Sumitomo Metal Mining Company, Ltd.

Tasuo Nate

Toshio Morimoto

Shinobu Endo

Kouichi Oka

An alloy target used for manufacturing a magneto-optical recording medium, wherein the component and composition comprises 10-50 atom % of at least one of rare earth elements selected from the group consisting of Nd, Sm, Gd, Tb, Dy, Ho, Er and Tm, from 0.1 to 10 atom % of at least one of additive elements selected from the group consisting of B, Al, Si, P, Ti, V, Cr, Mn, Zr, Nb, Mo, Hf, Ta, W, Pt, Pb and Bi and the balance substantially composed of at least one of transition metals selected from the group consisting of Co, Fe and Ni; and a structure comprises any one of mixed structure from a group consisting of (1) a mixed structure comprising a phase of intermetallic compound of rare earth element--additive element--transition metal, and a fine mixed phase of rare earth element and intermetallic compound of rare earth element--transition metal, (2) a mixed structure comprising a phase of intermetallic compound of rare earth element--transition metal and a fine mixed phase of rare earth element and intermetallic compound of rare earth element--transition metal (at least one of the rare earth element and the intermetallic compound in the fine mixed phase contains additive element); (3) a mixed phase comprising a phase of intermetallic compound of rare earth element--transition metal and a phase of intermetallic compound of rare earth element--additive element; (4) a mixed structure comprising any one of the mixed structures (1), (2) and (3) above and a phase of rare earth element alone; and (5) a mixed structure of any one of the mixed structures comprising a phase of intermetallic compound of rare earth element--additive element--transition metal, and a phase of rare earth element alone; in which the phase of the transition metal alone is not substantially present.

Alloy target used for manufacturing magneto-optical recording medium

An alloy target for magneto-optical recording having component and composition comprising 10 to 50 atom % of at least one rare earth element from Sm, Nd, Gd, Tb, Dy, Ho, Tm and Er, the balance being substantially at least one transition metal from Co, Fe and Ni, and having a mixed structure comprising a phase of intermetallic compound of the rare earth element and the transition metal and a fine mixed phase of the rare earth element and intermetallic compound of the rare earth element and the transition metal or having a mixed structure comprising the structure above and a phase of the rare earth element alone. The target has uniform composition and high strength free from cracking, etc., shows less composition difference between film and target and less change of the film composition with elapse of sputtering time.

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Ichikawa, Japan

Tasuo Nate