Sumitomo Chemical Company, Limited

Tatsuro Masuyama

Koji Ichikawa

Satoshi Yamaguchi

Satoshi Yamamoto

Yuichi Mukai

Shingo Fujita

Takahiro Yasue

Masako Sugihara

Yuki Suzuki

Kazuhiko Hashimoto

Ichiki Takemoto

Yukako Anryu

Takashi Hiraoka

Masahiko Shimada

Junji Shigematsu

Mitsuhiro Hata

Natsuki Okada

Takuya Nakagawa

Katsuhiro Komuro

Kaoru Araki

Masafumi Yoshida

Hiromu Nakamura

Hanwoo Park

Disclosed is a salt represented by formula (I): wherein, in formula (I),

Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I) and a resist composition including the salt are described.

Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein Rrepresents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, Rand Reach independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, Rrepresents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the alkyl fluoride group and the alkyl group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, Rrepresents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2&#x2264;m2+m4+m5&#x2264;5.

Compound, resin, resist composition and method for producing resist pattern

Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein Rrepresents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Lrepresents a single bond or &#x2014;CO&#x2014;O*; Rrepresents an alkyl group, and &#x2014;CH&#x2014; included in the group may be replaced by &#x2014;O&#x2014; or &#x2014;CO; Rrepresents a fluorine atom, an alkyl fluoride group or an alkyl group, and &#x2014;CH&#x2014; included in the alkyl fluoride group and the alkyl group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; Rrepresents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3&#x2264;m2+m3+m4+m5&#x2264;5.

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: wherein Rrepresents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R, Rand Reach independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and Xrepresents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and &#x2014;CH&#x2014; included in the hydrocarbon group may be replaced by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014; or &#x2014;SO&#x2014;.

Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern

The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I): wherein, in formula (I),

Compound, resist composition and method for producing resist pattern

A compound represented by the formula (I): 

Compound, resin, photoresist composition and process for producing photoresist pattern

Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: 

Photoresist composition and process for producing photoresist pattern

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I') and a structural unit having an acid-labile group: wherein Rand Reach independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom,Ar represents an aromatic hydrocarbon group which may have a substituent,Lrepresents a group represented by formula (X-1), etc.,L, L, Land Leach independently represent an alkanediyl group,L, L, Land Leach independently represent &#x2014;O&#x2014;, &#x2014;CO&#x2014;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014; or &#x2014;O&#x2014;CO&#x2014;O&#x2014;, and* and ** are bonds, and ** represents a bond to an iodine atom.

Resin, resist composition and method for producing resist pattern

Disclosed is a compound represented by formula (I): in formula (I), 

Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group: wherein Rrepresents a hydrocarbon group which may have a substituent, Reach independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, Lrepresents a group represented by formula (L-1), etc., L, L, Land Leach independently represent an alkanediyl group, L, L, Land Leach independently represent &#x2014;O&#x2014;, &#x2014;CO&#x2014;, &#x2014;CO&#x2014;O&#x2014;, etc., * and ** are bonds, and ** represents a bond to an iodine atom.

A salt comprising a group represented by the formula (aa): wherein Xand Xindependently each represent an oxygen atom or a sulfur atom, and Xrepresents a C1-C12 saturated hydrocarbon group which has a moiety represented by formula (1a) or (2a): 

Salt and photoresist composition containing the same

A salt containing a group represented by the formula (aa): wherein Xand Xindependently each represent an oxygen atom or a sulfur atom, a ring W represents a C3-C18 heterocycle which has a carbonate ester structure and which can have a substituent, and * represents a binding position is provided.

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Osaka, Japan

Tatsuro Masuyama