Tokyo Ohka Kogyo Co., Ltd.

Toyko Ohka Kogyo Co., Ltd.

Tatsuya Fujii

Yuki Fukumura

Takashi Kamizono

Masahito Yahagi

Daisuke Kawana

Issei Suzuki

Kenta Suzuki

Yoshitaka Komuro

Toshikazu Takayama

Masatoshi Arai

Taku Hirayama

Yoichi Hori

Shogo Matsumaru

Takahiro Kojima

Jun Iwashita

Hideto Nito

Takashi Nagamine

Tomotaka Yamada

Takuya Ikeda

Kazuaki Ebisawa

Kenri Konno

KhanhTin Nguyen

Hiroto Yamazaki

Masafumi Fujisaki

A resist composition including a base component and a fluorine additive component (F), the component (F) including a copolymer having a structural unit (f1) represented by general formula (f1-1) or (f1-2), and a structural unit (f2) represented by general formula (f2-1) (in formula (f1-1) and (f2-1), R represents a hydrogen atom or the like; at least one of Rafand Raf, and at least one of Rafand Rafrepresents a hydrocarbon group substituted with a fluorine atom, and the total number of carbon atoms is 3 or more, provided that a hydrocarbon group forming a bridge structure is excluded; and the structural unit (f2) has a specific acid dissociable group containing an aliphatic cyclic group having no bridge structure

Resist composition and method of forming resist pattern

A resist composition including a polymeric compound having a structural unit in which a compound represented by formula (a0-1) has a polymerizable group within the Wportion converted into a main chain, and a compound represented by formula (b1-1) in which Wrepresents a polymerizable group-containing group; Crepresents a tertiary carbon atom, and the &#x3b1;-position of Cis a carbon atom which constitutes a carbon-carbon unsaturated bond; Rrepresents an aromatic hydrocarbon group or a chain hydrocarbon group; Rand Rare mutually bonded to form a 5-membered aliphatic monocyclic group, or a condensed polycyclic hydrocarbon group containing a 5-membered aliphatic monocyclic ring; Rrepresents a cyclic group; R, Rand Reach independently represents a substituent; nrepresents an integer of 0 to 4; nrepresents an integer of 0 to 5; nrepresents an integer of 0 to 5; and Xrepresents a counteranion. 

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Vais a divalent hydrocarbon group, nrepresents an integer of 0 to 2, Yais a carbon atom, Xais a group forming a monocyclic aliphatic hydrocarbon group together with Ya, and Rais an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rrepresents a cyclic hydrocarbon group, Yrepresents a divalent linking group containing an ester bond, Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, and Mis an m-valent organic cation. 

Resist composition and method for forming resist pattern

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Varepresents a divalent hydrocarbon group; nrepresents an integer of 0 to 2; Rarepresents an acid dissociable group represented by general formula (a0-r1-1); Raand Rarepresents a hydrocarbon group; Raand Ramay be mutually bonded to form a ring; Yarepresents a quaternary carbon atom; Ra, Raand Raeach independently represents a hydrocarbon group, provided that at least one of Ra, Raand Rais a hydrocarbon group having a polar group). 

Resist composition, method of forming resist pattern, polymeric compound, and copolymer

A resist composition includes a base material component and a fluorine additive component. The fluorine additive component contains a fluororesin component having a structural unit containing a base dissociable group. The base material component contains a structural unit containing an acid-decomposable group in an amount of 30 mol % or more and an amount of 10 mol % or more of a resin component having a structural unit represented by formula (a10-1): where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Yais a single bond or a divalent linking group, Wais a (n+1) valent aromatic hydrocarbon group, and nais an integer of 1 to 3.

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and a fluorine additive component (F) which exhibits decomposability to an alkali developing solution, the fluorine additive component (F) including a fluorine resin component (F1) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a group represented by general formula (f2-r-1) shown below in which each Rfindependently represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxy group, a hydroxyalkyl group or a cyano group; n&#x2033; represents an integer of 0 to 2; and * represents a valence bond. 

A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rrepresents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yrepresents a divalent linking group containing an ester bond (&#x2014;C(&#x2550;O)&#x2014;O&#x2014; or &#x2014;O&#x2014;C(&#x2550;O)&#x2014;), Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mrepresents an m-valent organic cation.R&#x2014;Y&#x2014;V&#x2014;CF&#x2014;SO(M)&#x2003;&#x2003;(b1)

Resist composition, method for forming resist pattern, compound, and acid generator

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Rato Rarepresents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more. 

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Yaand Yaare a single bond or a divalent linking group; Ris a hydrocarbon group having 1 to 20 carbon atoms or the like; Ris an oxygen atom or the like; j and nare integers of 1 to 3; Wais a (n+1)-valent aromatic hydrocarbon group. 

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Vais a divalent hydrocarbon group. nrepresents an integer of 0 to 2. Ra'and Ra&#x2032;are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra&#x2032;is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rrepresents a cyclic hydrocarbon group. Yrepresents a divalent linking group containing an ester bond. Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and Mis an m-valent organic cation. 

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Rarepresents an aromatic hydrocarbon group optionally having a substituent). 

A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0):  Zto Zeach independently represent a substituent having electron withdrawing properties, Rband Rbeach independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rbrepresents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0represents an organic anion.

Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound

A resist composition including a base component containing a polymer (A1) having a structural unit (a5) containing a group represented by general formula (a5-0-1) or (a5-0-2), wherein the amount of the monomer that derives the structural unit (a5) is not more than 100 ppm relative to (A1). In the formulas, each of Qand Qrepresents single bond or divalent linking group, R, Rand Rrepresent organic groups, and Rand Rmay be bonded to each other to form a ring in combination with the sulfur atom, provided that &#x2014;R&#x2014;S(R)(R) has a total of only one aromatic ring or has no aromatic rings, Vrepresents a counter anion, Arepresents an organic group containing anion, and Mrepresents an organic cation having a valency of m, wherein m represents an integer of 1 to 3, provided that Mhas only one aromatic ring or has no aromatic rings. 

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Kawasaki, Japan

Tatsuya Fujii