Industrial Technology Research Institute

Ten-Hsing Jaw

Dong-Sing Wuu

Ching-Yi Wu

Chen-Kuei Chung

Yuan-Liang Lan

Hong-Ming Chen

Yi-Yung Wu

Ming-Ling Lee

Chu-Wen Chen

Tzung-Rue Hsieh

Kuo-Lung Lei

Chao-Fu Hong

Hsiang-Chen Hsu

A method of prolonging the lifetime of a thermal-bubble-ink-jet print head. A first pulse is provided to a heater of the print head for generating a first bubble to expel an ink drop. A second pulse is provided to the heater after a delay time for generating a second bubble is generated. The second pulse is not large enough to expel another ink drop.

Method of prolonging lifetime of thermal bubble inkjet print head

A preparation method for an integrated assembly of a microchannel and an element is disclosed. In the preparation method of this invention, an element is prepared between a substrate and a sacrificial layer. Two protection layers, which are resistant to etchant for said substrate and said sacrificial layer, are prepared to isolate said element from its ambient environment. Said sacrificial layer defines an area to be etched off such that a microchannel may be formed. A coating layer with etching windows is then prepared on said sacrificial layer and the assembly is etched in an etchant to etch off said sacrificial layer and an area of said substrate beneath said sacrificial layer. An integrated assembly of a closed microchannel and an element is then accomplished. In the invented method, no bonding process is necessary and the integrated assembly so prepared has a planarization surface. This invention also disclosed a microchannel-element assembly prepared under the method of this invention.

Microchannel-element assembly and preparation method thereof

Deep groove structure for semiconductors comprising a semiconductor substrate, a groove or a cavity formed in said semiconductor substrate and a suspending glass membrane formed on the groove or deep cavity, prepared by a flame hydrolysis deposition process. The suspending glass membrane functions as a planarization structure and has surface at the same level of the surface of the semiconductor substrate. The present invention also discloses a method to prepare the deep groove structure.

Deep groove structure for semiconductors

A method of automatically coupling between a fiber and an optical waveguide is disclosed. Such a scheme is achieved by the property of the different etching rate in the various wafer direction on a semiconductor material, especial silicon, and the shrinking property of the glass soot formed by a flame hydrolysis deposition technique during a high temperature consolidation process, for improving aligning accuracy. The manufacturing process of the method is described below. First, a waveguide buffer layer is formed on a semiconductor substrate, then a waveguide layer is formed on the semiconductor substrate and the waveguide buffer layer. A part of the waveguide is manipulated to the planar optical waveguide, meanwhile, several windows which lead to the I/O end of the planar waveguide are formed on the other waveguide layer. The semiconductor substrate beneath the windows is etched anisotropically to form several aligning grooves. The lateral faces of these grooves and the surface of the semiconductor substrate can constitute a fixed angle.

Method of automatically coupling between a fiber and an optical waveguide

The present invention discloses an OIC fabrication system which includes a tapered angle computing means for computing a tapered angle for aching a required coupling efficiency. The fabrication system also includes a fabrication control means which includes a tabulated fabricating parameter database for determining and controlling a plurality of fabricating parameters. The fabrication system also includes an etching system which receives a plurality of control signals from the fabrication controlling means to carry out the etching process to form a tapered etching angle such that the optical coupling efficiency can be achieved.

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Hsinchu, Taiwan

Ten-Hsing Jaw