Zeon Corporation

Other

Nippon Zeon Company, Ltd.

Tokyo Electron Limited

Kanto Denka Kogyo Co., Ltd.

Tokyo Eectron Limited

Tatsuya Sugimoto

Toshiro Yamada

Mitsuru Sugawara

Kimiaki Tanaka

Masahiro Nakamura

Toshinobu Hirayama

Takashi Uruma

Tadahiro Ohmi

Masanobu Honda

Hideyuki Tanaka

Akinobu Teramoto

Takefumi Suzuki

Toshirou Yamada

Yasuo Kobayashi

Kohei Kawamura

Akinori Kitamura

Kuniaki Goto

Kelly Michael Whalen

Charles Stephen Haase

Nobunori Abe

Akira Sekiya

Hiroyuki Honda

Nozomi Hirai

Kazuki Kurihara

Takuya Hori

Shugo Matsuno

Jo Konagawa

Yasumasa Wada

Kohei c/o Tokyo Electron At Ltd Kawamura

Yasuo c/o Tokyo Electron At Ltd Kobayashi

Provided is a method of manufacturing octafluorocyclopentene by bringing 1-chloroheptafluorocyclopentene into contact with an alkali metal fluoride. The manufacturing method includes a feedstock heating step of heating 1-chloroheptafluorocyclopentene to not lower than 40&#xb0; C. and not higher than 55&#xb0; C. and a fluorination step of maintaining a suspension containing a polar aprotic solvent and an alkali metal fluoride at 85&#xb0; C. or higher while supplying heated 1-chloroheptafluorocyclopentene into the suspension and performing fluorination thereof to obtain octafluorocyclopentene.

Method of manufacturing octafluorocyclopentene

Provided is a manufacturing method in which 1-chloroheptafluorocyclopentene is brought into contact with an alkali metal fluoride to obtain octafluorocyclopentene. The manufacturing method includes a fluorination step of maintaining, at 85&#xb0; C. or higher, a suspension containing an alkali metal fluoride suspended in a mixed solvent including a polar aprotic solvent and a glycol ether having a higher boiling point than the polar aprotic solvent while supplying 1-chloroheptafluoropentene into the suspension and performing fluorination thereof to obtain octafluorocyclopentene.

Provided is a method for industrially advantageously producing a fluorinated hydrocarbon (3). The disclosed method for producing a fluorinated hydrocarbon represented by formula (3) includes bringing into contact, in a hydrocarbon-based solvent, a secondary or tertiary ether compound represented by formula (1) below with an acid fluoride represented by formula (2) in the presence of lithium salt or sodium salt (in the formulae, Rand Reach represent a Calkyl, and Rand Rmay be bonded to each other to form a ring structure; Rrepresents a hydrogen atom, methyl, or ethyl; and Rand Reach represent methyl or ethyl). 

Method for producing fluorinated hydrocarbons

Provided is an industrially simple and cheap method for efficiently removing butene from crude monofluorobutane containing butene without causing substantial decomposition, transformation, or the like of the monofluorobutane. In a provided monofluorobutane purification method, crude monofluorobutane containing butene is brought into contact with trihalomethane in the presence of an alkali aqueous solution to convert the butene to a compound having a higher boiling point than the monofluorobutane, water is subsequently added to a reaction mixture obtained thereby to dissolve a produced salt, an organic layer is separated, and then the separated organic layer is purified by distillation.

Butene conversion method and monofluorobutane purification method

The present invention provides: a method for producing a fluorinated alkane represented by the formula (2): R&#x2014;F, wherein an alcohol having 3 to 5 carbon atoms is fluorinated by a fluorinating agent represented by the formula (1): RSOF in the absence of a solvent, and in the presence of an amidine base. In the formula, Rrepresents a methyl group, an ethyl group or an aromatic group, Rrepresents an alkyl group having 3 to 5 carbon atoms, and n is 0 or 2.

Method for producing fluorinated alkane, method for separating and recovering amidine base, and method for using recovered amidine base

The present invention is a method for producing a fluorinated hydrocarbon represented by a structural formula (3), wherein an ether compound represented by a structural formula (1) and an acid fluoride represented by a structural formula (2) are brought into contact with each other in a hydrocarbon-based solvent, in the presence of a catalyst in which boron trifluoride is supported on a metal oxide: wherein Rand Rrepresent an alkyl group having 1 to 3 carbon atoms, Rrepresents a hydrogen atom, a methyl group or an ethyl group, and Rand Rrepresent a methyl group or an ethyl group; and Rand Rmay be bonded to each other to form a cyclic structure. Through the present invention, a method for industrially advantageously producing 2-fluorobutane is provided. 

Method for manufacturing fluorinated hydrocarbon

The present invention is a fluorohydrocarbon represented by R&#x2014;F wherein R represents an isobutyl group or a t-butyl group), the fluorohydrocarbon having a purity of 99.9% by volume or more and a total butenes content of 1,000 ppm by volume or less; a use of the fluorohydrocarbon as a plasma etching gas; and a plasma etching method comprising selectively subjecting an inorganic nitride film stacked on silicon or a silicon oxide film to plasma etching using the fluorohydrocarbon.

High-purity fluorinated hydrocarbon, use as a plasma etching gas, and plasma etching method

The present invention is a 1H-Heptafluorocyclopentene having a purity of 99.9 wt % or more and an organochlorine-based compound content of 350 ppm by weight or less. The present invention provides a high-purity 1H-Heptafluorocyclopentene that may be useful as a plasma reaction gas for semiconductors.

High-purity 1H-heptafluorocyclopentene

The present invention is a method for producing a fluorohydrocarbon represented by a structural formula (3) comprising bringing a secondary or tertiary ether compound represented by a structural formula (1) into contact with an acid fluoride represented by a structural formula (2) in a hydrocarbon-based solvent in the presence of a boron trifluoride complex. (In structural formulae (1) to (3), each of Rand Rrepresents an alkyl group having 1 to 3 carbon atoms, Rrepresents a hydrogen atom, a methyl group, or an ethyl group, and each of Rand Rrepresents a methyl group or an ethyl group, provided that Rand Rare optionally bonded to each other to form a ring structure.) 

Method for producing fluorinated hydrocarbon

The present invention is a high-purity 2-fluorobutane having a purity of 99.9 vol % or more and a butene content of 1,000 ppm by volume or less, and a method for using the high-purity 2-fluorobutane as a dry etching gas. According to the present invention, a high-purity 2-fluorobutane that is suitable as a plasma reaction gas for semiconductors is provided.

High-purity 2-fluorobutane

The present invention is a method for 2-fluorobutane to obtain highly purified 2-fluorobutane through a process comprising a step for: bringing crude 2-fluorobutane that includes 5 to 50 wt % of butene into contact with a brominating agent that can form a bromonium ion in an aprotic polar solvent in the presence of water or an alcohol having up to 4 carbon atoms; converting the butene into compounds having a boiling point higher than that of 2-fluorobutane, then recovering 2-fluorbutane from the reaction solution; and purifying the recovered 2-fluorabutane by distillation.

Method for purifying 2-fluorobutane

A plasma etching method includes plasma-etching a silicon oxide layer through a mask using a process gas, the process gas containing oxygen gas and a fluorohydrocarbon shown by the formula (1), CxHyFz, wherein x is an integer from 4 to 6, y is an integer from 1 to 4, and z is a positive integer, provided that (y+z) is 2x or less. A contact hole having a very small diameter and a high aspect ratio can be formed in a substantially vertical shape without necking by plasma-etching the silicon oxide layer using a single process gas.

Plasma etching method

An unsaturated hydrogen-containing fluoroolefin compound is obtained by bringing an unsaturated fluorine-containing halogen compound into contact with 0.1 to 3 molar equivalents of hydrogen relative to the unsaturated fluorine-containing halogen compound in a vapor phase in the presence of a supported palladium catalyst in which an amount of supported palladium is 0.1% by weight to 2.5% by weight.

Method for producing hydrogen-containing fluoroolefin compound

A process for producing a perfluoroalkyne compound includes an addition reaction step of adding Cl, Br, or Ito a compound shown by the formula (1) CHC&#x2261;CRto obtain a compound shown by the formula (2) CHCXCXR, a fluorination reaction step of reacting the compound shown by the formula (2) with fluorine gas to obtain a compound shown by the formula (3) CFCXCXR, and a dehalogenation reaction step of contacting the compound shown by the formula (3) with a metal or an organometallic compound to obtain a perfluoroalkyne compound shown by the formula (4) CFC&#x2261;CR. According to the present invention, a perfluoroalkyne compound can be produced at high productivity and high yield using starting raw materials which are environmentally friendly and industrially available. In the above formulas, Rrepresents a methyl group or an ethyl group, X represents Cl, Br, or I, and Rrepresents a trifluoromethyl group or a pentafluoroethyl group.

Process for producing perfluoroalkyne compound

The present invention relates to a semiconductor device comprising an insulation film consisting of a fluoridation carbon film that has been subjected to thermal history of 420&#xb0; C. or lower. The feature of the present invention is that an amount of hydrogen atoms included in the fluoridation carbon film is 3 atomic % or less before the fluoridation carbon film is subjected to the thermal history.

Growing community of inventors

Tokyo, Japan

Tatsuya Sugimoto