Ifire IP Corporation

Ifire Technology Corp.

Terry Hunt

Joe Acchione

Yongbao Xin

Dave Lovell

James Alexander Robert Stiles

Vincent Joseph Alfred Pugliese

Dan Daeweon Cheong

Abdul M Nakua

Paul Barry Del Bel Belluz

Stephen Charles Cool

Yong-seon Lee

Jim Stiles

Chi Kit Leung

The present invention is a method for gettering undesirable atomic species from a vaporizing atmosphere during deposition of multi-element thin film phosphor compositions. The method comprises vaporizing one or more getter species immediately prior and/or simultaneously during the deposition of a phosphor film composition within a deposition chamber. The method improves the luminance and emission spectrum of phosphor materials used for full colour ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.

Method for gettering oxygen and water during vacuum deposition of sulfide films

The present invention is a method for the deposition of a thin film of a pre-determined composition onto a substrate, the thin film comprising ternary, quaternary or higher sulfide compounds selected from the group consisting of thioaluminates, thiogallates and thioindates of at least one element from Groups IIA and IIB of the Periodic Table. The method comprises volatizing at least one source material of a sulfide of a pre-determined composition to form a sulfur-bearing thin film composition on a substrate and simultaneously inhibiting any excess quantity of sulfur-bearing species volatilized from the at least one source material from impinging on the substrate. The method improves the luminance and emission spectrum of phosphor materials used for full color ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.

Controlled sulfur species deposition process

The invention is a method of vacuum evaporation of a multi-element sulfur bearing thin film compositions onto a substrate. The method comprises targeting a source of gas or vapour sulfur species at one or more source materials that make up at least part of the thin film composition during evaporation of the source materials. The sulfur species is heated to a high temperature as it reaches the one or more source materials and there is a chemical interaction of the sulfur species with evaporant from the one or more source materials during deposition of said thin film composition. The method is particularly useful for the deposition of phosphors for full colour ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.

Hydrogen sulfide injection method for phosphor deposition

The invention relates to a thick film dielectric electroluminescent display having a patterned layer. The patterned layer is patterned using a laser ablation method including selecting a wavelength of laser radiation, a laser pulse length, a laser energy density and a sufficient number of laser pulses to pattern the layer without substantial ablation of or damage to other layers, whereby the wavelength of laser radiation is such that the laser radiation is substantially absorbed by the layer with minimal absorption by other layers, the laser pulse length is sufficiently short that during the duration of the laser pulse there is minimal heat flow from the layer to other layers, and the laser energy density and the sufficient number of laser pulses is sufficiently high that energy is deposited in layer, whereby at least a portion of the layer is ablated and the luminance of an unablated area of the display is comparable to the luminance of an equivalent area of an unpatterned but otherwise identical display.

Thick film dielectric electroluminescent display having patterned phosphor film with electronic band gap

The invention relates to a laser ablation method for patterning thin film layers for thick dielectric electroluminescent displays without substantial ablation of or damage to any other layers. Typically, the thin film layers are phosphor layers. The laser ablation method for patterning a thin film phosphor layer of a thick dielectric electroluminescent display includes selecting a wavelength of laser radiation, a laser pulse length, a laser energy density and a sufficient number of laser pulses to pattern the thin film phosphor layer without substantial ablation of or damage to other layers, whereby the wavelength of laser radiation is such that the laser radiation is substantially absorbed by the thin film phosphor layer with minimal absorption by other layers, the laser pulse length is sufficiently short that during the duration of the laser pulse there is minimal heat flow from the thin film phosphor layer to other layers, and the laser energy density and the sufficient number of laser pulses is sufficiently high that energy is deposited in the thin film phosphor layer, whereby the entire thickness of at least a portion of the thin film phosphor layer is ablated.

Laser ablation method for patterning a thin film layer

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Acton, CA, United States of America

Terry Hunt