Applied Materials, Inc.

Ted G Yoshidome

Nitin Khurana

Joseph Yudovsky

Semyon Sherstinsky

Umesh M Kelkar

Joel M Huston

Paul F Smith

Donald M Mintz

Tushar Mandrekar

Anish Tolia

Alan R Popiolkowski

Leonel Arturo Zuniga

Rod Mosely

Alison Gilliam

An apparatus for controlling the flow of liquid material from a liquid material source to a process chamber is disclosed. The apparatus comprises an injector/vaporizer disposed proximate to the process chamber. The injector/vaporizer includes one or more piezoelectric grids located proximate to a vaporization chamber. The one or more piezoelectric grids function to control the flow of liquid material into the vaporization chamber. Each piezoelectric grid includes interlocking arrays of stripes attached to a frame.

Piezoelectric vaporizer

The present invention generally provides an apparatus and method for improving the process of purging a liquid delivery system used in integrated circuit manufacturing. The liquid delivery system comprises ultrasonic transducers mounted to various components of a liquid delivery system. The transducers may be mounted on housings, isolation valves, fuel injectors, pump assemblies, fluid lines, and/or liquid flow meters. The ultrasonic transducers launch ultrasonic energy that enhance the removal of processing liquids and particulate material from components of the system. The present invention provides for a purge process where a purge fluid, preferably a liquid solvent, is flowed into the liquid delivery system and ultrasonic energy is launched into the purge fluid to enhance dissolution of residual processing liquids and particulate matter in the liquid delivery system, including from cracks and crevices in valves and other complex mechanical devices before being pumped from the liquid delivery system.

Ultrasonic enhancement for solvent purge of a liquid delivery system

A gas delivery apparatus and method for directing a flow of gas to the edge of a substrate at an angle to the radial direction of the substrate is provided. The apparatus directs the gas from a gas opening, over a plurality of grooves that are angled relative to a radial line originating at a center of the gas delivery apparatus. Subsequently, the gas is flowed over a portion of the substrate to prevent reactive gases from depositing on selective portions of the substrate.

Heater for processing chamber

A valve arrangement is provided that more effectively purges processing liquid from a processing liquid delivery system. With the valve arrangement only a small portion of the processing liquid path having a small wetting perimeter must be purged to affect replacement of a dysfunctional injection valve or any other component within the processing liquid delivery system. The valve arrangement comprises a first and a second isolation valve, a pump valve and purge valve configured to reduce the wetting perimeter defined by the four valves. The valve arrangement allows a dysfunctional injection valve or any other component to be replaced without health risk to humans or damage risk to a processing liquid delivery system employing the valve arrangement. During component replacement, the first and the second isolation valves are closed and the pump and the purge valves are opened so as to purge processing liquid from the isolated volume defined by the four valves. Pump/purge cycles preferably are performed, and the purging process may be performed automatically or manually. Once the isolated volume is purged, one of the isolation valves and the component are removed and replaced as a unit.

Method and apparatus for removing processing liquid from a processing liquid path

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Oakland, CA, United States of America

Ted G Yoshidome