Fujifilm Corporation

Takuya Tsuruta

Tomotaka Tsuchimura

Kyohei Arayama

Kazutaka Takahashi

Tetsushi Miyata

Hiroo Takizawa

Kazuto Shimada

Masahiro Mori

Hirotaka Takishita

Kyouhei Arayama

Tetsuya Kamimura

Kaoru Iwato

Yoshihiro Jimbo

Kazuya Oota

Daisuke Sasaki

Tokihiko Matsumura

Takashi Katoh

Yuki Hirai

Takeshi Kawabata

Yuzo Nagata

Hiroaki Tsuyama

Takeshi Inasaki

Suguru Samejima

Keisuke Arimura

Koutarou Takahashi

Satoru Murayama

Yutaro Norizuki

Tadeteru Yatsuo

A composition includes a near infrared absorbing pigment, a compound represented by Formula (1), a primary to tertiary amine compound having a molecular weight of 500 or less and a boiling point of 300° C. or lower, a resin, and a solvent. The compound represented by Formula (1) has a solubility in propylene glycol methyl ether acetate at 25° C. of 0.1 g/L or higher. A content of the amine compound in a total solid content of the composition is 10-5000 mass ppm. In Formula (1), Prepresents a colorant structure, Lrepresents a single bond or a linking group, Xrepresents an acid group, a basic group, a group having a salt structure, or a phthalimide methyl group, m is 1 or more, and n is 1 or more.PL-(X))  (1)

Composition, film, optical filter, laminate, solid-state imaging element, image display device, and infrared sensor

A composition includes a near infrared absorbing pigment and a solvent, in which the near infrared absorbing pigment is at least one selected from a colorant compound which has a cation and an anion in the same molecule, a colorant compound which is a salt of a cationic chromophore and a counter anion, and a colorant compound which is a salt of an anionic chromophore and a counter cation, a D50 particle size in which a cumulative volume in a particle size distribution of particle sizes of the near infrared absorbing pigment is 50% is 100 nm or lower, and d values of Hansen solubility parameters of the near infrared absorbing pigment and the solvent satisfy a predetermined expression.

Composition, film, near infrared cut filter, solid-state imaging element, image display device, and infrared sensor

Provided are a composition that has excellent pigment dispersibility without affecting the color of a pigment in a visible range, a curable composition, a cured film, a near infrared cut filter, an infrared transmitting filter; a solid image pickup element, an infrared sensor, and a camera module. The composition includes: a pigment; a pigment derivative that includes a compound represented by Formula (1); and a solvent, in which Rand Rrepresent an aryl group or the like, Rto Rrepresent a cyano group, a heteroaryl group, or the like, Rand Reach independently represent &#x2014;BRRor the like, Rand Reach independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group, L represents a single bond or a linking group, X represents an acidic group or the like, m represents an integer of 1 to 10, and n represents an integer of 1 to 10. 

Composition, curable composition, cured film, near infrared cut filter, infrared transmitting filter, solid image pickup element, infrared sensor, and camera module

Provided is a pigment dispersion liquid used in a curable composition capable of manufacturing a film having fewer foreign matters. Provided are a curable composition capable of manufacturing a film having fewer foreign matters, a film, a near infrared cut filter, a solid-state imaging element, an image display device, and an infrared sensor. The pigment dispersion liquid includes a near infrared absorbing organic pigment having an maximum absorption wavelength in a wavelength range of 600 to 1,200 nm; two or more kinds of pigment derivatives having different structures; and a solvent.

Pigment dispersion liquid, curable composition, film, near infrared cut filter, solid-state imaging element, image display device, and infrared sensor

Provided is a coloring composition with which a film capable of allowing transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, also provided are a film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid image pickup element, and an infrared sensor in which the coloring composition is used. The coloring composition includes a coloring material that shields light in a visible range; and an infrared absorber. It is preferable that the coloring material that shields light in the visible range includes two or more chromatic colorants and that a combination of the two or more chromatic colorants forms black. Alternatively, it is preferable that the coloring material that shields light in the visible range includes an organic black colorant. It is preferable that the organic black colorant is at least one selected from the group consisting of a perylene compound and a bisbenzofuranone compound.

Coloring composition, film, color filter, pattern forming method, method for manufacturing color filter, solid image pickup element, and infrared sensor

The present invention relates to an infrared sensor, a near-infrared ray absorption composition, a photosensitive resin composition, a compound, a near-infrared ray absorption filter, and an image pick-up device. Provided is an infrared sensorthat detects an object by detecting light in wavelengths of 900 nm to 1,000 nm, including infrared ray transmission filtersand near-infrared ray absorption filters, in which the near-infrared ray absorption filterscontains a near-infrared ray absorption substance having a maximum absorption wavelength in wavelengths of 900 nm to 1,000 nm.

Infrared sensor, near-infrared ray absorption composition, photosensitive resin composition, compound, near-infrared ray absorption filter, and image pick-up device

A coloring composition includes colorants and a resin, in which a ratio A/B of a minimum value A of an absorbance in a wavelength range of 400 to 830 nm to a maximum value B of an absorbance in a wavelength range of 1000 to 1300 nm is 4.5 or higher.

Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor

The near-infrared absorption composition includes a processed coloring agent obtained by coating a near-infrared absorption coloring agent with a resin having one or more selected from a coloring agent structure, a heterocyclic structure, and an acyclic hetero atom-containing group. The near-infrared absorption coloring agent is preferably one or more selected from a phthalocyanine coloring agent, a perylene coloring agent, a pyrrolopyrrole coloring agent, a cyanine coloring agent, a dithiol metal complex coloring agent, a naphthoquinone coloring agent, a diimmonium coloring agent, an azo coloring agent, and a squarylium coloring agent and more preferably a pyrrolopyrrole coloring agent.

Near-infrared absorption composition, curable composition, cured film, near-infrared cut filter, solid-state imaging device, infrared sensor, camera module, processed coloring agent, and method of manufacturing processed coloring agent

An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Yand Yeach independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A) 

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask

There are provided A pattern formation method, including:

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): 

Resin composition and pattern forming method using the same

There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device

There is provided an actinic ray-sensitive or radiation-sensitive composition containing (&#x3b1;) a compound represented by the formula (&#x3b1;I) capable of generating an acid having a size of 200 &#x212b;or more in volume and (&#x3b2;) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (&#x3b1;I) is defined as herein, 

Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition

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Haibara-gun, Japan

Takuya Tsuruta