Semiconductor Energy Laboratory Co., Ltd.

Tatsuya Onuki

Shunpei Yamazaki

Kiyoshi Kato

Takanori Matsuzaki

Shuhei Nagatsuka

Takahiko Ishizu

Yuki Okamoto

Hajime Kimura

Yuto Yakubo

Tomoaki Atsumi

Hitoshi Kunitake

Wataru Uesugi

Hiroki Inoue

Yutaka Shionoiri

Munehiro Kozuma

Daisuke Matsubayashi

Seiya Saito

Takayuki Ikeda

Hidekazu Miyairi

Satoru Okamoto

Yoshinobu Asami

Kei Takahashi

Hideki Uochi

Yuichi Sato

Tetsunori Maruyama

Shuhei Maeda

Naoaki Tsutsui

Yuji Asano

Kazuki Tsuda

Eri Sato

Hisao Ikeda

Hiromichi Godo

Susumu Kawashima

Hidetomo Kobayashi

Takeshi Aoki

Yutaka Okazaki

Katsuaki Tochibayashi

Kazuaki Ohshima

Tomokazu Yokoi

Minato Ito

Toshiki Hamada

Satoru Ohshita

Shota Mizukami

To provide a semiconductor device with a novel structure. The semiconductor device includes an accelerator. The accelerator includes a first memory circuit, a second memory circuit, and an arithmetic circuit. The first memory circuit includes a first transistor. The second memory circuit includes a second transistor. Each of the first transistor and the second transistor includes a semiconductor layer including a metal oxide in a channel formation region. The arithmetic circuit includes a third transistor. The third transistor includes a semiconductor layer including silicon in a channel formation region. The first transistor and the second transistor are provided in different layers. The layer including the first transistor is provided over a layer including the third transistor. The layer including the second transistor is provided over the layer including the first transistor. The data retention characteristics of the first memory circuit are different from those of the second memory circuit.

Semiconductor device

A semiconductor device having a novel structure is provided. The semiconductor device includes a first element layer including a first memory cell, a second element layer including a second memory cell, and a silicon substrate including a driver circuit. The first element layer is provided between the silicon substrate and the second element layer. The first memory cell includes a first transistor and a first capacitor. The second memory cell includes a second transistor and a second capacitor. One of a source and a drain of the first transistor and one of a source and a drain of the second transistor are each electrically connected to a wiring for electrical connection to the driver circuit. The wiring is in contact with a first semiconductor layer included in the first transistor and a second semiconductor layer included in the second transistor and is provided in a direction perpendicular or substantially perpendicular to a surface of the silicon substrate.

Semiconductor device and electronic device having stacked element layers on driver-circuit substrate

A semiconductor device capable of measuring a minute current is provided. The semiconductor device includes an operational amplifier and a diode element. An inverting input terminal of the operational amplifier and an input terminal of the diode element are electrically connected to a first terminal to which current is input, and an output terminal of the operational amplifier and an output terminal of the diode element are electrically connected to a second terminal from which voltage is output. A diode-connected transistor that includes a metal oxide in a channel formation region is used as the diode element. Since the off-state current of the transistor is extremely low, a minute current can flow between the first terminal and the second terminal. Thus, when voltage is output from the second terminal, a minute current that flows through the first terminal can be estimated from the voltage.

Semiconductor device, semiconductor wafer, and electronic device

A high-resolution display device in which delay of input signals to pixels is reduced is provided. In the display device, a first layer, a second layer, and a third layer are formed in this order from the bottom. The first layer includes a driver circuit and a plurality of first wirings, the second layer includes a plurality of first contact portions, and the third layer includes a pixel array and a plurality of second wirings. The pixel array includes a plurality of pixel circuits. The plurality of second wirings are parallel to each other and extended in the column direction of the pixel array, and the plurality of pixel circuits are electrically connected to the plurality of second wirings. The driver circuit includes a plurality of output terminals positioned along a first direction. The plurality of first wirings are extended perpendicular to the first direction, and the plurality of output terminals are electrically connected to the plurality of first wirings. The plurality of first wirings are electrically connected to the plurality of second wirings through the plurality of first contact portions.

Display device and electronic device

A semiconductor device that can be miniaturized or highly integrated is provided. The semiconductor device includes a transistor. The transistor includes a first conductor, a first insulator over the first conductor, an oxide provided with a groove portion over the first insulator, a second conductor and a third conductor disposed in a region that does not overlap with the groove portion in the oxide, a second insulator disposed between the second conductor and the third conductor and in the groove portion in the oxide, and a fourth conductor over the second insulator. A bottom surface of the fourth conductor is lower than a bottom surface of the second conductor and a bottom surface of the third conductor. In a cross-sectional view of the transistor in the channel length direction, an end portion of a bottom surface of the groove portion has a curvature.

Semiconductor device having a groove portion in an oxide layer of a transistor channel

A semiconductor device having redundancy is provided. The semiconductor device includes a first driver circuit, a second driver circuit, a first selection circuit, a second selection circuit, and a switch circuit. An output terminal of the first driver circuit is electrically connected to an input terminal of the first selection circuit and a first terminal of the switch circuit, and an output terminal of the second driver circuit is electrically connected to an input terminal of the second selection circuit and a second terminal of the switch circuit.

Semiconductor device, display apparatus, and electronic device

A semiconductor device with a novel structure is provided. The semiconductor device includes a silicon substrate including a first circuit, a first element layer including a second circuit, and a second element layer including a third circuit. The first circuit includes a first transistor. The second circuit includes a second transistor. The third circuit includes a memory cell. The memory cell includes a third transistor and a capacitor. The first element layer and the second element layer constitute a stacked block stacked and provided in a direction perpendicular or substantially perpendicular to a surface of the silicon substrate. A plurality of stacked blocks are stacked and provided in the direction perpendicular or substantially perpendicular to the surface of the silicon substrate. Each of the plurality of stacked blocks includes a first wiring provided in the direction perpendicular or substantially perpendicular to the surface of the silicon substrate. The plurality of stacked blocks are electrically connected to each other through the wiring.

A highly reliable memory device is provided. On a side surface of a first conductor extending in a first direction, a first insulator, a first semiconductor, a second insulator, a second semiconductor, and a third insulator are provided in this order when seen from the first conductor side. The first conductor is provided with a first region overlapping with a second conductor with the first insulator, the first semiconductor, the second insulator, the second semiconductor, and the third insulator provided therebetween, and a second region overlapping with a third conductor with the first insulator, the first semiconductor, the second insulator, the second semiconductor, and the third insulator provided therebetween. In the second region, a fourth conductor is provided between the first insulator and the first semiconductor.

Memory device

A novel memory device is provided. A first cell array including a plurality of memory cells and a second cell array including a plurality of memory cells are provided to overlap with each other. Two bit lines included in the first bit line pair are electrically connected to part of the memory cells included in the first cell array and to part of the memory cells included in the second cell array. Two bit lines included in the second bit line pair are electrically connected to part of the memory cells included in the first cell array and to part of the memory cells included in the second cell array. In the first cell array, one of the bit lines included in the second bit line pair includes a region overlapping with part of the first bit line pair. In the second cell array, the other of the bit lines included in the second bit line pair includes a region overlapping with part of the first bit line pair.

Memory device including plurality of overlap memory cell arrays with folded bit-lines

A semiconductor device that can be miniaturized or highly integrated can be provided. The semiconductor device includes a first conductor positioned over a substrate; an oxide positioned in contact with atop surface of the first conductor; a second conductor, a third conductor, and a fourth conductor positioned over the oxide; a first insulator in which a first opening and a second opening are formed, the first insulator being positioned over the second conductor to the fourth conductor; a second insulator positioned in the first opening; a fifth conductor positioned over the second insulator; a third insulator positioned in the second opening; and a sixth conductor positioned over the third insulator. The third conductor is positioned to overlap with the first conductor. The first opening is formed to overlap with a region between the second conductor and the third conductor. The second opening is formed to overlap with a region between the third conductor and the fourth conductor.

Semiconductor device and method of manufacturing semiconductor device

A memory device having long data retention time and high reliability is provided. The memory device includes a driver circuit and a plurality of memory cells, the memory cell includes a transistor and a capacitor, and the transistor includes a metal oxide in a channel formation region. The transistor includes a first gate and a second gate, and in a period during which the memory cell retains data, negative potentials are applied to the first gate and the second gate of the transistor.

Memory device and electronic device

A semiconductor device having a large storage capacity per unit area is provided. The semiconductor device includes a first insulator including a first opening; a first conductor including a second opening over the first insulator; a second insulator including a third opening over the first conductor; a third insulator provided along a first side surface of the first opening, a second side surface of the second opening, and a third side surface of the third opening; an oxide provided along the first side surface, the second side surface, and the third side surface with the third insulator therebetween; a second conductor provided at the first side surface with the third insulator and the oxide therebetween; and a third conductor provided at the third side surface with the third insulator and the oxide therebetween, the oxide includes a first region in the first opening, a second region in the second opening, and a third region in the third opening, and the second region has higher resistance than the first region and the third region.

Semiconductor device and method for manufacturing semiconductor device

A display device excellent in downsizing, reduction in power consumption, or layout flexibility of an arithmetic device is provided. The display device includes a pixel circuit, a driver circuit, and a functional circuit. The driver circuit has a function of outputting an image signal for performing display in the pixel circuit. The functional circuit includes a CPU including a CPU core including a flip-flop electrically connected to a backup circuit. The display device includes a first layer and a second layer. The first layer includes the driver circuit and the CPU. The second layer includes the pixel circuit and the backup circuit. The first layer includes a semiconductor layer including silicon in a channel formation region. The second layer includes a semiconductor layer including a metal oxide in a channel formation region. The CPU has a function of correcting the image signal in accordance with the amount of current flowing through the pixel circuit.

Display device and display correction system

A data semiconductor device with a long retention time is provided. The semiconductor device includes a first transistor, a second transistor, a ferroelectric capacitor, a first capacitor, and a memory cell. Note that the memory cell includes a third transistor. A first gate of the first transistor is electrically connected to a first terminal of the ferroelectric capacitor, and a first terminal of the first transistor is electrically connected to a second gate of the first transistor and a first terminal of the second transistor. A second terminal of the second transistor is electrically connected to a second terminal of the ferroelectric capacitor and a first terminal of the first capacitor. A back gate of the third transistor is electrically connected to the first terminal of the first transistor. In the above structure, the threshold voltage of the third transistor can be increased by supplying a negative potential to the first terminal of the first transistor.

Semiconductor device and electronic device

A memory device in which bit line parasitic capacitance is reduced is provided. The memory device includes a sense amplifier electrically connected to a bit line and a memory cell array stacked over the sense amplifier. The memory cell array includes a plurality of memory cells. The plurality of memory cells are each electrically connected to a bit line. A portion for leading the bit lines is not provided in the memory cell array. Thus, the bit line can be shortened and the bit line parasitic capacitance is reduced.

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Kanagawa, Japan

Tatsuya Onuki