Tokyo Electron Limited

Tatsuhei Yoshida

Hiroshi Tomita

Makoto Hayakawa

Akira Miyata

Shinichi Hayashi

Nobuaki Matsuoka

Suguru Enokida

In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes Mand Madapted for abnormality. In mode Mthe processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode Mthe developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

Coating and developing apparatus and method

A coating and developing treatment apparatus includes a substrate transfer mechanism; and a defect inspection section. A transfer control part controls transfer of a substrate. A defect classification part classifies a defect based on the state of the defect. A storage part stores a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections. A defective treatment specification part specifies, based on a kind of the defect classified by the defect classification part and the transfer route of the substrate stored in the storage part, a treatment section which is a cause of occurrence of the classified defect, and judges presence or absence of an abnormality of the specified treatment section. The transfer control part controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification part.

Substrate treatment apparatus, method of transferring substrate, and non-transitory computer storage medium

In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes Mand Madapted for abnormality. In mode Mthe processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

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Tokyo, Japan

Tatsuhei Yoshida