Asml Holding N.v.

Asml Netherlands B.v.

Tao Chen

King Pui Leung

Igor Matheus Petronella Aarts

Adel Joobeur

Kevin J Violette

Ronan James Havelin

Joseph Carbone

Martinus Hendrikus Antonius Leenders

Jozef Petrus Henricus Benschop

Alexander Viktorovych Padiy

Louis Zhongliang Lu

Francisco Javier Berrios

Jiazong Zhang

A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.

Broad spectrum radiation by supercontinuum generation using a tapered optical fiber

A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having an input to receive the radiation from the laser and having an output to provide spectrally broadened output radiation, the optical fiber configured to spectrally broaden the radiation from the laser to a spectral width of at least 0.5 nm around the nominal wavelength.

Method and apparatus for spectrally broadening radiation

A system including a first component having a lensed facet; and a second component optically coupled to the first component, the second component having a tapered facet, the tapered facet and lensed facet spaced from each other so as to establish evanescent-wave coupling between the first component and the second component.

Method and apparatus for optical fiber connection

An alignment system having long term stability in illumination center wavelength is discussed. The alignment system includes a tunable radiation source and a feedback control system. The tunable radiation source includes a light source configured to provide a broadband radiation beam and a tunable multi-passband filter configured to filter the broadband radiation beam into narrow band radiation beam having a center wavelength value. The feedback control system is configured to measure the center wavelength value of the narrow band radiation beam and compare the measured center wavelength value with a desired center wavelength value. The feedback control system is further configured to generate a control signal based on the comparison in response to a difference being present between the measured center wavelength value and the desired center wavelength value and tune the tunable filter based on the control signal to eliminate or substantially reduce the difference.

Feedback control system of an alignment system

In a solid immersion lithography apparatus, the final element of the projection system is maintained at a distance of less than about 50 nm from the substrate by an actuator system. The final element may be formed as two parts, with a fluid, e.g. a liquid, confined between them. The actuator system may be controlled relative to a reference frame, which may be supported by a bearing. Backscatter detection can be used to determine if the distance between the final element and the substrate is too large. A cleaning device can clean the substrate between exposures.

Lithographic apparatus and device manufacturing method

Growing community of inventors

New City, NY, United States of America

Tao Chen