United Technologies Corporation

Carrier Corporation

Tania Bhatia

Wayde R Schmidt

Xia Tang

Harry E Eaton

David C Jarmon

John E Holowczak

Ellen Y Sun

John G Smeggil

Neil R Baldwin

William K Tredway

Robert A Barth

Treese Hugener-Campbell

Sonia Tulyani

Steven A Lozyniak

Venkata R Vedula

Thomas H Lawton

Shantikumar V Nair

Owen B Donahue, Jr

Treese Campbell-Hugener

Neil Baldwin

A method for depositing a protective coating on a complex shaped substrate includes the steps of: (1) dipping a complex shaped substrate into a slurry to form a base coat thereon, the slurry comprising an aqueous solution, at least one refractory metal oxide, and at least one transient fluid additive present in an amount of about 0.1 percent to 10 percent by weight of the slurry; (2) curing the dipped substrate; (3) dipping the substrate into a precursor solution to form a top barrier coat thereon; and (4) heat treating the dipped, cured substrate to form a protective coating.

Dense protective coatings, methods for their preparation and coated articles

A photocatalytic device for reacting with volatile organic compounds includes a photocatalyst and at least one additive, such as hafnium oxide and zirconium oxide, that is capable of forming a stable silicate with silicon dioxide. The additive reacts with volatile silicon-containing compounds to form stable silicate compounds. As a result, the silicon-containing compounds are unavailable for deactivation of the photocatalyst.

Siloxane removal via silicate formation for lifetime extension of photocatalytic devices

A method of forming a photocatalyst device includes depositing a layer of UV photocatalyst and depositing islands of a sequestering agent on a surface of the layer of the UV photocatalyst.

A composite article includes a substrate and a protective layer on the substrate. The protective layer includes a non-oxide ceramic matrix and a refractory phase within the non-oxide ceramic matrix.

High temperature refractory coatings for ceramic substrates

A process for applying an oxidation resistant coating to an article includes the steps of mixing at least about 10% by volume to up to about 99% by volume of a slurry at least one silica based material having a viscosity of about 1&#xd7;10poise to about 1&#xd7;10poise at a temperature of about 1,292&#xb0; F. (700&#xb0; C.) to about 3,272&#xb0; F. (1,800&#xb0; C.) at least about 1% by volume to up to about 90% by volume of the slurry at least one oxygen scavenger, and a liquid medium to form the slurry; coating an article with the slurry to form a slurry coated article; and heat treating under an inert atmosphere the slurry coated article to form an article having at least one oxidation resistant coating layer containing the at least one oxygen scavenger.

Oxidation resistant coatings, processes for coating articles, and their coated articles

A process for preparing a silicon based substrate with a protective coating having improved thermal resistance at temperature up to at least 1500&#xb0; C., and the resulting article.

Thermal resistant environmental barrier coating

The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sightprocess, particularly, electrophoretic deposition (EPD) process.

Coating process to enable electrophoretic deposition

Non-line-of-sight process for coating complexed shaped structures of Si-based substrates with protective barrier layers.

Non-line-of-sight process for coating complexed shaped structures

A bond coat system for silicon based substrates wherein a compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer.

Coating system for silicon based substrates

A bond layer for a silicon based substrate comprises a mixture of a first phase and a second phase, wherein the first phase is selected from the group consisting of refractory metal oxides, refractory metal silicates and mixtures thereof and the second phase is selected from the group consisting of refractory metal oxide forming metals, SiC, SiNand mixtures thereof.

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Middletown, CT, United States of America

Tania Bhatia