Sanyo Electric Co., Ltd.

Panasonic Intellectual Property Management Co., Ltd.

Teruhiko Ienaga

Shingo Okamoto

Atsushi Nakauchi

Takaaki Nakajima

Tsuyoshi Takahama

Toshio Yagiura

Masayoshi Ono

Hiroyuki Taniguchi

Yasuo Kadonaga

Takuo Nakai

On a projected plane in parallel to the main surface of the solar cell module, an output interconnectionincludes: a first output interconnection sectionarranged along an conductive memberin a power non-generating field; and a second output interconnection sectionleading to the first output interconnection sectionin a power generating section X.

Solar cell module and method of manufacturing the solar cell module

Solar power cell

Solar power module

A photovoltaic element which directly converts an optical energy such as solar light into an electric energy. After many uneven sections are formed on the surface of an n-type crystalline silicon substrate ( ), the surface of the substrate ( ) is isotropically etched. Then the bottoms (b) of the recessed sections are rounded and a p-type amorphous silicon layer ( ) is formed on the surface of the substrate ( ) through an intrinsic amorphous silicon layer ( ). The shape of the surface of the substrate ( ) after isotropic etching is such that the bottoms of the recessed sections are slightly rounded and therefore the amorphous silicon layer can be deposited in a uniform thickness.

Photovoltaic element and method for manufacture thereof

A photovoltaic element which directly converts an optical energy such as solar light into an electric energy. After many uneven sections are formed on the surface of an n-type crystalline silicon substrate (,), the surface of the substrate (,) is isotropically etched. Then the bottoms (b) of the recessed sections are rounded and a p-type amorphous silicon layer (,) is formed on the surface of the substrate (,) through an intrinsic amorphous silicon layer (,). The shape of the surface of the substrate (,) after isotropic etching is such that the bottoms of the recessed sections are slightly rounded and therefore the amorphous silicon layer can be deposited in a uniform thickness.

Growing community of inventors

Izumisano, Japan

Teruhiko Ienaga