King Fahd University of Petroleum and Minerals

Tarek Kandiel

Zain Hassan Yamani

Amar Kamal Mohmeadkhair Salih

Qasem Ahmed Qasem Drmosh

A method for coating a substrate with a Co—Pi modified BiVO/WOheterostructure film includes direct current reactive sputtering tungsten (W) onto a substrate in a gaseous mixture containing oxygen to form a tungsten trioxide (WO) film, direct current reactive sputtering bismuth (Bi) onto the tungsten trioxide (WO) film in a gaseous mixture containing oxygen to form a dibismuth trioxide (BiO) film, drop-casting a vanadyl acetylacetonate solution onto the BiOfilm and heating at a temperature of at least 450° C. in ambient air to convert the BiOfilm to a BiVOfilm, and photoelectrochemically coating the BiVOfilm with a cobalt-phosphate (Co—Pi) to form a modified film on the surface of the substrate. A photoanode containing the Co—Pi modified BiVO/WOheterostructure film prepared by the method, and its application in water splitting.

Method for forming a bismuth/tungsten oxide heterostructure film

A method for coating a substrate with a Co-Pi modified BiVO/WOheterostructure film includes direct current reactive sputtering tungsten (W) onto a substrate in a gaseous mixture containing oxygen to form a tungsten trioxide (WO) film, direct current reactive sputtering bismuth (Bi) onto the tungsten trioxide (WO) film in a gaseous mixture containing oxygen to form a dibismuth trioxide (BiO) film, drop-casting a vanadyl acetylacetonate solution onto the BiOfilm and heating at a temperature of at least 450° C. in ambient air to convert the BiOfilm to a BiVOfilm, and photoelectrochemically coating the BiVOfilm with a cobalt-phosphate (Co-Pi) to form a modified film on the surface of the substrate. A photoanode containing the Co-Pi modified BiVO/WOheterostructure film prepared by the method, and its application in water splitting.

Growing community of inventors

Dhahran, Saudi Arabia

Tarek Kandiel