Hitachi, Ltd.

Tatsuya Teshima

Ken Yamaguchi

Hiroshi Mizuta

Kiyoo Itoh

Toshiyuki Mine

Hideo Sunami

Toshikazu Shimada

Kazuo Nakazato

Shinichiro Kimura

Masatada Horiuchi

A controllable conduction device in the form of a transistor comprises source and drain regionsbetween which extends a conduction path P for charge carriers, a gatefor controlling charge carrier flow along the conduction path and a multiple layer structureproviding a multiple tunnel junction configuration in the conduction path, with the result that current leakage is blocked by the multiple tunnel junction configuration when the transistor is in its off state. Vertical and lateral transistor configurations are described, together with use of the transistor in complimentary pairs and for a random access memory cell. Improved gate structures are described which are also applicable to memory devices that incorporate the tunnel barrier configuration to store charge on the memory node.

Controllable conduction device with electrostatic barrier

In a semiconductor memory device such as a DRAM, a conductive film is arranged on the rim portion of a isolation insulating film in opposition to a semiconductor substrate with a thin insulating film in between. This conductive film is electrically connected to a lower electrode of a storage capacitor. This novel arrangement can control the location of electrical pn junction independently of the location of metallurgical pn junction, thereby realizing a semiconductor memory device having a long data retention time with the increase in leakage current suppressed.

Method of fabricating a memory device having a long data retention time with the increase in leakage current suppressed

A controllable conduction device in the form of a transistor comprises source and drain regions,between which extends a conduction path P for charge carriers, a gate,for controlling charge carrier flow along the conduction path and a multiple layer structure,providing a multiple tunnel junction configuration in the conduction path, with the result that current leakage is blocked by the multiple tunnel junction configuration when the transistor is in its off state. Vertical and lateral transistor configurations are described, together with use of the transistor in complimentary pairs and for a random access memory cell. Improved gate structures are described which are also applicable to memory devices that incorporate the tunnel barrier configuration to store charge on the memory node.

Controllable conduction device

In a semiconductor memory device such as a DRAM, a conductive film (1.11') is arranged on the rim portion of a isolation insulating film (1.2) in opposition to a semiconductor substrate (1.1) with a thin insulating film in between. This conductive film (1.11') is electrically connected to a lower electrode (1.11) of a storage capacitor. This novel arrangement can control the location of electrical pn junction independently of the location of metallurgical pn junction, thereby realizing a semiconductor memory device having a long data retention time with the increase in leakage current suppressed.

Semiconductor memory device having a long data retention time with the

Semiconductor logic element and apparatus using thereof

A controllable conduction device in the form of a transistor comprises source and drain regions 5, 2 between which extends a conduction path P for charge carriers, a gate 4 for controlling charge carrier flow along the conduction path and a multiple layer structure 3 providing a multiple tunnel junction configuration in the conduction path, with the result that current leakage is blocked by the multiple tunnel junction configuration when the transistor is in its off state. Vertical and lateral transistor configurations are described, together with use of the transistor in complimentary pairs and for a random access memory cell. Improved gate structures are described which are also applicable to memory devices that incorporate the tunnel barrier configuration to store charge on the memory node.

Growing community of inventors

Sagamihara, Japan

Tatsuya Teshima