a phenylene group, a substituted phenylene group, a naphthylene group or a substituted naphthylene group. The light-sensitive composition makes possible the production of a light-sensitive material which can be developed under a wide range of development conditions to provide a lithographic printing plate having high printing durability.

Light-sensitive composition

A photosensitive composition containing at least one o-naphthoquinonediazide compound represented by the following general formula (I): ##STR1## wherein A represents a divalent aliphatic residue, a divalent substituted aliphatic residue, a divalent aromatic residue or a divalent substituted aromatic residue, and a discoloring agent which changes its color tone upon the interaction with a photodecomposition product of the o-naphthoquinonediazide compound. The photosensitive composition directly provides visible contrast between exposed portions and unexposed portions upon light exposure without development and is particularly useful for making lithographic printing plates, letterpress printing plates, IC circuits, photomasks, etc.

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Kanagawa, Japan

Teruo Nagano