Mitsubishi Denki Kabushiki Kaisha

Taro Maejima

Masahiro Hayama

Naoki Nakagawa

Masaru Aoki

Makoto Ohtani

Hirokazu Sakamoto

Michinari Tsutsumi

Toshio Yada

Takeshi Terazono

Tsuyoshi Tabuchi

A wet etching method for forming a metal film pattern having tapered edges includes preparing a metal film deposited on a substrate, performing a treatment for making the surface of the metal film hydrophilic, forming a photoresist layer pattern with phenol novolac resin as a main component on the surface of the metal film, post-baking the photoresist layer pattern at a predetermined temperature for a predetermined time and etching the metal film with etchant including nitric acid, thereby obtaining a metal film pattern having edges with a uniform taper angle desirably controlled with precision.

Wet etching method for forming metal film pattern having tapered edges

A liquid crystal display device includes a transparent conductive film display electrode on a transparent insulating substrate, a plurality of lower layer source conductors disposed simultaneously with a plurality of gate electrode conductors on the substrate, the source conductors intersecting the gate electrode conductors, a gate insulation film on the gate electrode conductors, the lower layer source conductors, and the display electrode, a semiconductor film disposed on the gate insulation film at a position overlying the gate electrode conductors, a drain electrode connected to the display electrode and disposed on the semiconductor film and the gate insulation film, and an upper layer source electrode conductor connected to the lower layer source conductors, the upper layer source electrode conductor disposed on the gate insulation film and the semiconductor film and forming a double-layer structure with the lower layer source conductors.

Liquid crystal display device having redundant buses

An apparatus for coating the flat surface of a substrate with a coating material is disclosed in which only a minimum amount of coating material is required for uniformly coating the entire surface of the substrate in an efficient manner under a variety of coating conditions, even if the substrate surface takes a non-circular configuration. According to one embodiment, the flat surface of the substrate is first coated with a coating material, and the substrate thus coated is then spunned at predetermined number of revolutions per minute. According to another embodiment, the apparatus includes a support table on which the substrate is fixedly mounted. A plurality of shaping members are slidably mounted on the support table for forming with the flat non-circular-shaped surface of the substrate a flat continuously extending circular-shaped surface. A plurality of biasing members are provided one for each shaping member for biasing the shaping members radially inwards into intimate contact at their inner sides with the peripheral side surfaces of the substrate mounted on the support table. A plurality of level adjusting mechanisms are provided on the shaping members for adjusting the surface of the shaping members to be flush with the flat surface of the substrate.

Apparatus for coating a substrate with a coating material

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Hyogo, Japan

Taro Maejima