Hypertherm, Inc.

Other

Tate S Picard

Gregory S Wilson

Roger E Young, Jr

Ronald M Huppe

Kenneth J Woods

William J Connally

Sanjay Garg

Jeffery L Peterson

Systems and methods are provided for adjusting a laser beam applied to a workpiece in a processing operation. A laser processing system receives the laser beam that is associated with a beam quality property. The laser processing system adjusts the laser beam to change the beam quality property based on a characteristic of the workpiece, a characteristic of the processing operation, or a combination thereof. The adjusted laser beam can also be delivered to the workpiece.

Optimization and control of beam quality for material processing

A thermal processing system includes a thermal torch for processing a workpiece, a power supply for providing power to the thermal torch, a positioning system for relatively moving the thermal torch and the workpiece, a controller for controlling the thermal processing system, and a deterministic-based communication network, such as, for example, a network which operates using SERCOS. The deterministic-based communications network connects at least the controller, the power supply, and the positioning system of the thermal processing system together.

Networking architecture for thermal processing system

Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.

Centralized control architecture for a laser materials processing system

The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the 'intelligence' of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.

Centralized control architecture for a plasma arc system

The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the &ldquo;intelligence&rdquo; of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.

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Enfield, NH, United States of America

Tate S Picard