Tokyo Electron Limited

Tokyo Electron Kyushu Limited

Tatsuya Iwasaki

Kiyohisa Tateyama

Shinya Tanoue

Noriyuki Anai

Takenobu Matsuo

Kimio Motoda

Takami Satoh

Kazuki Denpoh

Takayuki Tomoeda

Kengo Mizosaki

Shinzi Kitamura

Masaaki Yoshida

Eiji Yamaguchi

Yoshiharu Ota

Kouichi Tanoue

Shinichiro Araki

Eiichiro Kamada

A processing system for processing a substrate. The processing system includes a plurality of processing machines, a machine movable along a transfer path for transferring the substrate to the machines, a drive unit for driving the machine, and a control unit. The control unit includes a memory for storing a teaching threshold in a teaching mode and a practical operation threshold in a practical operation mode that is higher than the teaching threshold when a moving parameter of the drive unit exceeds a given value. The control unit also includes a controller monitoring a parameter representing a moving state of the drive unit to stop the drive unit when the parameter exceeds the practical operation threshold in the practical operation mode or when the parameter exceeds the teaching threshold in the teaching mode.

Interlock apparatus for a transfer machine

The present invention is a conveying unit having a controller for detecting information corresponding to the thickness of each of a plurality of raw substrates, assigning desired identifiers to the raw substrates, storing the identifiers, and causing a conveyor to convey each of the raw substrates or controlling processing conditions for a plurality of processing chambers with the identifiers corresponding to the thickness of each of the raw substrates. Thus, even if one cassette accommodates a plurality of raw substrates, the conveyor can smoothly load the same type of raw substrates to the accommodating cassette and unload them therefrom in a simple structure. The controller sets desired processing conditions for each of the processing portions corresponding to the identifiers.

Conveying unit and substrate processing unit

According to the present invention, there is provided a substrate conveying device and method for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, a first suction pad provided on the arm, for suctioning the substrate, a second suction pad provided on the arm at a position adjacent to that of the first suction pad, for suctioning the substrate, and a projecting member provided between the first and second suction pads of the arm, so as to control a posture of the substrate to be suctioned one of the first and second suction pads as the projecting member abuts the lower surface of the substrate.

Substrate conveying device and substrate conveying method

A substrate treatment device comprises a transporting arm for transporting a substrate within the treatment device, a supporting member, which is disposed on the transporting arm, for supporting the substrate, and a cleaning mechanism, which is installed in the substrate treatment device, for cleaning the supporting member. Since the substrate treatment device is equipped with the cleaning mechanism for cleaning the supporting member, the supporting member can be cleaned as required. Therefore, since the substrate always can be held on a clean supporting member, the particles are prevented from depositing on the rear surface of the substrate.

Substrate treatment device and substrate transporting method

A substrate transferring apparatus comprising support members for supporting a substrate, and a drive mechanism for moving the support members to transfer the substrate, wherein the support members each have a pair of outer support segments for supporting an outer periphery of the substrate and a pair of inner support segment provided between the outer support segments.

Substrate transferring apparatus and substrate processing apparatus

A substrate transferring apparatus comprising a substrate support member for supporting a substrate, a base member for holding the substrate support member to be movable horizontally, a lifting member, having one end and another end, for holding the base member at the one end to be rotatable in a horizontal plane, the lifting member being movable upward and downward, and a hold-and-guide member for holding the lifting member at the another end and for guiding the lifting member when the lifting member is moved upward and downward.

According to the present invention, there is provided a substrate conveying device for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, a first suction pad provided on the arm, for suctioning the substrate, a second suction pad provided on the arm at a position adjacent to that of the first suction pad, for suctioning the substrate, and a projecting member provided between the first and second suction pads of the arm, so as to control a posture of the substrate to be suctioned one of the first and second suction pads as the projecting member abuts the lower surface of the substrate.

An interlock apparatus for a transfer machine includes a drive unit for driving the arms of a transfer machine for transferring a substrate such as an LCD substrate. The apparatus also includes a control unit having a monitor function for monitoring a parameter representing the movement condition of the arms and stopping the drive unit when the parameter exceed a predetermined value. The apparatus also includes a switching function for selectively switching the predetermined value between a teaching mode in which the position of the arm is controlled and a practical operation mode in which the transfer machine is actually operated.

Liquid crystal display substrate conveying arm structure for a

A method of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.

Resist processing method and apparatus

A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.

Resist processing apparatus for a rectangular substrate

A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.

Method for scrubbing and cleaning substrate

A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

Growing community of inventors

Kumamoto, Japan

Tatsuya Iwasaki