Komatsu Corporation

Gigaphoton Inc.

Ushio Denki Kabushiki Kaisha

Other

Tatsuya Ariga

Osamu Wakabayashi

Akira Endo

Takahito Kumazaki

Kotaro Sasano

Masato Moriya

Hideo Hoshino

Takashi Suganuma

Krzysztof Nowak

Kyohei Seki

Taisuke Miura

Toru Igarashi

Kouji Kakizaki

Kiwamu Takehisa

Hiroyoshi Yamaguchi

Shoichi Sakanishi

Hirokazu Tanaka

Tetsuya Shinbo

Satoru Bushida

Osamu Yoshimi

Tatsuya Kitamura

Noritoshi Itoh

Jun Akita

Naoki Kitatochi

Tomokazu Takahashi

The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser () and an amplification-stage laser (). Oscillation laser light having divergence is used as the oscillation-stage laser (), and the amplification-stage laser () comprises a Fabry-Perot etalon resonator made up of an input side mirror () and an output side mirror (). The resonator is configured as a stable resonator.

Two-stage laser system for aligners

An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device

Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device

A driver laser for EUV light source apparatus which driver laser simultaneously achieves short-pulsing and multi-line oscillation. The driver laser includes: a short-pulse multi-line oscillated COlaser oscillator having a device that shortens width of pulses included in a laser beam to be output and a device that suppresses amplitude of an oscillation spectrum exhibiting an energy peak value; and at least one amplifier that inputs the laser beam output from the short-pulse multi-line oscillated COlaser oscillator and amplifies the input laser beam to output the amplified laser beam.

LPP type extreme ultra violet light source apparatus and driver laser for the same

A charging voltage Vosc applied to a main capacitor Cdisposed in an oscillating high-voltage pulse generatorof an oscillating laseris subject to constant control such that a pulse energy Posc of the oscillating laserbecomes a lower limit energy Esor more of an amplification saturation region. And, a charging voltage Vamp applied to a main capacitor Cdisposed in an amplifying high-voltage pulse generatorof an amplifying laseris controlled, and pulse energy Pamp of the amplifying laseris determined as target energy Patgt. Thus, the pulse energy of a two-stage laser is controlled to stabilize the pulse energy.

Two-stage laser pulse energy control device and two-stage laser system

In a line-narrowed gas laser system such as a line-narrowed molecular fluorine laser system, ASE is cut off to obtain a spectral linewidth of 0.2 pm or lower and a spectral purity of 0.5 pm or lower. The laser system comprises a laser chamber filled with an F-containing laser gas, discharge electrodes located in the laser chamber, a laser resonator and a line-narrowing module located in the laser resonator with a wavelength selection element, so that a line-narrowed laser beam emerges from the laser resonator. To cut off ASE from the laser beam emerging from the laser resonator, the duration from laser emission by discharge to generation of a laser beam is preset. Rise of the sidelight is made so gentle that the starting point of a laser pulse can exist after the time of the first sidelight peak.

Line-narrowed gas laser system

A an apparatus for locking a bending mechanism that bends a reflex type wavelength selection element for a bending mechanism that bends a reflex type wavelength selection element comprises a locking assembly. The locking assembly locks the bending mechanism. This allows maintaining the configuration of the reflex type wavelength selection element with the element being bent by the bending mechanism according to curvature of wavefront of an incident laser beam. Therefore, it is possible to stabilize the performance of wavelength selection in the reflex type wavelength selection element, even though the laser device receives vibration and shock.

Apparatus for locking bending mechanism that bends reflex type wavelength selection element

The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser devicewhich has discharge electrodeswithin a laser chamberfilled with laser gas containing Fand emits laser beam which is band-narrowed by means of a band narrowing modulearranged in a laser resonator, and an amplifier laser devicewhich has discharge electrodeswithin a laser chamberfilled with laser gas containing Fand amplifies laser pulse injected from said oscillator laser deviceIn the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laserand the system is set such that a discharge occurs in the amplifier laserwithin the synchronous time interval.

Two stage laser system

A narrow band ultraviolet laser device which can restrict a change in temperature gradient at light transmitting sections and maintain laser light at a high grade. To this end, the ultraviolet laser device includes light shielding elements ( A to C) having light transmitting sections ( A to C) each constituted by an opening for transmitting laser light ( ), and light shielding sections ( A to C) that surround the light transmitting sections ( A to C), remove an undesired laser light ( A) from an optical path and shape the laser light ( ) into a predetermined form, wherein heating means ( ) for heating the light transmitting sections ( A to C) are provided in the vicinity of the light shielding elements ( A to C).

Ultraviolet laser device

The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser and an amplification-stage mode . The center wavelength of a laser beam emitted out of the oscillation-stage laser is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser when the latter is oscillated by itself.

Photolithographic molecular fluorine laser system

Fluorine laser device capable of obtaining laser light with strong monochromatic property and large power is provided. For this purpose, the fluorine laser device is in a fluorine laser device including a laser chamber ( ) in which a laser medium including fluorine is contained and is excited to thereby oscillate laser light ( ), a front slit ( ) disposed in front of said laser chamber ( ) and having a front opening ( ) for transmitting the laser light ( ), and a rear slit ( ) disposed behind said laser chamber ( ) and having a rear opening ( ) for transmitting the laser light ( ), at least one of the front slit ( ) and the rear slit ( ) is a slit ( ) in which a slit inclined plane ( ) is formed on a surface at a laser chamber side to make one of the front opening ( ) and the rear opening ( ) convex.

Fluorine laser device

A band narrowing laser having a band narrowing module which narrows by a band narrowing element a band of the laser beam generated from a laser medium, in which wavefront correction means ( ) that corrects the wavefront of an incident laser beam and and projects the corrected beam is intalled in the band narrowing module ( ) to produce a laser beam with a narrow and stable spectral line width.

Growing community of inventors

Hiratsuka, Japan

Tatsuya Ariga