Asml Netherlands B.v.

Asml Holding N.v.

Tammo Uitterdijk

Erik Roelof Loopstra

Matthew Lipson

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Marcus Adrianus Van De Kerkhof

Johannes Henricus Wilhelmus Jacobs

Raymond Wilhelmus Louis Lafarre

Richard Joseph Bruls

Johannes Christiaan Maria Jasper

Marcel Mathijs Theodore Marie Dierichs

Hendricus Johannes Maria Meijer

Wilhelmus Petrus De Boeij

Uwe Mickan

Laurentius Catrinus Jorritsma

Laurens Anthony Sanderse

Johannes Petrus Martinus Bernardus Vermeulen

Paulus Martinus Maria Liebregts

Antonius Franciscus Johannes De Groot

Louis John Markoya

Adrianus Hendrik Koevoets

Herman Boom

Hendrikus Robertus Marie Van Greevenbroek

Ronald Van Der Wilk

Michael L Nelson

Nicolas Alban Lallemant

Martijn Gerard Dominique Wehrens

Michel Fransois Hubert Klaassen

Geoffrey O'Connor

Michael Andrew Chieda

Kenneth C Henderson

Orlando Serapio Cicilia

Wim Tjibbo Tel

Santiago E Del Puerto

Haico Victor Kok

Donis George Flagello

Michael Perry

Marcel Koenraad Marie Baggen

Johannes Wilhelmus De Klerk

Willem Richard Pongers

Jacobus Cornelis Gerardus Van Der Sanden

Gerardus Carolus Johannus Hofmans

David Hart Peterson

Mehmet Ali Akbas

Joseph Laganza

Albert Johannes Maria Jansen

Wilhelmus Jacobus Maria Rooijakkers

Remco Marcel Van Dijk

Raymond Laurentius Johannes Schrijver

Hendrikus Alphonsus Ludovicus Van Dijck

Iliya Sigal

Michel François Hubert Klaassen

Richard Bryan Lewis

Santiago E Delpuerto

Freerk Adriaan Stoffels

Jacobus Cornelius Gerardus Van Der Sanden

Vincent Dimilia

Ronald Peter Totillo

Steven Michael Zimmerman

A lithographic apparatus includes a clamp () configured to receive an object (). The clamp defines at least one channel () configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck () coupled to the clamp. The chuck () defines at least one void () configured to thermally insulate the chuck from the clamp.

Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus

Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.

Burls with altered surface topography for holding an object in lithography applications

A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Lithographic apparatus and method

An electrostatic clamp () and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer () having a first ultra-low expansion (ULE) material, a second layer () coupled to the first layer, having a second ULE material, and a third layer (), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels () located between the first layer and the second layer and a composite layer () interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.

Electrostatic clamp and a method for manufacturing the same

A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaFis also disclosed.

Lithographic apparatus and device manufacturing method

A support such as a clamp () is configured to releasably hold a patterning device such as a reticle () to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate () having opposing first () and second () surfaces, a plurality of burls () located on the first surface and configured to contact the reticle, a second substrate () having opposing first () and second () surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements () are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.

Lithographic apparatus, control system and device manufacturing method

A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaFis also disclosed.

A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.

Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor

In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.

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De Bilt, Netherlands

Tammo Uitterdijk