Nuflare Technology, Inc.

Tatsuya Murofushi

Hideki Matsui

Munehiro Ogasawara

Takashi Nakamura

Rieko Nishimura

Takuya Uemura

Yoshiaki Hattori

In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.

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Gotemba, Japan

Tatsuya Murofushi