Sandisk 3d LLC

Crossbar, Inc.

Sandisk Technologies Inc.

Intermolecular, Inc.

Matrix Semiconductor, Inc.

Tanmay Kumar

Sung Hyun Jo

S Brad Herner

Christopher John Petti

Roy E Scheuerlein

Xiying Chen

Hagop A Nazarian

Ming-Che Wu

Tony P Chiang

Er-Xuan Ping

Prashant B Phatak

Sang Thanh Nguyen

April Dawn Schricker

Michael A Miller

Scott Brad Herner

Kuk-Hwan Kim

Mark Harold Clark

Abhijit Bandyopadhyay

Juan Pablo Saenz

Guangle Zhou

Andrew J Walker

Maitreyee Mahajani

Michael Konevecki

Usha Raghuram

Sucheta Nallamothu

Deepak Chandra Sekar

Yung-Tin Chen

Alper Ilkbahar

Xiying Costa

Steven J Radigan

Sundar Narayanan

Perumal Ratnam

Chuanbin Pan

Zhi Li

Deepak Kamalanathan

Dat Nguyen

Xin Sun

Xiyang Chen

Peter Rabkin

Mehdi Asnaashari

George Samachisa

Bing K Yen

Steven Patrick Maxwell

Harry Yue Gee

Huiwen Xu

Yangyin Chen

Natividad Vasquez

Srikanth Ranganathan

Jingyan Zhang

Chu-Chen Fu

Pankaj Kalra

Yubao Li

Steve Maxwell

Yibo Nian

Layne Armijo

Alvaro Padilla

Sebastian J M Wicklein

Huiwan Xu

Various embodiments disclosed herein provide for a neuromorphic logic system, comprising a bitline and a set of wordlines. The neuromorphic logic system also includes a set of resistive switching memory cells, respectively comprising a two-terminal volatile switching device and a two-terminal non-volatile memory device, at each intersection between the bit line and the set of wordlines, wherein the set of resistive switching memory cells are programmed to a set of resistive states and receive a voltage on the bitline above an activation threshold and wherein the magnitude of the voltage applied to the bitline corresponds to a magnitude of a sensory input, resulting in a current that corresponds to the magnitude of the sensor input and the set of resistive states.

Neuromorphic logic for an array of high on/off ratio non-volatile memory cells

Systems and methods for reducing leakage currents through unselected memory cells of a memory array including setting an adjustable resistance bit line structure connected to the unselected memory cells into a high resistance state or a non-conducting state during a memory operation are described. The adjustable resistance bit line structure may comprise a bit line structure in which the resistance of an intrinsic (or near intrinsic) polysilicon portion of the bit line structure may be adjusted via an application of a voltage to a select gate portion of the bit line structure that is electrically isolated from the intrinsic polysilicon portion (e.g., via an oxide layer between the intrinsic polysilicon portion and the select gate portion). The memory cells may comprise a first conductive metal oxide (e.g., titanium oxide) that abuts a second conductive metal oxide (e.g., aluminum oxide) that abuts a layer of amorphous silicon.

Barrier modulated cell structures with intrinsic vertical bit line architecture

A resistive memory device, such as a BMC ReRAM device, includes at least one resistive memory element which contains a carbon barrier material portion and a resistive memory material portion that is disposed between a first electrode and a second electrode.

Resistive memory device containing carbon barrier and method of making thereof

A method is provided that includes forming a word line above a substrate, the word line disposed in a first direction, forming a bit line above the substrate, the bit line disposed in a second direction perpendicular to the first direction, forming a nonvolatile memory material between the word line and the bit line, the nonvolatile memory material including a semiconductor material layer and conductive oxide material layer, forming a first barrier material layer between the word line and the nonvolatile memory material, forming a second barrier material layer between the bit line and the nonvolatile memory material, and forming a memory cell including the nonvolatile memory material at an intersection of the bit line and the word line.

Methods and apparatus for three-dimensional nonvolatile memory

A method is provided that includes forming a word line above a substrate, the word line disposed in a first direction, forming a bit line above the substrate, the bit line disposed in a second direction perpendicular to the first direction, forming a nonvolatile memory material between the word line and the bit line, and forming a memory cell including the nonvolatile memory material at an intersection of the bit line and the word line. The word line includes a first portion and a second portion including an electrically conductive carbon-containing material. The nonvolatile memory material includes a semiconductor material layer and a conductive oxide material layer, with the semiconductor material layer disposed adjacent the second portion of the word line.

Systems and methods for providing a Barrier Modulated Cell (BMC) structure that may comprise a reversible resistance-switching memory element within a memory array are described. The BMC structure may include a barrier layer comprising a layer of amorphous germanium or amorphous silicon germanium paired with a conductive metal oxide, such as titanium dioxide (TiO2), strontium titanate (SrTiO3), or a binary metal oxide. The BMC structure may include a conductive metal oxide in series with an amorphous layer of a low bandgap material. The low bandgap material may comprise a semiconductor material with a bandgap energy (Eg) less than 1.0 eV. The improved BMC structure may be used for providing multi-level memory elements within a three dimensional memory array.

Low power barrier modulated cell for storage class memory

A recessed high voltage metal oxide semiconductor (MOS) transistor is provided for use in a two-terminal memory cell. The two-terminal memory cell can include a resistive switching device connected to the recessed MOS transistor. The recessed MOS transistor provides for an increased channel length relative to the transistor size in comparison to a traditional MOS transistor. This allows for a decreased memory cell size while maintaining comparable electrical parameters (threshold voltage, channel length, and leakage) than would otherwise be possible. The recessed MOS transistor can be made as either a NMOS or PMOS device using n-type or p-type materials respectively, where the channel, or inversion layer, is formed by electrons (NMOS) or holes (PMOS) between the source and drain in the transistor.

Recessed high voltage metal oxide semiconductor transistor for RRAM cell

A method is provided that includes forming a word line above a substrate, forming a bit line above the substrate, forming a nonvolatile memory material between the word line and the bit line, the nonvolatile memory material including a semiconductor material layer and a conductive oxide material layer, forming a barrier material layer between the semiconductor material layer and the conductive oxide material layer, and forming a memory cell including the nonvolatile memory material at an intersection of the bit line and the word line. The word line is disposed in a first direction, the bit line is disposed in a second direction perpendicular to the first direction. The barrier material layer has an ionic conductivity of greater than about 0.1 Siemens/cm @ 1000&#xb0; C.

A matrix rail structure is formed over a substrate. The matrix rail structure includes a pair of lengthwise sidewalls that extend along a first horizontal direction and comprises, or is at least partially subsequently replaced with, a set of at least one gate electrode rail extending along the first horizontal direction and straight-sidewalled gate dielectrics. A pair of vertical semiconductor channel strips and a pair of laterally-undulating gate dielectrics can be formed on sidewalls of the matrix rail structure for each vertical field effect transistor. At least one laterally-undulating gate electrode extending along the first horizontal direction is formed on the laterally-undulating gate dielectrics. Bottom active regions and top active regions are formed at end portions of the vertical semiconductor channel strips. The vertical field effect transistors can be formed as a two-dimensional array, and may be employed as access transistors for a three-dimensional memory device.

Multi-gate vertical field effect transistor with channel strips laterally confined by gate dielectric layers, and method of making thereof

A volatile resistive memory device includes a resistive memory element including a barrier material portion and a charge-modulated resistive memory material portion. The barrier material portion includes a material selected from germanium and a silicon-germanium alloy, and the charge-modulated resistive memory material portion includes a non-filamentary, electrically conductive metal oxide. The resistive memory device may be a volatile eDRAM device. In operation, reading a resistance state of the resistive memory element does not disturb the resistance state of the charge-modulated resistive memory material portion.

Volatile memory device employing a resistive memory element

Two-terminal memory can be set to a first state (e.g., conductive state) in response to a program pulse, or set a second state (e.g., resistive state) in response to an erase pulse. These pulses generally provide a voltage difference between the two terminals of the memory cell. Certain electrical characteristics associated with the pulses can be manipulated in order to enhance the efficacy of the pulse. For example, the pulse can be enhanced or improved to reduce power-consumption associated with the pulse, reduce a number of pulses used to successfully set the state of the memory cell, reduce wear or damage to the memory cell, or to improve Ion or Ioff distribution associated with changing the state of the memory cell.

Enhanced erasing of two-terminal memory

A resistive memory device includes a first electrode, a sidewall spacer electrode located on a sidewall of a dielectric material contacting the first electrode, a resistive memory cell containing a resistive memory material and contacting the sidewall spacer electrode, and a second electrode containing the resistive memory cell.

Resistive memory device having sidewall spacer electrode and method of making thereof

A method of forming a non-volatile memory device. The method includes providing a substrate having a surface region and forming a first dielectric material overlying the surface region of the substrate. A first electrode structure is formed overlying the first dielectric material and a p+ polycrystalline silicon germanium material is formed overlying the first electrode structure. A p+ polycrystalline silicon material is formed overlying the first electrode structure using the polycrystalline silicon germanium material as a seed layer at a deposition temperature ranging from about 430 Degree Celsius to about 475 Degree Celsius without further anneal. The method forms a resistive switching material overlying the polycrystalline silicon material, and a second electrode structure including an active metal material overlying the resistive switching material.

Low temperature P+ polycrystalline silicon material for non-volatile memory device

A method is provided that includes forming a dielectric material above a substrate, forming a hole in the dielectric material, the hole disposed in a first direction, forming a word line layer above the substrate via the hole, the word line layer disposed in a second direction perpendicular to the first direction, the word line layer including a first conductive material having a first work function, forming a nonvolatile memory material on a sidewall of the hole, the nonvolatile memory material including a semiconductor material layer and a conductive oxide material layer, forming a local bit line in the hole, the local bit line including a second conductive material having a second work function, wherein the first work function is greater than the second work function, and forming a memory cell comprising the nonvolatile memory material at an intersection of the local bit line and the word line layer.

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Pleasanton, CA, United States of America

Tanmay Kumar