Toyo Soda Manufacturing Co., Ltd.

Shin-etsu Chemical Co., Ltd.

Nippon Paint Compnay, Ltd.

Toyo Soda Manufacturing Ltd.

Teruo Fujimoto

Osamu Watanabe

Mikio Shiono

Akira Yamamoto

Minoru Takamizawa

Kingo Itaya

Kimio Shibayama

Mitsuru Nagasawa

Yoshiyuki Miyaki

Toshinobu Ishihara

Koichi Tsutsui

Yoshinobu Isono

Syotaro Ohno

Masatoshi Ohata

Kazuo Tago

Yoshitaka Fujita

Kazunori Se

Takeo Kazama

Ikedal Shoji

Disclosed are a block-graft copolymer comprising a polymer block having a repetitive unit represented by General Formula: ##STR1## wherein A represents an organopolysiloxane chain, a polyalkylene oxide chain, a polyalkylene-imine chain, a polyacrylate chain or a polyacryloyl chain, and a process for producing the same. This block-graft copolymer can have various performances such as an oxygen enrichment performance, an ion concentration property, a capability of forming a complex with a metal salt and a biocompatibility, depending on the kind of graft polymer chains.

Block-graft polymer and process for producing it

A graft copolymer having a plurality of polymer side chains is disclosed. The starting backbone polymer is a homopolymer or copolymer of a styrene derivative having a pendant vinylidene group on the benzene ring. The graft copolymer may be produced by metallizing said backbone polymer with an alkali metal and then polymerizing an ethylenically unsaturated monomer in the presence of the metallized polymer as an anionic polymerization initiator.

Graft polymerization of substituted styrene polymers having pendant

Disclosed are a block-graft copolymer comprising a polymer block having a repeating unit represented by General Formula (I): ##STR1## wherein A is a side chain and represents an organopolisiloxane chain, a polyacrylate chain, a polymethacrylate chain, polydiene chain, etc. and a process for producing the same. This block-graft copolymer can have various performances such as oxygen enrichment performance, biocompatibility, depending on the kind of side chains.

Block-graft copolymer

The invention provides a novel polymeric compound having crosslinkability by irradiation with actinic rays, e.g. ultraviolet light, and useful as a polymeric base ingredient of a negative type photoresist composition with high sensitivity and resistance against dry etching. The polymer is obtained by the anionic living polymerization of a vinylsilyl group-containing styrene derivative of the formula

Vinylsilyl group-containing monodisperse polymeric compound and a method

A process for producing an alkenylsilyl group-containing polymer compound, comprising polymerizing a vinyl monomer compound containing an alkenylsilyl group-containing styrene compound represented by General Formula (I): ##STR1## wherein R.sup.1 represents hydrogen atom, methyl group or ethyl group; R.sup.2 and R.sup.3 may be the same or different and each represent an alkyl group having 1 to 3 carbon atoms or phenyl group; and n is an integer of 0 to 4, by using an organic metallic compound as an initiator, wherein the polymerization is carried out in the presence of N-methylpyrrolidine. There can be obtained a monodisperse alkenylsilyl group-containing high molecular compound in which only the unsaturated bond in the styrene moiety of the compound of Formula (I) has been predominantly polymerized.

Process for producing polymer compound containing alkenylsilyl group

The negative-working photoresist composition of the invention comprises, as the polymeric constituent thereof, a polymeric compound obtained by the anionic living polymerization of a vinylphenyl substituted-vinyl dimethyl silane compound represented by the general formula

Method for the preparation of a patterned photoresist layer and a

This is a method for separating or purifying an amino acid from a mixture including other substance such as an inorganic salt other than the amino acid and/or a mutual mixture of amino acids including the amino acid by means of piezo-dialysis employing an amphoteric ion exchange membrane. This membrane is made from a ternary block copolymer having a molecular structure of straight chain in which first macro-molecule with a cation exchange group, second macromolecule with an anion exchange group and third macromolecule without ion exchange group are linked together.

Method for separating and purifying amino acid

A method for purifying and concentrating organic matters by employing an amphoteric ion-exchange membrane which is made of a ternary block copolymer consisting of a macromolecule poly A.sup.- having cation-exchange group, a macromolecule poly B.sup.+ having anion-exchange group and a macromolecule poly C having no ion-exchange group and allows sodium chloride to permeate at a concentration not lower than 100% of that in the starting aqueous solution when a pressure of 50 kg/cm.sup.2 is given to the starting aqueous solution of sodium chloride of 0.01 g/dl and by allowing inorganic salts to permeate selectively from an aqueous solution of the organic compounds containing the inorganic salts with giving an increased pressure thereto.

Method for purifying and concentrating organic matters

An amphoteric ion exchanger constituted by linking (1) first macromolecular chain A.sup.- having cation exchange groups, (2) second macromolecular chain B.sup.+ having anion exchange groups and (3) third macromolecular chain C having no ion exchange group into a straight chain to have a linking mode of the first chain and the second chain being separated from each other by the third chain.

Amphoteric ion exchanger and method of making same

A pattern formation with a negative type resist comprises forming a thin film made of a resist on a board and irradiating light or radiation; developing and etching the product. The resist is a diene polymer obtained by a living polymerization in the presence of an organometallic compound or a cyclic polymer thereof.

Pattern formation with negative type resist

A fine work process comprises forming a thin film made of a radiation sensitive polymer on a board; irradiating radiation; developing and etching the product. The radiation sensitive polymer comprises at least 10 wt. % of a polymer having repeat units: ##STR1## wherein R and R' respectively represent hydrogen atom or an alkyl group and n is an integer of number of substituent groups.

Fine fabrication process using radiation sensitive resist

A ternary block copolymer and a method for manufacturing it. The copolymer has a molecular structure consisting of a macro-molecule having a cation exchange group, a macro-molecule having an anion exchange group and another macro-molecule which does not have any ion exchange group. These macro-molecules are linked together into a straight chain.

Method for manufacturing block copolymer

In the polymerization of an anionically polymerizable monomer using a polymerization system comprising a monomer and a polymerization solvent wherein an organometallic compound polymerization initiator, soluble in said polymerization system and having the formula:

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Nagaoka, Japan

Teruo Fujimoto