Tokyo Electron Limited

Kabushiki Kaisha Toshiba

Tamio Endo

Katsuya Okumura

Haruo Okano

Keiji Horioka

Junichi Arami

Isahiro Hasegawa

Shiro Koyama

Yoshiyuki Harima

Kazuo Kikuchi

Teruaki Shiraishi

There is provided a cassette carrying-in system, which can rotate a cassette housing therein substrates to be treated so that the substrates are changed from a vertical state to a horizontal state and which can carry the cassette in, e.g., a load-lock chamber of a vacuum processing unit. The cassette carrying-in system is provided for carrying a cassette, in which a plurality of substrates to be processed are arranged in parallel, in a processing unit for treating the substrates. The cassette carrying-in system comprises: a moving body having a first supporting portion for holding a bottom portion of the cassette so that the substrates to be processed are arranged vertically, and a second supporting portion, which is rotatable with the first supporting portion and which supports thereon a side of the cassette when the cassette is inclined, the second supporting portion supporting thereon the side serving as a bottom of the cassette when the substrates to be processed are arranged horizontally; a rotating mechanism for rotating the first and second supporting portions so that the substrates in the cassette are changed between a vertical state and a horizontal state; and a running mechanism for running the moving body so that the cassette supported on the first and second supporting portions moves between inside and outside the processing unit.

System for carrying-in of cassette for substrates to be processed

A plasma processing apparatus has a process chamber for receiving an article to be processed, a monitoring window forming part of the peripheral wall of the process chamber, a pressure leading-out port, gates, and a plasma generating device for forming an electric field and generating plasma in the process chamber. The process chamber is defined by the peripheral wall having a circular cross section. Members forming parts of the peripheral wall each have an inner face continuous with the surface of the peripheral wall and curved substantially at the same radius of curvature as the surface of the peripheral wall.

Plasma processing apparatus

Growing community of inventors

Kawasaki, Japan

Tamio Endo