Hitachi, Ltd.

Samsung Electronics Co., Ltd.

Ntt Docomo, Inc.

Taro Ogawa

Toshiaki Suzuki

Kozo Mochiji

Hiroaki Oizumi

Jun Nakajima

Takeshi Kimura

Takashi Soga

Kaoru Umemura

Masaru Izawa

Yoshinori Nakayama

Toshiki Sugawara

Masataka Shirai

Seiichi Murayama

Toshio Katsuyama

Shinji Kuniyoshi

Eiji Takeda

Kazuhiko Hosomi

Hiroshi Kakibayashi

Kazuhiko Sagara

Byoung-taek Lee

Isao Ochiai

Masaaki Ito

Yasuyuki Honda

Yasunari Soda

Takatoshi Kajiwara

Seiji Yamamoto

Hayato Hoshihara

Tomoko Motohashi

Biichi Hoshino

A network management system includes a plurality of server units. A first management server included in a first server unit transmits a disconnection setting request for disconnecting an abnormal flow to each of a communication node connected to a self-region covered by the first management server, and one or more second server units covering one or more primary adjacent regions adjacent to the self-region. Disconnection setting is executed in response to the disconnection setting request. Each of a plurality of regions includes two or more areas each of which is covered by corresponding one of two or more base stations connected to an identical communication node.

Network management system, and network management method

The network system includes a plurality of communication nodes, a network that is connected to the plurality of communication nodes, and a network management server that is connected to the network. The network management server accepts information of a plurality of regions in each of which a plurality of areas that are assigned to the respective communication nodes are grouped, and the network management server executes setting of controlling an abnormal flow on the communication nodes to which the areas grouped in a first region in which the areas assigned to the communication node notifying detection of the mobile unit that transmits the abnormal flow are grouped and at least one second region adjacent to the first region are assigned.

Network system, network management method and network management apparatus

A network management device retains path information of paths as a list of node identifying information to identify nodes, the path information including information on paths sharing a link regarding a relation in which one path shares a link with another path. According to the information on paths sharing a link, the network management device determines a path setup timing for a path to be the same for a group of one or more paths that do not share a same link with the path and determines a different path setup timing for a group of one or more paths that share a same link with the path than the timing for the group including the path, and executes path setup via communication devices existing on paths constituting each group of paths as per path setup timing determined for each group.

Network system, network management method, and network management device

A mobile communication system is provided such that multiple identity codes assigned to a terminal device are displayed on the terminal device, whereby such multiple identity codes are selectively and arbitrarily used without a specific provision, and an identity code is displayed according to an arrival of an appropriate notification chance. A subscriber identity code notification apparatus is also provided. A subscriber identity code holding device holds multiple identity codes such as telephone numbers, which are applicable to a single terminal device and which are different depending on the telecommunications carrier. A subscriber identity code notification apparatus is provide such that the subscriber identity code held by the subscriber identity code holding device notifies the terminal device of the corresponding subscriber identity code, in discrimination of an arrival of a given notification chance.

Mobile communication system for notifying subscriber identity identity code notification apparatus

A micro-spectroscopic measuring device having a structure in which a spectroscopic element made of an array of photonic crystals with defects, flow paths for introducing a sample, and light detecting elements with sensitivity to a band from near infrared to infrared are stacked.

Micro-spectroscopic measuring device and micro-chemical system

Reflection photomasks add a buffer layer including at least one Group VIII metal between a reflection layer and an absorber pattern that is configured to absorb extreme ultraviolet rays therein. In particular, reflection photomasks include a substrate and a reflection layer having multiple sets of alternating films of first and second materials, on the substrate. A buffer layer including at least one Group VIII metal is provided on the reflection layer opposite the substrate. An absorber pattern including material that is patterned in a pattern and that is configured to absorb extreme ultraviolet rays, is provided on the buffer layer opposite the reflection layer. The at least one Group VIII metal preferably is Ru. At least a portion of the Ru buffer layer may be less than about 3 nm thick. Alternatively, the Group VIII metal can include Pt, Ir and/or Pd.

Reflection photomasks including buffer layer comprising group VIII metal, and methods of fabricating and using the same

An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so that side face portions of predetermined patterns which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X-radiation, or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and the direction of side faces of the patterns may extend in parallel to each other. When the optical element is irradiated to replicate or image the patterns of the optical element, refined patterns can be replicated or imaged.

Optical element and projection exposure apparatus employing the same

In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate refractivity are provided on side walls of an absorbing pattern of an X-ray mask to improve the resolution by an interference effect. One or more layers made of a material having a refractivity different from that of the absorbing pattern are formed on the side walls of the absorbing pattern of the X-ray mask.

X-ray exposure method with an X-ray mask comprising phase shifter

Pattern fabrication by radiation-induced graft copolymerization

A focusing X-ray crystal monochromator in which one or more crystal layers having different spacings of lattice plane are stacked on a crystal base. Due to different spacings of lattice plane, the angle of reflection and diffraction of a diverging incident X-ray beam can be so changed that the beam takes a parallel or focusing direction for monochromatization. Thus, the monochromator of the present invention can be applied to the X-ray lithography for transferring a pattern of high resolution or the X-ray analysis such as the fine X-ray diffraction.

Crystal monochromator

Growing community of inventors

Tokyo, Japan

Taro Ogawa