Industrial Technology Research Institute

Te-Yi Chang

Ming-Tzung Wu

Yao-Jheng Huang

Ching-Mao Wu

Yu-Ying Hsu

Kuo-Tung Huang

Yu-Chin Lin

Szu-Yin Lin

Wen-Jiunn Chen

Chin-Hua Chang

Yun-Yu Lai

Yu-Cheng Chen

Chih-Hsiang Lin

Hsien-Kuang Lin

Meng-Hsin Chen

Tsung-Yi Chou

Sue-May Chen

Chung-Cheng Lin

I-Jein Cheng

Jauder Jeng

Sheng-Ju Liao

Jia-Ming Liu

Ju-Feng Liao

Shi-Deh Chao

Mon-Haw Chang

Chiunn-Wen Chen

Shuang-Huei Chen

Chen-Cheng Yu

An impregnation liquid is provided, which includes (A) phenolic resin, (B) diazonaphthoquinone-based compound or a derivative thereof, (C) ionic compound, and (D) organic solvent. The weight of (A) phenolic resin and the weight of (B) diazonaphthoquinone-based compound or a derivative thereof have a ratio of 0.2:0.8 to 0.9:0.1, and the weight of (C) ionic compound and the total weight of (A) phenolic resin and (B) diazonaphthoquinone-based compound or a derivative thereof have a ratio of 0.2:1 to 1.4:1. The impregnation liquid can be used to form an activated carbon layer to wrap and to be directly in contact with the surface of a mesh.

Impregnation liquid and activated carbon cloth and method of forming the same

An adhesive composition includes 0.1 to 1 part by weight of nano panicles, 50 to 95 parts by weight of acrylate resin, and 5 to 50 parts by weight of a monomer or oligomer of acrylate or acrylic acid containing multi-functional groups, and the acrylate resin and the monomer or oligomer of acrylate or acrylic acid containing multi-functional groups have a total weight of 100 parts by weight, in which the acrylate resin has a weight average molecular weight of 100,000 to 1,500,000. The nano particle has a shell covering parts of the surface of the core, and acrylate groups grafted to the surface of the core.

Adhesive composition and liquid-crystal display and method of disassembling the same

A patterning method includes providing a photosensitive composition on a material layer. The photosensitive composition includes one part by weight of a photo sensitive compound, 1.5 to 8 parts by weight of a resin, and 10 to 40 parts by weight of a diluent. The photosensitive compound has a chemical structure of The patterning method further includes removing the diluent in the photosensitive composition to form a photoresist layer, exposing the photoresist layer, and removing an exposed part of the photoresist layer to expose a part of the material layer.

Photosensitive compound, photosensitive composition, and patterning method

A copolymer is provided, which includes 1 part by mole of a repeating unit represented by Formula 1, 3 to 10 parts by mole of a repeating unit represented by Formula 2, and 5 to 15 parts by mole of a repeating unit represented by Formula 3. Ris hydrogen or methyl; Ris a single bond or Calkylene group; Ris a polysiloxy group with vinyl and aromatic group; and each of Rand Ris independently hydrogen, Calkyl or a polysiloxy group with vinyl and aromatic group. 

Copolymer and resin composition including the same

The disclosure provides a masterbatch, a method for fabricating the same and a film formed from the masterbatch. The masterbatch includes a product prepared from a composition via polymerization and granulation. The composition includes: terephthalic acid; and a silicon dioxide dispersion, wherein the silicon dioxide dispersion includes surface-modified silicon dioxide particles disposed within ethylene glycol, and the surface-modified silicon dioxide particle has first functional groups and second functional groups bonded on the surface of the silicon dioxide particles, wherein the first functional groups have a structure represented by and the second functional groups include a Chaloalkyl functional group, Calkoxy functional group, Caminoalkyl functional group, Calkenyl group, or epoxy group, Ris hydrogen or a Calkyl functional group, and n is 1-4.

Masterbatch, method for fabricating the same, and a film fabricated from the masterbatch

A copolymer according to the present disclosure is provided, which includes 30 to 80 mol % of a repeating unit represented by formula (I), 5 to 25 mol % of a repeating unit represented by formula (II), and 5 to 30 mol % of a repeating unit represented by formula (III): wherein Ris C6-C13 aryl group, C7-C13 aralkyl group, C6-C8 halogenated aryl group or C7-C8 aryloxyalkyl group; Ris C3-C16 alkyl group or C3-C6 alkoxy substituted alkyl group; Ris a single bond or C1-C3 alkylene group, Rand Rare independently C1-C3 alkoxy group, Ris polysiloxane with methyl and phenyl groups; and R, Rand Rare independently hydrogen or methyl. In addition, a resin composition, a packaging film and a package structure including the same are provided.

Copolymer and resin composition, packaging film and package structure including the same

A hybrid carbon black is provided, which includes a carbon black core and a polymer film wrapping an entire surface of the carbon black core. The polymer film includes a network of a plurality of polymer main chains crosslinked each other, and a plurality of dispersion-side chains bonded to the polymer main chains. The dispersion-side chains come from an acrylate monomer with a chemical structure of: wherein when n is 4 to 7, Ris H or CH, and when n is 8 to 14, Ris CH.

Hybrid carbon black and coating composition

A modified cellulose is provided. The modified cellulose is represented by the chemical formula (1): wherein n is between 60 and 2500, at least one R is selected from one of the group consisting of R1 is Cto Calkyl group or Cto Calkenyl group, R2 is hydrogen, Cto Calkyl group or Cto Calkenyl group, R3 is Cto Calkyl group or Cto Calkenyl group, R4 is Cto Ccycloalkyl group or Cto Ccycloalkenyl group, nis between 15 and 33, nis between 20 and 40.

Modified cellulose and composite material using the same

A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent has a chemical structure comprising following repeating unit: Ris H or CH, n is 2-40 of integer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent.

Photosensitive composition and photoresist

Disclosed is an ink composition used in an electrowetting display device and an electrowetting display device employing the same. The ink composition used in the electrowetting display device includes a non-polar solvent and a modified hydrophobic pigment, wherein the modified hydrophobic pigment has a structure represented by Formula (I), ofP-G wherein Ris a straight chain or a branched Calkyl group, or Ccycloalkyl group.

Ink composition used in electrowetting display device and electrowetting display device employing the same

A reactive silicon dioxide compound, wherein the formula of the reactive silicon dioxide compound is shown as Formula (I): where each R is a reactive group shown as Formula (II) or Formula (III), independently: and where R, Rand Rinclude H or CH, independently, nis an integer of about 1-6 and nis an integer of about 0-4. An optical protective film containing the reactive silicon dioxide compound is also provided.

Reactive silicon dioxide compound and optical protective film containing the same

A photosensitive composition and a color paste for making the photosensitive composition. The photosensitive resin composition comprises a photosensitive resin system; a pigment; a photo-reactive amphipathic molecule; and a solvent. The color paste for making the photosensitive composition comprises the pigment and the photo-reactive amphipathic molecule.

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Te-Yi Chang