Ebara Corporation

Kabushiki Kaisha Toshiba

Other

Nihon Micro Coating Co., Ltd.

Tamami Takahashi

Masaya Seki

Hiroaki Kusa

Kenya Ito

Masanori Goto

Akira Goto

Kenji Yamaguchi

Kazuaki Maeda

Hirokuni Hiyama

Yutaka Wada

Atsushi Shigeta

Masayuki Nakanishi

Motohiko Nohmi

Norio Kimura

Seiji Ishikawa

Masayoshi Hirose

Masao Shinoda

Yoshihiro Mochizuki

Akira Ogata

Chishiro Yamashina

Yoshimi Sasaki

Masako Kodera

Mitsuhiko Shirakashi

Toyomi Nishi

Riichiro Aoki

Ryuji Kodama

Gisuke Kouno

Ritsuo Kikuta

Shimpei Miyakawa

Kazuyuki Inoue

Masato Eguchi

Fumihiko Sakata

Yuichi Usami

Tetsuji Togawa

Koji Ono

Jun Watanabe

Kazuya Hirata

Jun Tamura

Tsutomu Takahashi

Manabu Tsujimura

Dai Fukushima

Hiromi Yajima

Mitsuo Tada

You Ishii

Takanobu Nishimura

Takeo Kubota

Shoichi Kodama

Toshiro Maekawa

Shiro Mishima

Yasunari Suto

Keiichi Tohyama

Gen Toyota

Yukio Imoto

Satoru Sato

Kazuaki Himukai

Fujio Aoyama

Shiro Kumazawa

Koji Kato

Kenji Kato

Souichi Asakawa

Daisaku Fukuoka

Hirofumi Ichihara

Shinzo Mammoto

Jpx Mammoto

Motoaki Okada

An energy recovery device is provided in a seawater desalination system for desalinating seawater by removing salinity from the seawater. A pressure exchange chamber for pressurizing seawater by a pressure of concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus includes a first supply and discharge port connected to a switching valve for performing supply and discharge of liquid, a second supply and discharge port connected to a directional control valve for performing supply and discharge of liquid, a flow resistor provided at the first supply and discharge port side in the chamber and configured to regulate the flow, and a flow resistor provided at the second supply and discharge port side in the chamber and configured to regulate the flow, and a flowmeter provided between the two flow resistors and configured to measure a flow rate of the liquid in the chamber.

Seawater desalination system and energy recovery device

A seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port for supplying and discharging the concentrated seawater, a seawater port for supplying and discharging the seawater, a flow resistor provided at a concentrated seawater port side in the chamber, and a flow resistor provided at a seawater port side in the chamber. Each of the flow resistor provided at the concentrated seawater port side and the seawater port side comprises at least one perforated circular plate, and each perforated circular plate has a plurality of holes formed in an outer circumferential area outside a circle having a predetermined diameter on the perforated circular plate.

Seawater desalination system and energy recovery apparatus

An energy recovery apparatus which is used in a seawater desalination system includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P) for supplying and discharging the concentrated seawater, a seawater port (P) for supplying and discharging the seawater, a flow resistor () provided at a concentrated seawater port (P) side in the chamber (CH), and a flow resistor () provided at a seawater port (P) side in the chamber (CH). The flow resistor () provided at the concentrated seawater port (P) side and the flow resistor () provided at the seawater port (P) side comprise at least one perforated circular plate, and the perforated circular plate has holes formed at an outer circumferential area outside a predetermined diameter of the circular plate.

A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

Polishing apparatus and polishing method

A polishing apparatus polishes a periphery of a substrate by bringing a polishing tool into sliding contact with the substrate. The polishing apparatus includes a substrate-holding mechanism configured to hold a substrate and rotate the substrate, a polishing mechanism configured to press a polishing tool against a periphery of the substrate so as to polish the periphery, and a periphery-supporting mechanism configured to support the periphery of the substrate by a fluid. The periphery-supporting mechanism is configured to support a surface of the substrate from an opposite side or the same side of the periphery of the substrate.

Polishing apparatus

A projecting/receiving unit () projects a laser light to a peripheral portion () and receives the reflected light while a liquid is being fed to a substrate () and is flowing on the peripheral portion (). A signal processing controller () processes the electric signal of the reflected light to decide the state of the peripheral portion (). The state of the peripheral portion being polished is monitored. Moreover, the polish end point is detected. A transmission wave other than the laser light may also be used. The peripheral portion () may also be enclosed by a passage forming member thereby to form a passage properly. The peripheral portion can be properly measured even in the situation where the liquid is flowing on the substrate peripheral portion.

Substrate peripheral portion measuring device, and substrate peripheral portion polishing apparatus

The present invention relates to a seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P) for supplying and discharging the concentrated seawater, a seawater port (P) for supplying and discharging the seawater, a flow resistor () provided at a concentrated seawater port (P) side in the chamber (CH), and a flow resistor () provided at a seawater port (P) side in the chamber (CH). Each of the flow resistor () provided at the concentrated seawater port (P) side and the seawater port (P) side comprises at least one perforated circular plate, and each perforated circular plate has a plurality of holes formed in an outer circumferential area outside a circle having a predetermined diameter on the perforated circular plate.

An energy recovery apparatus used in the seawater desalination system includes a cylindrical chamber (CH) having a space for containing concentrated seawater and seawater therein and being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P) provided at the lower part of the chamber (CH) for supplying and discharging the concentrated seawater, a seawater port (P) provided at the upper part of the chamber (CH) for supplying and discharging the seawater, a flow resistor () provided at a concentrated seawater port side in the chamber, and a flow resistor () provided at a seawater port side in the chamber. A circular plate () having a hole at the center thereof is provided between the concentrated seawater port (P) and the flow resistor (), or between the seawater port (P) and the flow resistor ().

Energy exchange chamber

A substrate processing apparatus includes first and second polishing units for polishing a peripheral portion of a substrate, a primary cleaning unit for cleaning the substrate, a secondary cleaning and drying unit for drying the substrate cleaned in the primary cleaning unit, and a measurement unit for measuring the peripheral portion of the substrate. The measurement unit includes a mechanism for measurement required for polishing in the first and second polishing units, such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.

Substrate processing apparatus

In a seawater desalination system for producing fresh water from seawater by passing the seawater pressurized by a pump through a reverse-osmosis membrane-separation apparatus to separate the seawater into fresh water and concentrated seawater, an energy exchange chamber for utilizing pressure energy of the concentrated seawater discharged from the reverse-osmosis membrane-separation apparatus as energy for pressurizing part of the seawater is provided. The energy exchange chamber includes a concentrated seawater port for introducing and discharging the concentrated seawater, a seawater port for introducing and discharging the seawater, a plurality of flow regulators, and a plurality of partitioned fluid passages provided in the chamber to allow the concentrated seawater port and the seawater port to communicate with each other.

Seawater desalination system and energy exchange chamber

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Tokyo, Japan

Tamami Takahashi