Chosu Industry Co., Ltd.

Tateo Saito

Osamu Kobayashi

A molecular beam source for use in accumulation of organic thin-films which enables the forming of a uniform thin-film on film-forming surfaces of a large-sized substrate, but without producing deposition or separation of a film-forming material in an opening for discharging molecules of the film-forming material, wherein a valveis disposed in a space starting from a side of a molecule heating portionand reaching to a molecule discharge openingfor discharging the generated molecules of the film-forming material towards a film-forming surface and, further, heatersandare provided at a side of the molecule discharge openingfor heating the molecules of the film-forming material to be discharged. At the side of the molecule discharge openingare provided an exterior guidehaving a tapered guide wall and also an interior guidehaving a tapered guide wall is provided within an inside of the exterior guide. Between the exterior guideand interior guide, there is formed a molecule discharge passagein which the diameter thereof gradually increases along a direction of the discharge of the molecules therefrom. The heatersandare provided on the exterior guideand the interior guide, respectively and, further, there is provided a heaterpenetrating through the molecule discharge opening, whereby narrowing and/or blockage hardly occur in the discharge opening.

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Ibaraki-ken, Japan

Tateo Saito