Jsr Corporation

Honda Motor Co., Ltd.

Mitsubishi Heavy Industries Limited

Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Tri Chemical Laboratories Inc.

Tatsuya Sakai

Yasuo Matsuki

Hisashi Nakagawa

Hideki Nishimura

Hiroyuki Komatsu

Takayuki Ogawa

Sachiko Hashimoto

Kang-go Chung

Shunsuke Kurita

Ryuuichi Saitou

Sanshiro Komiya

Ryuichi Saito

Akira Sakamoto

Akihisa Makino

Masahiro Yamamoto

Shingo Ito

Noboru Oshima

Masumi Nomura

Masayuki Motonari

Minoru Sano

Chie Yabutani

Koki Tateishi

Kazunori Takanashi

Hiromitsu Tanaka

Yoshio Takimoto

Takashi Tsubouchi

Tsuyoshi Furukawa

Haruo Iwasawa

Motohiro Shiratani

Kenichiro Kurai

Yoshitaka Hirai

Yuushi Matsumura

Kenji Mochida

Miki Tamada

Kenzo Ohkita

Kento Aono

Masahiro Murata

Satoshi Dei

Tomoaki Seko

Mariko Miyazaki

Shun Aoki

Hirotaka Itoh

Ryo Kumegawa

Hideyuki Aoki

Tetsuo Tominaga

Naofumi Nomura

Kan-go Chung

Kentaro Tamaki

Naoto Noda

Maki Nishiguchi

Daohai Wang

Tomohiro Matsuki

Tomoya Taji

Ryuichi Saitou

Nozomi Satou

An object of the present invention is to provide an automatic analyzer capable of efficiently performing stirring by a discharge operation. In the automatic analyzer according to the present invention, by lifting the probe while discharging a specimen or a reagent alter the probe starts to discharge the specimen to a vessel, as a height of a liquid level of the liquid in the vessel, which is discharged from the probe, is gradually raised, a distance between the liquid level in the vessel and a tip end of the probe is gradually increased.

Automatic analyzer

A film-forming composition includes a compound including a Si—H bond and an orthoester. The compound preferably includes a structural unit that is a structural unit represented by formula (1-1), a structural unit represented by formula (1-2), or a combination thereof. In the formula (1-1) and the formula (1-2), Rand Reach represent a hydroxy group, a halogen atom, or a monovalent organic group having 1 to 20 carbon atoms; and Rrepresents a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms that bonds to two Si atoms.

Film-forming composition, silicon-containing film, and resist pattern-forming method

A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.

Composition, method of producing substrate, and polymer

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). Aand Aeach independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. Lrepresents &#x2014;S&#x2014;, &#x2014;NR&#x2014;, or &#x2014;NA-, wherein Arepresents a monovalent group having a functional group capable of forming a chemical bond with a metal atom. 

Composition, polymer, and method of producing substrate

A composition for cleaning a semiconductor substrate contains: a novolak resin; an organic acid not being a polymeric compound; and a solvent. A solid content concentration of the composition is no greater than 20% by mass. The organic acid is preferably a carboxylic acid. The carboxylic acid is preferably a monocarboxylic acid, polycarboxylic acid or a combination thereof. The molecular weight of the organic acid is preferably from 50 to 500. The content of the organic acid with respect to 10 parts by mass of the novolak resin is preferably from 0.001 parts by mass to 10 parts by mass. The solvent includes preferably an ether solvent, an alcohol solvent, or a combination thereof. The proportion of the ether solvent, the alcohol solvent, or the combination thereof in the solvent is preferably no less than 50% by mass.

Cleaning composition for semiconductor substrate

A spoke angle deviation amount measuring system () includes a first to fourth support units () to () configured to support rotatably a first to fourth tires () to (), respectively. Shaft portions () of the support units () to () are positioned by positioning caps () after a vehicle () is moved to a measuring position with a steering wheel () positioned neutral. With the tires () to () inclined at a toe angle with respect to a front-and-rear direction, when the vehicle () is caused to travel forwards, lateral stress is exerted on the support units () to (), whereby the support units () to () turn about the corresponding shaft portions (). An angle sensor () detects turning angles of the support units () to (). A control device () calculates a spoke angle deviation amount based on the detected turning angles.

Spoke angle deviation amount measuring system

Provided is an automatic analysis apparatus for inspecting blood coagulation, which is capable of miniaturizing device configuration and reducing device costs. The automatic analysis apparatus includes: a reaction container in which a specimen and a reagent are mixed with each other and the mixed solution is reacted; a sample dispensing mechanism which dispenses the specimen into the reaction container; a blood coagulation time measuring unit in which the reaction container is mounted to measure a coagulation time of the mixed solution within the reaction container; a reaction container accommodating unit which accommodates a plurality of reaction containers provided to the blood coagulation measuring unit; a reaction container transfer mechanism which grasps the reaction container and transfers the reaction container to the blood coagulation measuring unit; and a control unit which controls the reaction container transfer mechanism.

Automatic analysis apparatus

An inspection record apparatus includes: a display unit; a memory unit configured to store inspection record data including image information concerning a subject and information concerning a damaged state of the subject, and information indicating whether the information concerning the damaged state is in a confirmed status or not; a display control unit configured to read the inspection record data to develop the information concerning the damaged state on an image corresponding to the image information, and display the resultant image onto the display unit; a detection unit configured to detect an operation for the information concerning the damaged state; a storage unit configured to store the information indicating that the information concerning the damaged state is in the confirmed status into the memory unit; and a changing unit configured to change a display manner of the information concerning the damaged state.

Inspection record apparatus and inspection record method

A semiconductor device production composition comprises a product obtained by mixing a metal compound and a compound represented by Formula (1) in a first organic solvent, and a second organic solvent. R and R' each independently represent a hydrogen atom, a linear or cyclic alkyl group having a carbon number of 2 to 20, a linear or cyclic alkylcarbonyl group having a carbon number of 2 to 20, an aryl group having a carbon number of 6 to 20, or an aryloxy group having a carbon number of 6 to 20, and part of the hydrogen atoms in the cyclic alkyl, cyclic alkylcarbonyl, aryl, or aryloxy group are substituted or unsubstituted.R&#x2014;O&#x2014;O&#x2014;R&#x2032;&#x2003;&#x2003;(1)

Composition and method of forming pattern using composition

An inorganic film-forming composition for multilayer resist processes includes a complex that includes: metal atoms; at least one bridging ligand; and a ligand which is other than the at least one bridging ligand and which is derived from a hydroxy acid ester, a &#x3b2;-diketone, a &#x3b2;-keto ester, a &#x3b2;-dicarboxylic acid ester or a combination thereof. The at least one bridging ligand includes a first bridging ligand derived from a compound represented by formula (1). An amount of the first bridging ligand is no less than 50 mol % with respect to a total of the bridging ligand. In the formula (1), Rrepresents an organic group having a valency of n. X represents &#x2014;OH, &#x2014;COOH, &#x2014;NCO or &#x2014;NHR, wherein Rrepresents a hydrogen atom or a monovalent organic group. n is an integer of 2 to 4.RX)&#x2003;&#x2003;(1)

Inorganic film-forming composition for multilayer resist processes, and pattern-forming method

An optical axis angle inspection device is provided with a first camera and a screen which are disposed in front of a laser distance meter, is provided with a point light source on the screen, and is provided with a second camera disposed behind the laser distance meter. An image of the laser distance meter is captured by the first camera, and the height of the point light source is fitted to the height of the laser distance meter on the basis of the captured image. Then, an image of the point light source is captured by the second camera, and a difference in height between the centroid of the captured image and the point light source is specified. The optical axis angle of the laser distance meter is calculated from the difference in height and the distance from the screen to the laser distance meter.

Optical axis angle inspection device

Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium.

Method for producing substrate with metal body

A composition for forming an aluminum-containing film includes an organic solvent, and an organic aluminum compound. The organic aluminum compound has a structure represented by a general formula (1). In the general formula (1), each of Rto Ris independently a hydrogen atom or a hydrocarbon group, each of Rs, Rs, Rs, Rs, Rs and Rs is identical or different, and optionally each of Rs, Rs, Rs, Rs, Rs or Rs is linked to one another. 

Composition for forming aluminum-containing film, and method for forming aluminum-containing film

Disclosed is a ruthenium film-forming material having a lower melting point and a higher vapor pressure that facilitates supply of the material onto a base and moreover enables a high-quality ruthenium film to be obtained. A ruthenium film-forming material includes a compound represented by general formula (1) below (wherein Ris independently at each occurrence a hydrogen atom, a halogen atom, a hydrocarbon group having 1 to 4 carbon atoms or a halogenated hydrocarbon group having 1 to 4 carbon atoms; Ris independently at each occurrence a halogenated hydrocarbon group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogenated alkoxy group having 1 to 4 carbon atoms, with the proviso that Rand Rare mutually differing groups; Ris independently at each occurrence a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms; and L is an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and having at least two double bonds).

Ruthenium film-forming material and ruthenium film-forming method

A composition for forming an aluminum film, comprising a complex represented by the following formula (1) and a complex represented by the following formula (2), the molar ratio of the complex represented by the following formula (1) and the complex represented by the following formula (2) being 40:60 to 85:15:AlH.NRRR&#x2003;&#x2003;(1)AlH.(NRRR)&#x2003;&#x2003;(2)(in the above formulas (1) and (2), R, Rand Rare each independently a hydrogen atom, alkyl group, cycloalkyl group, alkenyl group, alkynyl group, aryl group or aralkyl group.).

Composition and method for forming an aluminum film

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Tokyo, Japan

Tatsuya Sakai