Fujifilm Corporation

Tatsuya Yoshihiro

Shinichiro Sonoda

Yuichiro Itai

Tadashi Kasamatsu

Kenichi Umeda

Seigo Nakamura

Koji Yoshida

Masayuki Naya

Hiroki Takahashi

Shogo Yamazoe

Shinya Hakuta

Atsushi Osawa

Takeharu Tani

Hirotoshi Yoshizawa

Akihiko Ohtsu

Hideki Yasuda

Mototaka Kanaya

An acoustic lens () for an ultrasound transducer that is disposed in a front end portion of an ultrasound transducer () has a concave front surface (C) and is formed from a base material (B) in which a plurality of fine particles (G) are dispersed. As a degree of dispersion of the fine particles (G) is higher from a central portion toward both end portions in an elevation direction, acoustic velocity is lower from the central portion toward both end portions in the elevation direction.

Acoustic lens for ultrasound transducer, ultrasound transducer, ultrasound probe, and ultrasound diagnostic apparatus

The optical thin film is provided on a substrate and includes, in order, from the substrate side, an interlayer, a silver-containing metal layer, and a dielectric layer, in which an anchor region including an oxide of an anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the interlayer, a cap region including an oxide of the anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the dielectric layer, a film thickness of the silver-containing metal layer is 6 nm or less, the silver-containing metal layer contains a high standard electrode potential metal, and a peak position of a concentration distribution of the high standard electrode potential metal in a film thickness direction of the silver-containing metal layer is positioned closer to the interlayer than a peak position of a silver concentration distribution.

Optical thin film having metal layer containing silver and high standard electrode potential metal

An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.

Antireflection film, optical element, and optical system

Provided are a laminate including a substrate; and a laminated structure including two or more kinds of layers having different specific acoustic impedances which is disposed on the substrate, in which the number of the layers constituting the laminated structure is 10 or more, a thickness of a layer having the largest thickness among the layers constituting the laminated structure is 8 nm or less, and in the laminated structure, a CV value defined by a standard deviation of a layer thickness/average layer thickness is 0.05 or more, and a building material, a window material, and a radiation cooling device including the laminate.

Laminate, building material, window material, and radiation cooling device

Provided is an optical member which includes: a substrate; and a laminated structure including two or more kinds of layers having different materials which are disposed on the substrate, in which the number of layers constituting the laminated structure is 10 or more, the maximum layer thickness of the layers constituting the laminated structure is 8 nm or less, and the minimum transmittance in a wavelength range of 400 nm to 800 nm or in a wavelength range of 6 &#x3bc;m to 12 &#x3bc;m is 10% or more.

Optical member

An optical thin film formed by laminating, from the substrate side, an interlayer, a silver-containing metal layer that contains silver, and a dielectric layer, in which an anchor metal diffusion control layer provided between the interlayer and the silver-containing metal layer, an anchor region which includes an oxide of the anchor metal and has a surface energy that is less than the surface energy of the silver-containing metal layer and larger than the surface energy of the anchor metal diffusion control layer is provided between the anchor metal diffusion control layer and the silver-containing metal layer, a cap region which includes an oxide of the anchor metal is provided between the silver-containing metal layer and the dielectric layer, and the total film thickness of the silver-containing metal layer, the anchor region, and the cap region is 6 nm or less.

Optical thin film, optical element, optical system, and method for producing optical thin film

A radiative cooling device including: a heat insulating container having an opening portion, and being configured to house an object to be cooled at an interior thereof and thermally insulates the object from an exterior thereof; a far-infrared radiator that is arranged between the object and the opening portion in the heat insulating container, that thermally contacts the object, and that radiates far-infrared rays in a wavelength range of from 8 &#x3bc;m to 13 &#x3bc;m; a far-infrared transmitting window member that closes at least part of the opening portion of the heat insulating container and that transmits the far-infrared rays radiated from the far-infrared radiator; and an intermediate heat insulating member that is arranged between the far-infrared transmitting window member and the far-infrared radiator, that thermally insulates the far-infrared transmitting window member and the far-infrared radiator from each other, and that transmits the far-infrared rays radiated from the far-infrared radiator.

Radiative cooling device

An antireflection film includes an uneven structure layer that has an uneven structure and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 8.5 &#x3bc;mor greater and has a film thickness of 200-250 nm, and the intermediate layer comprises a plurality of layers including at least a first layer, a second layer, a third layer, and a fourth layer.

Antireflection film and method of producing the same, and optical member

An antireflection film includes an uneven structure layer that has an uneven structure in which a distance between protrusions is shorter than a wavelength of light of which reflection is to be suppressed and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 6.5 &#x3bc;mor greater and a film thickness of 250 nm or more, and the intermediate layer is constituted of a plurality of layers including at least a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, and an eighth layer in this order from the uneven structure layer side to the substrate side.

Antireflection film and optical member

A first light-shied-coating formation step that forms a light shield coating only in a part of an area of a transparent-substrate in which a light shield coating is to be formed, a step that deposits an optical thin film including, as its outermost layer, a layer to be hydrothermally treated, which will become a fine uneven pattern coating by being hydrothermally treated, in an area in which an antireflection coating is to be formed, a second light-shield-coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light-shield-coating formation step, and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated are performed in this order.

Optical member and its production method

The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.

Antireflection film and optical member including antireflection film

A dielectric multilayer film is formed on one surface of a lens main body, a film including aluminum is formed on the other surface of the lens main body, the film including aluminum is immersed in hot water without immersing the dielectric multilayer film in the hot water, thereby changing the film including aluminum to a fine uneven structure film including an alumina hydrate as a main component, whereby a lens provided with antireflection functions on both surfaces is manufactured.

Method for manufacturing antireflection function-equipped lens

A soundproof structure has one or more soundproof cells. Each of the one or more soundproof cells includes a frame having a through-hole, a film fixed to the frame, and an opening portion configured to include one or more holes drilled in the film. Neither end portions of the through-hole of the frame are closed. The soundproof structure has a shielding peak frequency, which is determined by the opening portion of each of the one or more soundproof cells and at which a transmission loss is maximized, on a lower frequency side than a first natural vibration frequency of the film of each of the one or more soundproof cells, and selectively insulates sound in a predetermined frequency band including the shielding peak frequency at its center. Accordingly, there is provided a soundproof structure that is light and thin, does not depend on the position and shape of a hole, has high robustness as a sound insulation material, is stable, has air permeability, has no heat, and is excellent in manufacturability, and a soundproof structure manufacturing method.

Soundproof structure and soundproof structure manufacturing method

Provided is a method of manufacturing a structure having a transparent fine uneven structural body formed by hot water treatment, in which a finer uneven structure is formed. Provided is a method of manufacturing a structure, the method being for manufacturing a structure including a substrate, and a transparent fine uneven structural body which is formed on a surface of the substrate by hot water treatment, including: a first step of forming a precursor film of the transparent fine uneven structural body on the substrate; a second step of forming a fine uneven structure on a surface of the precursor film; and a third step of subjecting, to hot water treatment, the precursor film on which the fine uneven structure is formed to form the transparent fine uneven structural body in which a peak value &#x3bd;of space frequency of the unevenness of the fine uneven structure formed in the second step satisfies &#x3bd; &#x3c;&#x3bd;(Expression I). In Expression I, &#x3bd;represents a peak value of space frequency of the fine uneven structure, and &#x3bd; represents a peak value of space frequency of the transparent fine uneven structural body in a case in which the fine uneven structure is not formed on the surface of the precursor film.

Method of manufacturing structure

A light diffusing element diffuses light output from an output facet of an optical fiber that enters the light diffusing element at a first end and outputting the diffused light from a second end. The light diffusing element is equipped with a semireflective surface for reflecting a portion of the light, provided at a predetermined portion of the light diffusing element corresponding to the core of the output facet. The semireflective surface intersects at least with the optical axis of the optical fiber. Thereby, propagation of light in directions away from the optical axis of the optical fiber can be promoted during the step of reflecting the portion of the light that enters the light diffusing element.

Growing community of inventors

Kanagawa, Japan

Tatsuya Yoshihiro