Canon Kabushiki Kaisha

Tatsuya Hayashi

Noriyasu Hasegawa

Yosuke Murakami

Kenichi Kobayashi

Yusuke Tanaka

Takahiro Matsumoto

Hisashi Namba

Takafumi Miyaharu

Hirotoshi Torii

Tomomi Funayoshi

Keiji Emoto

Yoshikazu Miyajima

Yoshihiro Shiode

Keita Sakai

Kazuki Nakagawa

Setsuo Yoshida

Takashi Kamono

Mitsuru Hiura

Hiroyuki Koide

Ken-Ichiro Shinoda

Yozo Matsuda

An imprint apparatus that forms a pattern of a resin on a substrate that includes a plurality of substrate-side pattern regions by using a mold. The imprint apparatus includes a first mechanism applying a force to the mold to thereby deform a mold-side pattern region of the mold, a second mechanism heating the substrate-side pattern region to generate an uneven temperature distribution within the substrate-side pattern region for deforming the substrate-side pattern region, and obtaining shape difference information between the mold-side pattern region and the substrate-side pattern region, to control a shape of the mold-side pattern region by using the first mechanism based on the obtained shape difference information and controlling such that an uneven temperature distribution is formed in the substrate-side pattern region by using the second mechanism based on the obtained shape difference information.

Imprint apparatus for forming a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold, and related device manufacturing methods

An imprint method of curing an imprint material in a state in which the imprint material on a substrate and a mold are in contact with each other, includes curing the imprint material by applying first light to the imprint material using a first light source and applying second light to the imprint material using a second light source, thereby forming a plurality of patterns made of a cured product of the imprint material. An intensity distribution of the second light applied to the imprint material by the second light source in the curing is adjusted such that a distribution of evaluation values of the plurality of patterns formed through the curing satisfies a target distribution.

Imprint method, imprint apparatus, and article manufacturing method

The present invention provides an imprint apparatus forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including an optical system applying, to a peripheral region, irradiation light acing to increase viscosity of the imprint material, the peripheral region including an end of a mesa portion of the mold and surrounding the mesa portion in a state in which the mesa portion of the mold is held in contact with the imprint material, and a control unit controlling the optical system such that timings of applying the irradiation light to a plurality of zones in the peripheral region are different from each other, the zones being positioned at different distances from a center of the mesa portion, in the state in which the mesa portion of the mold is held in contact with the imprint material on the substrate.

Imprint apparatuses and article manufacturing methods applying viscosity increases without curing of imprint material

Imprint apparatus forms pattern of imprint material by contacting pattern region of mold with the imprint material and curing the imprint material. The apparatus includes actuators for controlling shape of the pattern region by applying force to the mold and controller for controlling the actuators. Each actuator is given command value defined by sum of first command value for correcting first component, of shape difference between the shot region and the pattern region, that can be approximated by linear function and second command value for correcting second component, of the shape difference, that can be approximated by second- or higher-order function. After determining the first command value, the controller determines adjustment range of the second command value based on the first command value and determines the second command value by setting the adjustment range as restriction.

Imprint apparatus, imprint method, and article manufacturing method

An imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold includes a mold holder that holds the mold and an optical system that irradiates the imprint material on the substrate with irradiation light for increasing a viscosity of the imprint material. The irradiation light has a light intensity distribution such that a light intensity increases from a center of a pattern portion of the mold toward a side surface of the pattern portion when the mold is held by the mold holder. The imprint material that moves from the center of the pattern portion of the mold toward the side surface of the pattern portion in a region including the side surface of the pattern portion of the mold is irradiated with the irradiation light while the mold and the imprint material on the substrate are in contact with each other.

Imprint apparatus and method for manufacturing article

An imprint apparatus includes first illumination optical system for emit light to cure imprint material between mold and substrate, second illumination optical system having light adjuster for illuminating the imprint material in part of region between the mold and the substrate, combiner located on pupil plane common to the first and second illumination optical systems and configured to combine the light from the first illumination optical system and the light from the second illumination optical system The combiner combines the light from the first illumination optical system and the light from the second illumination optical system by a mirror located in region surrounded by illumination region of the first illumination optical system including annular light intensity distribution on the pupil plane reflecting the light from the second illumination optical system.

Imprint apparatus, imprint method, and method for manufacturing article

An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.

Imprint apparatus, imprint method, and method for producing article

A method of forming a pattern on a substrate includes forming a group of first patterns so as to define a first region on each of a plurality of substrates by using a projection exposure apparatus, and forming a group of second patterns so as to define a second region on the first region of each of substrates different from each other out of the plurality of substrates by using a plurality of imprint apparatuses. A plurality of second regions, which are respectively defined by the plurality of imprint apparatuses in the forming the group of second patterns, are different in shape but have a common component. In the forming the group of first patterns, the first regions are deformed in accordance with the common component.

Pattern formation method and article manufacturing method

An imprint apparatus according to an exemplary embodiment of the present disclosure, the imprinting apparatus forming a pattern on a region of a substrate to be processed using a mold, the imprint apparatus including a mount portion on which the substrate is mounted, and a heating unit that heats the region to be processed. On the basis of information related to a difference in shape between a pattern area of the mold and the region to be processed and information related to a contact pressure exerted between the substrate and the mount portion, the heating unit heats the region to be processed such that the difference in shape between the pattern area of the mold and the region to be processed is reduced.

Imprint apparatus, imprinting method, and manufacturing method of article

The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by using a mold, the apparatus comprising a heating unit configured to heat a region to be imprinted on the substrate, thereby deforming the region, and a processing unit configured to determine, as a region to be imprinted first, one region out of a first region and second region to be imprinted, and determine the other region as a region to be imprinted subsequently, wherein an influence on the other region in a case where the heating unit deforms the one region is smaller than an influence on the one region in a case where the heating unit deforms the other region.

Imprint apparatus, and method of manufacturing article

An imprint apparatus forms a pattern of a resin on a region to be processed of a substrate using a mold including a pattern region on which a pattern is formed and includes a correction unit configured to correct a shape of a target region that is either the pattern region on the mold or the region to be processed on the substrate, wherein the correction unit further includes: a heating unit configured to heat an object corresponding to the target region of either the mold or the substrate in a heating region having an area smaller than that of the pattern region on the mold; a scanning unit configured to scan the heating region with respect to the target region by changing the relative position of the target region and the heating region; and a control unit configured to acquire information regarding a correction deformation amount of the target region and control the heating unit and the scanning unit based on the information.

Imprint apparatus

An imprint apparatus that transfers a pattern formed on a mold onto a resin on a substrate. A light irradiation unit irradiates the resin with light to cure the resin. A shape correction mechanism applies a force to the mold to deform a pattern region formed on the mold. A heating mechanism heats a substrate-side pattern region formed on the substrate to deform the substrate-side pattern region. A control unit obtains information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and controls the shape correction mechanism and the heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information. The control unit controls a temperature distribution in the substrate-side pattern region by using the heating mechanism.

Imprint apparatus and article manufacturing method using same

An exposure apparatus that includes a projection optical system, and exposes a substrate to light via the projection optical system and a liquid that is supplied between the projection optical system and the substrate. A plurality of recovery ports recover the liquid supplied between the projection optical system and the substrate, and are discretely arranged between vertices on each side of a polygon and at each of the vertices of the polygon. A chamber, connected to the plurality of recovery ports, receives the liquid. A pump attracts the liquid via the plurality of recovery ports and the chamber. A pressure difference between the pump and each of the recovery ports positioned at the vertices, among the plurality of recovery ports, is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices, among the plurality of recovery ports.

Exposure apparatus, and method of manufacturing a device

The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.

Imprint apparatus and article manufacturing method

An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage and is configured to hold the original, an electrode which is provided outside the electrostatic chuck on the stage via an insulator, and an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode. The particle adherence to the original can be effectively avoided.

Growing community of inventors

Utsunomiya, Japan

Tatsuya Hayashi