Asml Holding N.v.

Asml Netherlands B.v.

Tammo Uitterdijk

Matthew Lipson

Marcus Adrianus Van De Kerkhof

Michael Perry

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Matthias Kruizinga

Christopher John Mason

Koos Van Berkel

Johannes Adrianus Cornelis Maria Pijnenburg

Peter Van Delft

David Hart Peterson

Mehmet Ali Akbas

Satish Achanta

Iliya Sigal

Oleksiy Galaktionov

Roger Franciscus Mattheus Maria Hamelinck

Marinus Augustinus Christiaan Verschuren

Kjeld Gertrudus Hendrikus Janssen

Damoon Sohrabibabaheidary

Johannes Bernardus Charles Engelen

Shahab Shervin

Peter Helmus

Benjamin David Dawson

Matthew Anthony Sorna

Jerry Jianguo Deng

Systems, apparatuses, methods, and computer program products are provided for determining a free form flatness of a substrate table. An example system can include a substrate table that includes a first substrate table surface and a grounded substrate table electrical connection configured to ground the substrate table. The system can further include a substrate that includes a semiconducting layer, a thermally-grown insulating layer, a first substrate surface disposed on the insulating layer, and a substrate electrical connection configured to transmit a voltage to the semiconducting layer. The system can further include a metrology system configured to apply a voltage to the substrate electrical connection to electrostatically clamp the substrate to the substrate table, measure a flatness of the first substrate surface, and determine a free form flatness of the first substrate table surface based on the measured flatness of the first substrate surface.

Sub micron particle detection on burl tops by applying a variable voltage to an oxidized wafer

An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

Object holder, electrostatic sheet and method for making an electrostatic sheet

A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

Method to manufacture nano ridges in hard ceramic coatings

A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

Lithographic apparatus, substrate table, and method

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Wilton, CT, United States of America

Tammo Uitterdijk