Canon Kabushiki Kaisha

Tokai University Educational System

Canon Kasei Kabushiki Kaisha

Teigo Sakakibara

Kiyoshi Sakai

Naoto Fujimura

Noriko Ohtani

Yuichi Hashimoto

Motokazu Kobayashi

Shoji Amamiya

Takashi Koyama

Hiroyuki Tanaka

Takayuki Ishikawa

Daisuke Miura

Yoshinori Kotani

Hisami Tanaka

Noboru Ono

Hidemitsu Uno

Akio Maruyama

Toshihiro Kikuchi

Zuyi Zhang

Masayuki Yamada

Katsumi Aoki

Fumio Yamauchi

Kengo Kanazaki

Takakazu Tanaka

Shinya Mayama

Shin Nagahara

Ryoko Ueyama

Shunichiro Nishida

Junichi Kishi

Noriko Hirayama

Masato Tanaka

Kazuo Yoshinaga

Akihiro Senoo

Koji Yamazaki

Masahiro Inoue

Yukio Nagase

Nobuhiko Takekoshi

Hajime Miyazaki

Hideki Anayama

Noriyoshi Ogawa

Yoshio Kashizaki

Hideo Ukuda

Mamoru Tanaka

Susumu Kadokura

Noboru Kashimura

Shinji Eritate

Fumio Sumino

Satoshi Kanayama

Hiroshi Aoto

Harumi Sakoh

Masami Okunuki

Tadami Kinugawa

Noriko Otani

Harumi Sakou

Yoichi Hirose

Koji Goto

Mihoko Oda

Norio Nishi

Toshiaki Takada

Iko Ito

Yoshio Kanzaki

Hideo Ohtaki

A silica aggregate includes primary silica particles aggregated, the primary silica particles having an average particle size of 1 nm or more and less than 10 nm, the primary silica particles being crosslinked to each other by a bond containing a siloxane bond.

Silica aggregate, adsorbent, adsorption column, cleaning system, method for treating liquid, and method for producing silica aggregate

A DNA complex includes a carrier and DNA immobilized on the carrier. 80% or more by mass of the DNA is single-stranded DNA, the DNA has an average molecular weight of 500,000 or less, and the DNA content is more than 15% by mass and 50% or less by mass of the DNA complex. The carrier contains an inorganic material. The DNA complex has an average particle size of 10 &#x3bc;m or more.

DNA complex, adsorbent, adsorption column, purification system, liquid treatment method, and method for producing DNA complex

A coating liquid including a fluorine-containing organic magnesium compound represented by the following chemical formula (1), a method for manufacturing an optical component having an optical film obtained from the coating liquid, and a photographic optical system are disclosed:Mg(OR)(OR)&#x2003;&#x2003;Chemical formula (1)where Rrepresents an alkyl group that may have a substituent group having 1 or more and 6 or less carbon atoms having at least a fluorine atom, Rrepresents an alkyl group that may have a substituent group having 1 or more and 6 or less carbon atoms that may have a fluorine atom, or an aromatic cyclic group that may have a substituent group, and Ris different from R.

Coating liquid, method for manufacturing optical component, and photographic optical system

A method of producing a magnesium fluoride coating includes a step of forming a coating by applying a solution containing a fluorine-containing organic magnesium compound represented by the following formula to a base and a step of heat-treating the coating while the coating is being irradiated with a beam of light with a wavelength of 246 nm or less:Mg(CF&#x2014;X&#x2014;COO)&#x2003;&#x2003;(1)wherein X represents a single bond or one of &#x2014;(CF)&#x2014;, &#x2014;(CH)&#x2014;, and &#x2014;CHCF&#x2014; that may have a substituent, where n and m each represent an integer of 1 to 4. The temperature of the heat-treating step can be 250&#xb0; C. or lower. The coating can be irradiated with a beam of light with a wavelength of 185 nm or less.

Method of producing magnesium fluoride coating, antireflection coating, and optical element

Provided is a method of producing an optical film which has an excellent strength and a low refractive index, and can be used for an optical antireflective film. The production method includes preparing a coating liquid including a capsule having a shell of a halogenated compound of an element of Group 2 by forming an emulsion of one of an aqueous solution including a compound containing an element of Group 2 and an aqueous solution including a compound containing a halogen, and an organic solvent, applying the coating liquid on a substrate, and heating the coating liquid, thereby forming an optical film containing a hollow particle having the shell of a halogenated compound of an element of Group 2.

Method of producing optical film and coating liquid for production of optical film

A DNA hybrid which comprises a porous oxide matrix and DNA immobilized thereon, and is useful for environmental clean-up, where the hybrid is prepared by removing a dispersion medium from a dispersion of colloidal oxide and DNA.

DNA hybrids and environment cleaning system employing DNA hybrids

An electrolyte membrane made of a phosphate-containing siloxane-based polymer for fuel cell, where the polymer comprises a siloxane backbone and a poly(meth)acrylate chain to which phosphate groups are attached, and the polymer is formed by vinyl polymerization of a silane compound having a (meth)acrylate functional group or a hydrolysis-polycondensation product thereof and a (meth)acrylate compound having a phosphate group, followed by siloxane crosslinking. The electrolyte membrane of a siloxane-based polymer has a high conductivity for a fuel cell.

Electrolyte membrane of siloxane-based polymer and solid polymer fuel cell utilizing the same

Provided is a solubility-controallable compound being soluble in a solvent due to a solvent-philic group thereof, of which solubility in the solvent is irreversibly lowered when the group is removed by retro-Diels-Alder reaction.

Compound and method for synthesizing the same, ink, ink cartridge, recording unit, ink-jet recording apparatus, recording method, liquid composition, pattern generating method, article, environmental history-detecting method

A method for forming an organic semiconductor film, comprising applying to a base material a bicyclo compound and inducing a retro-Diels-Alder reaction in the bicyclo compound.

Method for forming an organic semiconductor film

A method of producing an aggregate of hollow or solid carbon fibers is provided, which comprises the step of (i) heating a solution comprising carbon, oxygen, hydrogen, and sulfur as components; or (ii) heating a vapor of a solution comprising carbon, oxygen, hydrogen, and sulfur as components in an atmosphere of a saturated vapor of the solution.

Method of producing carbon fiber aggregate

A method for forming a pattern of an organic semiconductor film comprises applying at least a bicyclo compound onto a base material, the bicyclo compound being converted to an organic semiconductor on the base material through retro-Diels-Alder reaction which removes a part of the bicyclo skeleton to allow extension of pi electron system.

Method for forming a pattern of an organic semiconductor film

An anti-fogging coating material is disclosed which comprises a phosphoric acid compound binder; and oxide particles having an average particle diameter of 1 to 300 nm mixed with the phosphoric acid compound binder and provides an anti-fogging coating with a high hydrophilic property and a high water absorption property, capable of retaining the high hydrophilic property for a long period of time.

Anti-fogging coating material, anti-fogging coating, and anti-fogging optical member

Disclosed herein is an anti-fogging coating film comprising a hydrophilic polymer and a benzophenone compound represented by a general formula (I): ##STR1## wherein X.sub.1 to X.sub.10 are the same or different from one another and are individually a radical selected from the group consisting of hydrogen, hydroxyl group, sulfonic group, carboxyl group, acyl group, ester group, ether group, hydrocarbon groups, alkoxyl groups having 1 to 6 carbon atoms, amino group, hydroxyalkyl groups and hydroxyalkoxyl groups, with the proviso that at least one of X.sub.1 to X.sub.10 is a radical selected from among the hydroxyl and sulfonic groups. Anti-fogging articles comprising a base material such as glass, plastic, metal or mirror and the anti-fogging coating film provided thereon, and a composition for forming the anti-fogging coating film are also disclosed.

Anti-fogging article and composition for forming anti-fogging coating

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Tokyo, Japan

Teigo Sakakibara