Screen Holdings Co., Ltd.

Tatsuya Masui

Hideji Naohara

Hiroaki Kakuma

Yuji Okita

Yuichi Deba

Toru Endo

Nobuyuki Shibayama

Masayuki Hayashi

Ryo Yamada

Shinji Shimizu

Miwa Miyawaki

A substrate processing method includes: a holding step of carrying a substrate into an inside of a chamber and holding said substrate; a supply step of supplying a fluid to the substrate on the inside of the chamber; an imaging step of sequentially imaging the inside of the chamber by a camera to acquire image data; a condition setting step of specifying a monitoring target and changing an image condition based on the monitoring target; and a monitoring step of performing a monitoring process on the monitoring target based on the image data having the image condition corresponding to the monitoring target.

Substrate processing method and substrate processing apparatus

A substrate processing apparatus collectively processes a plurality of substrates with the plurality of substrates immersing in a processing liquid. The substrate processing apparatus includes a processing tank, a camera, and a controller. The processing tank stores the processing liquid. The camera is provided vertically higher above the processing tank and captures the inside of the processing tank to generate a plurality of items of captured image data. The controller generates smoothed image data obtained by smoothing a brightness distribution of waving caused on a liquid surface of the processing liquid based on integration of the plurality of items of captured image data, and monitors the inside of the processing tank based on the smoothed image data.

Substrate processing apparatus and monitoring method in substrate processing apparatus

A state detection device includes at least one chuck pin for holding a substrate, a photographing unit configured to photograph the chuck pin, and set at least one image to be obtained as a target image, a matching coordinate calculation unit, namely a data matching calculator, configured to perform matching processing between the target image and a reference image which is at least one image showing the chuck pin, and calculate matching coordinates, which are coordinates indicating a position of the reference image in the target image when a matching score between the reference image and the target image is the highest, and a detection unit, namely a detector, configured to detect an open/closed state of the chuck pin based on the matching coordinates. Therefore, the open/closed state of the chuck pin can be detected while maintaining high detection accuracy.

Substrate holder state detection device and substrate holder state detection method

A substrate processing apparatus that includes a substrate holder, a cup member, an elevating mechanism, a first nozzle, and a camera. The substrate holder holds a substrate and rotates the substrate. The cup member surrounds the outer circumference of the substrate holder. The elevating mechanism moves up the cup member so that the upper end portion of the cup member is located at the upper end position higher than the substrate held by the substrate holder. The first nozzle has a discharge port at a position lower than the upper end position, and discharges first processing liquid from the discharge port to an end portion of the substrate. The camera images an imaging region that includes the first processing liquid discharged from the discharge port of the first nozzle and is viewed from an imaging position above the substrate.

Substrate processing apparatus and substrate processing method

A substrate treatment device is provided, including a substrate holding unit holding a substrate and rotating the substrate; plural nozzles each having a discharge port and discharging a treatment liquid from the discharge port at a treatment position; a camera imaging an imaging region from an imaging position to acquire captured images, the imaging region containing the treatment liquid discharged from the discharge port of each nozzle positioned at the treatment position, and the imaging position being above the substrate held on the substrate holding unit and in a plan view, the imaging position being positioned at a central side of the substrate with respect to the nozzles and at an upstream side in a rotation direction of the substrate holding unit with respect to the nozzles; and an image processing unit determining a discharge state of the treatment liquid based on the captured images.

Substrate treatment device

A substrate treatment method is provided, including: holding a substrate on a substrate holding unit; rotating the substrate holding unit to rotate the substrate; raising a cup member surrounding an outer periphery of the substrate holding unit to locate an upper end of the cup member in an upper end position higher than an upper surface of the substrate held on the substrate holding unit; discharging a treatment liquid from a discharge port of a nozzle located lower than the upper end position to an end portion of the upper surface of the substrate held on the substrate holding unit; an imaging process, acquiring captured images of an imaging region by a camera, wherein the imaging region contains the treatment liquid discharged from the discharge port and is seen from an imaging position above the substrate; and determining a discharge state of the treatment liquid based on the captured images.

Substrate treatment method and substrate treatment device

In equipment that supplies a processing liquid on a top surface of a substrate while holding the substrate horizontally in a chamber a generation status of fumes is determined. Specifically, an image of a predetermined imaging area in the chamber is captured. Then, the generation status of fumes in the chamber is determined based on luminance values of the captured image acquired by the capturing of an image. Accordingly, it is possible to quantitatively determine whether a generation status of fumes in a chamber is normal.

Fume determination method, substrate processing method, and substrate processing equipment

In equipment that executes a drying process of forming a liquid membrane on a top surface of a substrate W which is held horizontally and gradually enlarging a dry area from which the liquid membrane has been removed, quality of the drying process is determined. Specifically, first, the top surface of the substrate is repeatedly imaged by an imaging unit during execution of the drying process. Then, it is determined whether the dry area is in a normal state based on a plurality of captured images acquired by the imaging. Accordingly, it is possible to quantitatively determine whether a dry area is in a normal state based on a plurality of captured images.

Determination method and substrate processing equipment

A substrate treatment device includes: a substrate rotation part that horizontally holds and rotates a substrate; a nozzle that supplies a treatment liquid to a surface to be treated of the substrate rotated by the substrate rotation part; an imaging part that captures an image of an imaging area including a plurality of target areas in which a liquid film is formed when the treatment liquid is supplied to the substrate; and a detection part that refers to an imaging result of the imaging part and detects a treatment ending time point of each of the target areas based on a change in luminance value for each of the target areas. Further, the imaging area includes at least an area on a center side of the surface to be treated and an area on an outer circumferential side of the surface to be treated as the target areas.

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Kyoto, Japan

Tatsuya Masui