Oji Holdings Corporation

Tatsuji Ishida

Masahiro Nakata

Tadakazu Ishiwata

Yoshimune Okuyama

Akihiro Kakehi

Yoshinori Matsuo

Takeshi Tominaga

Masahiro Yoda

A polypropylene film which is capable of suppressing blocking in a rolled polypropylene film. The polypropylene film has a first surface and a second surface, contains a polypropylene resin as a main component, and is configured such that: the Svk value (SvkA) of the first surface is 0.005 μm or more and 0.030 μm or less; the Spk value (SpkA) of the first surface is more than 0.035 μm and 0.080 μm or less; the Svk value (SvkB) of the second surface is 0.005 μm or more and 0.030 μm or less; and the Spk value (SpkB) of the second surface is 0.015 μm or more and 0.035 μm or less.

Polypropylene film, metal layer-integrated polypropylene film, film capacitor and film roll

A polypropylene film which is capable of suppressing blocking in a rolled polypropylene film. The polypropylene film has a first surface and a second surface, contains a polypropylene resin as a main component, and is configured such that: the Svk value (SvkA) of the first surface is 0.005 &#x3bc;m or more and 0.030 &#x3bc;m or less; the Spk value (SpkA) of the first surface is more than 0.035 &#x3bc;m and 0.080 &#x3bc;m or less; the Svk value (SvkB) of the second surface is 0.005 &#x3bc;m or more and 0.030 &#x3bc;m or less; and the Spk value (SpkB) of the second surface is 0.015 &#x3bc;m or more and 0.035 &#x3bc;m or less.

A film for a capacitor having a plurality of layers, the film for capacitors satisfying the following relational expression (1): Cmo/Cmu&#x2265;1.1 wherein Cmu is an oxygen gas permeability coefficient of the film for the capacitor, and Cmo is an oxygen gas permeability coefficient of an equivalent film that would be obtained if the film for the capacitor were to be formed as a uniform single layer, and having a thickness of 1 to 35 &#x3bc;m.

Film for capacitor and process for producing same

The present invention addresses the problem of providing a biaxially stretched polypropylene film for capacitors, which has high voltage resistance and excellent breakdown properties. The present invention also addresses the problem of providing a biaxially stretched polypropylene film for capacitors, which can be used suitably in a high-capacity capacitor to which a high voltage is to be applied under a higher temperature, and which preferably has a small thickness. The present invention relates to a biaxially stretched polypropylene film for capacitors, wherein a polypropylene resin which constitutes the polypropylene film has a number average molecular weight of 40,000 to 100,000 inclusive and a Z average molecular weight of 950,000 to 1,500,000 includes wherein, in a molecular weight distribution curve, the value of the difference obtained by subtracting a differential distribution value at a logarithmic molecular weight Log (M) of 6.0 from a differential distribution value at a logarithmic molecular weight Log (M) of 4.5 is &#x2212;15 to 11% inclusive.

Biaxially stretched polypropylene film for capacitors

The present invention addresses the problem of providing a biaxially stretched polypropylene film for capacitors, which has high voltage resistance and excellent breakdown properties. The present invention also addresses the problem of providing a biaxially stretched polypropylene film for capacitors, which can be used suitably in a high-capacity capacitor to which a high voltage is to be applied under a higher temperature, and which preferably has a small thickness. The present invention relates to a bi-axially stretched polypropylene film for capacitors, wherein a polypropylene resin which constitutes the polypropylene film has a number average molecular weight of 40,000 to 100,000 inclusive and a Z average molecular weight of 950,000 to 1,500,000 inclusive, wherein, in a molecular weight distribution curve, the value of the difference obtained by subtracting a differential distribution value at a logarithmic molecular weight Log (M) of 6.0 from a differential distribution value at a logarithmic molecular weight Log (M) of 4.5 is &#x2212;15 to 11% inclusive.

Growing community of inventors

Tokyo, Japan

Tatsuji Ishida